IT1042858B - Elemento di memorizzazione statica e procedimento per la sua fabbricazione - Google Patents

Elemento di memorizzazione statica e procedimento per la sua fabbricazione

Info

Publication number
IT1042858B
IT1042858B IT27632/75A IT2763275A IT1042858B IT 1042858 B IT1042858 B IT 1042858B IT 27632/75 A IT27632/75 A IT 27632/75A IT 2763275 A IT2763275 A IT 2763275A IT 1042858 B IT1042858 B IT 1042858B
Authority
IT
Italy
Prior art keywords
procedure
manufacture
storage element
static storage
static
Prior art date
Application number
IT27632/75A
Other languages
English (en)
Original Assignee
Siemens Ag
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Siemens Ag filed Critical Siemens Ag
Application granted granted Critical
Publication of IT1042858B publication Critical patent/IT1042858B/it

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
    • H01L29/66Types of semiconductor device ; Multistep manufacturing processes therefor
    • H01L29/68Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
    • H01L29/76Unipolar devices, e.g. field effect transistors
    • H01L29/772Field effect transistors
    • H01L29/78Field effect transistors with field effect produced by an insulated gate
    • H01L29/792Field effect transistors with field effect produced by an insulated gate with charge trapping gate insulator, e.g. MNOS-memory transistors
    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11CSTATIC STORES
    • G11C11/00Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor
    • G11C11/21Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using electric elements
    • G11C11/34Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using electric elements using semiconductor devices
    • G11C11/39Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using electric elements using semiconductor devices using thyristors or the avalanche or negative resistance type, e.g. PNPN, SCR, SCS, UJT
    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11CSTATIC STORES
    • G11C16/00Erasable programmable read-only memories
    • G11C16/02Erasable programmable read-only memories electrically programmable
    • G11C16/04Erasable programmable read-only memories electrically programmable using variable threshold transistors, e.g. FAMOS
    • G11C16/0466Erasable programmable read-only memories electrically programmable using variable threshold transistors, e.g. FAMOS comprising cells with charge storage in an insulating layer, e.g. metal-nitride-oxide-silicon [MNOS], silicon-oxide-nitride-oxide-silicon [SONOS]

Landscapes

  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Computer Hardware Design (AREA)
  • Physics & Mathematics (AREA)
  • Ceramic Engineering (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Non-Volatile Memory (AREA)
  • Solid State Image Pick-Up Elements (AREA)
  • Semiconductor Memories (AREA)
IT27632/75A 1974-09-26 1975-09-25 Elemento di memorizzazione statica e procedimento per la sua fabbricazione IT1042858B (it)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE19742446088 DE2446088A1 (de) 1974-09-26 1974-09-26 Statisches speicherelement und verfahren zu seiner herstellung

Publications (1)

Publication Number Publication Date
IT1042858B true IT1042858B (it) 1980-01-30

Family

ID=5926849

Family Applications (1)

Application Number Title Priority Date Filing Date
IT27632/75A IT1042858B (it) 1974-09-26 1975-09-25 Elemento di memorizzazione statica e procedimento per la sua fabbricazione

Country Status (8)

Country Link
US (1) US4027320A (it)
JP (1) JPS5160472A (it)
BE (1) BE833890A (it)
DE (1) DE2446088A1 (it)
FR (1) FR2286469A1 (it)
GB (1) GB1511057A (it)
IT (1) IT1042858B (it)
NL (1) NL7511308A (it)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4143393A (en) * 1977-06-21 1979-03-06 International Business Machines Corporation High field capacitor structure employing a carrier trapping region
EP0002420A1 (fr) * 1977-12-01 1979-06-13 International Business Machines Corporation Dispositif semi-conducteur du type transistor à effet de champ activé par la lumière et mémoire en résultant
US4197144A (en) * 1978-09-21 1980-04-08 General Electric Company Method for improving writing of information in memory targets
JPS59145576A (ja) * 1982-11-09 1984-08-21 ザイトレツクス・コ−ポレ−シヨン プログラム可能なmosトランジスタ
JP4105353B2 (ja) * 1999-07-26 2008-06-25 財団法人国際科学振興財団 半導体装置
JP4397491B2 (ja) * 1999-11-30 2010-01-13 財団法人国際科学振興財団 111面方位を表面に有するシリコンを用いた半導体装置およびその形成方法
WO2003003473A1 (fr) * 2001-06-28 2003-01-09 Hitachi, Ltd. Cellule memoire a semi-conducteurs non volatile, memoire a semi-conducteurs et procede pour produire une memoire a semi-conducteurs non volatile

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3852120A (en) * 1973-05-29 1974-12-03 Ibm Method for manufacturing ion implanted insulated gate field effect semiconductor transistor devices
US3922708A (en) * 1974-03-04 1975-11-25 Ibm Method of producing high value ion implanted resistors

Also Published As

Publication number Publication date
FR2286469A1 (fr) 1976-04-23
JPS5160472A (it) 1976-05-26
GB1511057A (en) 1978-05-17
NL7511308A (nl) 1976-03-30
DE2446088A1 (de) 1976-04-01
BE833890A (fr) 1976-01-16
US4027320A (en) 1977-05-31

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