IN2015DN04192A - - Google Patents

Info

Publication number
IN2015DN04192A
IN2015DN04192A IN4192DEN2015A IN2015DN04192A IN 2015DN04192 A IN2015DN04192 A IN 2015DN04192A IN 4192DEN2015 A IN4192DEN2015 A IN 4192DEN2015A IN 2015DN04192 A IN2015DN04192 A IN 2015DN04192A
Authority
IN
India
Application number
Inventor
Satoshi Suzuki
Original Assignee
Nikon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corp filed Critical Nikon Corp
Publication of IN2015DN04192A publication Critical patent/IN2015DN04192A/en

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L27/00Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
    • H01L27/14Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation
    • H01L27/144Devices controlled by radiation
    • H01L27/146Imager structures
    • H01L27/14601Structural or functional details thereof
    • H01L27/14609Pixel-elements with integrated switching, control, storage or amplification elements
    • H01L27/14612Pixel-elements with integrated switching, control, storage or amplification elements involving a transistor
    • H01L27/14614Pixel-elements with integrated switching, control, storage or amplification elements involving a transistor having a special gate structure
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L27/00Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
    • H01L27/14Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation
    • H01L27/144Devices controlled by radiation
    • H01L27/146Imager structures
    • H01L27/14601Structural or functional details thereof
    • H01L27/14603Special geometry or disposition of pixel-elements, address-lines or gate-electrodes
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L27/00Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
    • H01L27/14Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation
    • H01L27/144Devices controlled by radiation
    • H01L27/146Imager structures
    • H01L27/14601Structural or functional details thereof
    • H01L27/14603Special geometry or disposition of pixel-elements, address-lines or gate-electrodes
    • H01L27/14605Structural or functional details relating to the position of the pixel elements, e.g. smaller pixel elements in the center of the imager compared to pixel elements at the periphery
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L27/00Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
    • H01L27/14Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation
    • H01L27/144Devices controlled by radiation
    • H01L27/146Imager structures
    • H01L27/14601Structural or functional details thereof
    • H01L27/14641Electronic components shared by two or more pixel-elements, e.g. one amplifier shared by two pixel elements
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L27/00Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
    • H01L27/14Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation
    • H01L27/144Devices controlled by radiation
    • H01L27/146Imager structures
    • H01L27/14643Photodiode arrays; MOS imagers
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L27/00Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
    • H01L27/14Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation
    • H01L27/144Devices controlled by radiation
    • H01L27/146Imager structures
    • H01L27/148Charge coupled imagers
    • H01L27/14806Structural or functional details thereof
    • H01L27/14812Special geometry or disposition of pixel-elements, address lines or gate-electrodes
    • HELECTRICITY
    • H04ELECTRIC COMMUNICATION TECHNIQUE
    • H04NPICTORIAL COMMUNICATION, e.g. TELEVISION
    • H04N25/00Circuitry of solid-state image sensors [SSIS]; Control thereof
    • H04N25/60Noise processing, e.g. detecting, correcting, reducing or removing noise
    • H04N25/616Noise processing, e.g. detecting, correcting, reducing or removing noise involving a correlated sampling function, e.g. correlated double sampling [CDS] or triple sampling
    • HELECTRICITY
    • H04ELECTRIC COMMUNICATION TECHNIQUE
    • H04NPICTORIAL COMMUNICATION, e.g. TELEVISION
    • H04N25/00Circuitry of solid-state image sensors [SSIS]; Control thereof
    • H04N25/60Noise processing, e.g. detecting, correcting, reducing or removing noise
    • H04N25/67Noise processing, e.g. detecting, correcting, reducing or removing noise applied to fixed-pattern noise, e.g. non-uniformity of response
    • H04N25/671Noise processing, e.g. detecting, correcting, reducing or removing noise applied to fixed-pattern noise, e.g. non-uniformity of response for non-uniformity detection or correction
    • H04N25/677Noise processing, e.g. detecting, correcting, reducing or removing noise applied to fixed-pattern noise, e.g. non-uniformity of response for non-uniformity detection or correction for reducing the column or line fixed pattern noise
    • HELECTRICITY
    • H04ELECTRIC COMMUNICATION TECHNIQUE
    • H04NPICTORIAL COMMUNICATION, e.g. TELEVISION
    • H04N25/00Circuitry of solid-state image sensors [SSIS]; Control thereof
    • H04N25/70SSIS architectures; Circuits associated therewith
    • H04N25/71Charge-coupled device [CCD] sensors; Charge-transfer registers specially adapted for CCD sensors
    • H04N25/75Circuitry for providing, modifying or processing image signals from the pixel array
    • HELECTRICITY
    • H04ELECTRIC COMMUNICATION TECHNIQUE
    • H04NPICTORIAL COMMUNICATION, e.g. TELEVISION
    • H04N25/00Circuitry of solid-state image sensors [SSIS]; Control thereof
    • H04N25/70SSIS architectures; Circuits associated therewith
    • H04N25/76Addressed sensors, e.g. MOS or CMOS sensors
    • H04N25/78Readout circuits for addressed sensors, e.g. output amplifiers or A/D converters
    • HELECTRICITY
    • H04ELECTRIC COMMUNICATION TECHNIQUE
    • H04NPICTORIAL COMMUNICATION, e.g. TELEVISION
    • H04N25/00Circuitry of solid-state image sensors [SSIS]; Control thereof
    • H04N25/70SSIS architectures; Circuits associated therewith
    • H04N25/76Addressed sensors, e.g. MOS or CMOS sensors
    • H04N25/77Pixel circuitry, e.g. memories, A/D converters, pixel amplifiers, shared circuits or shared components
IN4192DEN2015 2012-10-19 2015-05-15 IN2015DN04192A (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2012232422 2012-10-19
PCT/JP2013/078483 WO2014061820A1 (en) 2012-10-19 2013-10-21 Solid-state image pickup element

Publications (1)

Publication Number Publication Date
IN2015DN04192A true IN2015DN04192A (en) 2015-10-16

Family

ID=50488372

Family Applications (1)

Application Number Title Priority Date Filing Date
IN4192DEN2015 IN2015DN04192A (en) 2012-10-19 2015-05-15

Country Status (7)

Country Link
US (3) US9620558B2 (en)
EP (1) EP2911203B1 (en)
JP (3) JP6135677B2 (en)
KR (1) KR102125673B1 (en)
CN (3) CN108551559B (en)
IN (1) IN2015DN04192A (en)
WO (1) WO2014061820A1 (en)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6135677B2 (en) * 2012-10-19 2017-05-31 株式会社ニコン Imaging device and imaging apparatus
US10199422B2 (en) * 2014-07-09 2019-02-05 Renesas Electronics Corporation Semiconductor device
JP6704677B2 (en) * 2015-03-31 2020-06-03 キヤノン株式会社 Solid-state imaging device
TWI701819B (en) * 2015-06-09 2020-08-11 日商索尼半導體解決方案公司 Imaging element, driving method and electronic equipment
EP3358831B1 (en) * 2015-09-30 2023-12-20 Nikon Corporation Image-capturing element and electronic camera
KR102437162B1 (en) * 2015-10-12 2022-08-29 삼성전자주식회사 Image sensor
JP7005125B2 (en) * 2016-04-22 2022-01-21 キヤノン株式会社 Image sensor, image sensor, and method for manufacturing the image sensor
JP6889571B2 (en) 2017-02-24 2021-06-18 キヤノン株式会社 Imaging device and imaging system
US10593714B2 (en) * 2017-07-24 2020-03-17 Panasonic Intellectual Property Management Co., Ltd. Imaging device

Family Cites Families (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1107316A3 (en) * 1999-12-02 2004-05-19 Nikon Corporation Solid-state image sensor, production method of the same and digital camera
JP2002314062A (en) * 2001-04-18 2002-10-25 Canon Inc Solid-state image sensing device and image sensing system
JP4826127B2 (en) * 2005-04-25 2011-11-30 ソニー株式会社 Solid-state imaging device and manufacturing method thereof
KR100690912B1 (en) * 2005-08-12 2007-03-09 삼성전자주식회사 4 shared type image sensor with improved charge transferring characteristics
JP5034215B2 (en) 2005-11-02 2012-09-26 株式会社ニコン Solid-state imaging device having function of generating focus detection signal
JP2007127756A (en) * 2005-11-02 2007-05-24 Nikon Corp Image stabilizer, optical device, interchangeable lens and camera system
JP4710660B2 (en) * 2006-03-10 2011-06-29 株式会社ニコン Solid-state imaging device and electronic camera using the same
JP4952060B2 (en) 2006-05-26 2012-06-13 株式会社ニコン Imaging device
JP5076528B2 (en) * 2007-02-06 2012-11-21 株式会社ニコン Photoelectric conversion unit connection / separation structure, solid-state imaging device, and imaging apparatus
JP2008270298A (en) * 2007-04-16 2008-11-06 Nikon Corp Solid-state image sensor and imaging apparatus employing the same
JP2009289927A (en) * 2008-05-28 2009-12-10 Panasonic Corp Solid-state imaging device and method of manufacturing the same
JP5629995B2 (en) * 2009-09-07 2014-11-26 株式会社ニコン Imaging device and imaging apparatus
JP5651976B2 (en) * 2010-03-26 2015-01-14 ソニー株式会社 Solid-state imaging device, manufacturing method thereof, and electronic device
JP2011221253A (en) * 2010-04-08 2011-11-04 Sony Corp Imaging apparatus, solid-state image sensor, imaging method and program
JP5126291B2 (en) * 2010-06-07 2013-01-23 株式会社ニコン Solid-state image sensor
US8742309B2 (en) * 2011-01-28 2014-06-03 Aptina Imaging Corporation Imagers with depth sensing capabilities
JP6135677B2 (en) * 2012-10-19 2017-05-31 株式会社ニコン Imaging device and imaging apparatus
KR102009192B1 (en) * 2013-02-05 2019-08-09 삼성전자주식회사 Unit pixel of image sensor and image sensor including the same

Also Published As

Publication number Publication date
CN108551558B (en) 2021-03-09
JP6421836B2 (en) 2018-11-14
CN108551559A (en) 2018-09-18
EP2911203B1 (en) 2020-07-08
JPWO2014061820A1 (en) 2016-09-05
JP2017135422A (en) 2017-08-03
JP6135677B2 (en) 2017-05-31
US10580810B2 (en) 2020-03-03
US10038020B2 (en) 2018-07-31
CN108551558A (en) 2018-09-18
KR20150070376A (en) 2015-06-24
CN108551559B (en) 2021-06-22
US20180308885A1 (en) 2018-10-25
US9620558B2 (en) 2017-04-11
US20170179175A1 (en) 2017-06-22
US20160111469A1 (en) 2016-04-21
JP2018207121A (en) 2018-12-27
EP2911203A1 (en) 2015-08-26
JP7012619B2 (en) 2022-01-28
WO2014061820A1 (en) 2014-04-24
KR102125673B1 (en) 2020-06-23
EP2911203A4 (en) 2016-09-14
CN104871315A (en) 2015-08-26
CN104871315B (en) 2018-07-13

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