IT1027470B - Procedimento per l assottigliamento di uno strato di materiale semicon duttore - Google Patents
Procedimento per l assottigliamento di uno strato di materiale semicon duttoreInfo
- Publication number
- IT1027470B IT1027470B IT67299/75A IT6729975A IT1027470B IT 1027470 B IT1027470 B IT 1027470B IT 67299/75 A IT67299/75 A IT 67299/75A IT 6729975 A IT6729975 A IT 6729975A IT 1027470 B IT1027470 B IT 1027470B
- Authority
- IT
- Italy
- Prior art keywords
- thinning
- procedure
- layer
- semicon ductor
- ductor material
- Prior art date
Links
- 239000000463 material Substances 0.000 title 1
- 239000004065 semiconductor Substances 0.000 title 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02107—Forming insulating materials on a substrate
- H01L21/02225—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer
- H01L21/02227—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a process other than a deposition process
- H01L21/0223—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a process other than a deposition process formation by oxidation, e.g. oxidation of the substrate
- H01L21/02233—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a process other than a deposition process formation by oxidation, e.g. oxidation of the substrate of the semiconductor substrate or a semiconductor layer
- H01L21/02241—III-V semiconductor
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02107—Forming insulating materials on a substrate
- H01L21/02225—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer
- H01L21/02227—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a process other than a deposition process
- H01L21/02258—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a process other than a deposition process formation by anodic treatment, e.g. anodic oxidation
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic System or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
- H01L21/306—Chemical or electrical treatment, e.g. electrolytic etching
- H01L21/3063—Electrolytic etching
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic System or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
- H01L21/306—Chemical or electrical treatment, e.g. electrolytic etching
- H01L21/3063—Electrolytic etching
- H01L21/30635—Electrolytic etching of AIIIBV compounds
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices adapted for rectifying, amplifying, oscillating or switching, or capacitors or resistors with at least one potential-jump barrier or surface barrier, e.g. PN junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
Landscapes
- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Manufacturing & Machinery (AREA)
- Ceramic Engineering (AREA)
- Weting (AREA)
- Formation Of Insulating Films (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US440656A US3898141A (en) | 1974-02-08 | 1974-02-08 | Electrolytic oxidation and etching of III-V compound semiconductors |
US440664A US3890215A (en) | 1974-02-08 | 1974-02-08 | Electrochemical thinning of semiconductor devices |
Publications (1)
Publication Number | Publication Date |
---|---|
IT1027470B true IT1027470B (it) | 1978-11-20 |
Family
ID=27032501
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
IT67299/75A IT1027470B (it) | 1974-02-08 | 1975-02-05 | Procedimento per l assottigliamento di uno strato di materiale semicon duttore |
Country Status (4)
Country | Link |
---|---|
JP (1) | JPS50115775A (it) |
DE (1) | DE2505277A1 (it) |
FR (1) | FR2260868A1 (it) |
IT (1) | IT1027470B (it) |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4247373A (en) * | 1978-06-20 | 1981-01-27 | Matsushita Electric Industrial Co., Ltd. | Method of making semiconductor device |
DE2906701A1 (de) * | 1979-02-21 | 1980-09-04 | Siemens Ag | Iii-v-halbleiter-leistungs-mesfet mit verbesserter waermeableitung und verfahren zur herstellung eines solchen transistors |
DE3805752A1 (de) * | 1988-02-24 | 1989-08-31 | Fraunhofer Ges Forschung | Anisotropes aetzverfahren mit elektrochemischem aetzstop |
-
1975
- 1975-02-05 IT IT67299/75A patent/IT1027470B/it active
- 1975-02-07 JP JP50015503A patent/JPS50115775A/ja active Pending
- 1975-02-07 FR FR7503993A patent/FR2260868A1/fr not_active Withdrawn
- 1975-02-07 DE DE19752505277 patent/DE2505277A1/de active Pending
Also Published As
Publication number | Publication date |
---|---|
JPS50115775A (it) | 1975-09-10 |
DE2505277A1 (de) | 1975-08-14 |
FR2260868A1 (en) | 1975-09-05 |
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