IN2015DN00119A - - Google Patents
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- Publication number
- IN2015DN00119A IN2015DN00119A IN119DEN2015A IN2015DN00119A IN 2015DN00119 A IN2015DN00119 A IN 2015DN00119A IN 119DEN2015 A IN119DEN2015 A IN 119DEN2015A IN 2015DN00119 A IN2015DN00119 A IN 2015DN00119A
- Authority
- IN
- India
- Prior art keywords
- reactive gas
- plasma
- gas flow
- measured
- partial pressure
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/3485—Sputtering using pulsed power to the target
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/3435—Applying energy to the substrate during sputtering
- C23C14/345—Applying energy to the substrate during sputtering using substrate bias
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/3464—Sputtering using more than one target
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
- H01J37/3402—Gas-filled discharge tubes operating with cathodic sputtering using supplementary magnetic fields
- H01J37/3405—Magnetron sputtering
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
- H01J37/3464—Operating strategies
- H01J37/3467—Pulsed operation, e.g. HIPIMS
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/32—Processing objects by plasma generation
- H01J2237/33—Processing objects by plasma generation characterised by the type of processing
- H01J2237/332—Coating
Abstract
The present invention relates to a method for determining the reactive gas consumption in a coating process using plasma comprising the following steps: a) admitting reactive gas into a coating chamber wherein the corresponding reactive gas flow is measured and at the same time the partial pressure prevailing in the coating chamber is measured without igniting a plasma; b) admitting reactive gas into a coating chamber wherein the corresponding reactive gas flow is measured and at the same time the partial pressure prevailing in the coating chamber is measured wherein a plasma is ignited. The method is characterized in that the steps a) and b) are carried out in the case of a plurality of different reactive gas flows and thus the partial pressure dependence of the reactive gas flow can be determined both with plasma or without plasma in the case of a given partial pressure deduction of the reactive gas flow value that has been determined without plasma from the reactive gas flow value that has been determined with plasma and equating the difference to the reactive gas consumption.
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE201210013577 DE102012013577A1 (en) | 2012-07-10 | 2012-07-10 | Pulsed Power coating method |
| PCT/EP2013/001914 WO2014008989A1 (en) | 2012-07-10 | 2013-06-29 | High-power pulse coating method |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| IN2015DN00119A true IN2015DN00119A (en) | 2015-05-29 |
Family
ID=48700524
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| IN119DEN2015 IN2015DN00119A (en) | 2012-07-10 | 2013-06-29 |
Country Status (16)
| Country | Link |
|---|---|
| US (2) | US10060026B2 (en) |
| EP (2) | EP2872665B1 (en) |
| JP (3) | JP6271533B2 (en) |
| KR (3) | KR102408543B1 (en) |
| CN (2) | CN104428442B (en) |
| AR (1) | AR091708A1 (en) |
| BR (2) | BR112015000253B1 (en) |
| CA (2) | CA2878324C (en) |
| DE (1) | DE102012013577A1 (en) |
| IN (1) | IN2015DN00119A (en) |
| MX (2) | MX2015000441A (en) |
| MY (2) | MY171167A (en) |
| PH (2) | PH12015500057B1 (en) |
| RU (2) | RU2015104267A (en) |
| SG (2) | SG11201500131PA (en) |
| WO (2) | WO2014008984A1 (en) |
Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20180334739A1 (en) * | 2015-11-10 | 2018-11-22 | Sandvik Intellectual Property Ab | Method for pre-treating a surface for coating |
| US11008650B2 (en) * | 2016-11-03 | 2021-05-18 | Starfire Industries Llc | Compact system for coupling RF power directly into RF linacs |
| US20210327694A1 (en) * | 2016-11-03 | 2021-10-21 | Starfire Industries Llc | System for coupling rf power into linacs and bellows coating by magnetron sputtering with kick pulse |
| CN109868450B (en) | 2017-12-05 | 2021-04-02 | 松下知识产权经营株式会社 | Sputtering method |
| CN110184571A (en) * | 2019-05-07 | 2019-08-30 | 天津君盛天成科技发展有限公司 | High power pulse coating process |
Family Cites Families (15)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2000353343A (en) * | 1999-06-11 | 2000-12-19 | Matsushita Electric Ind Co Ltd | Optical recording medium and production of optical recording medium and apparatus for production therefor |
| DE10039478A1 (en) | 2000-08-08 | 2002-02-28 | Cemecon Ceramic Metal Coatings | Sputtering component |
| WO2004050944A2 (en) | 2002-12-04 | 2004-06-17 | Leybold Optics Gmbh | Method for producing a multilayer coating and device for carrying out said method |
| WO2005036607A2 (en) * | 2003-10-08 | 2005-04-21 | Deposition Sciences, Inc. | System and method for feedforward control in thin film coating processes |
| DE102006017382A1 (en) * | 2005-11-14 | 2007-05-16 | Itg Induktionsanlagen Gmbh | Method and device for coating and / or treating surfaces |
| JP5238687B2 (en) * | 2006-04-21 | 2013-07-17 | コムコン・アーゲー | Coating |
| DE102006061324B4 (en) | 2006-06-20 | 2008-07-24 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | A method of controlling a high power reactive pulse magnetron sputtering process and apparatus therefor |
| SE533395C2 (en) * | 2007-06-08 | 2010-09-14 | Sandvik Intellectual Property | Ways to make PVD coatings |
| US7966909B2 (en) * | 2007-07-25 | 2011-06-28 | The Gillette Company | Process of forming a razor blade |
| WO2009071667A1 (en) * | 2007-12-07 | 2009-06-11 | Oc Oerlikon Balzers Ag | Reactive sputtering with hipims |
| US9812299B2 (en) | 2008-04-28 | 2017-11-07 | Cemecon Ag | Apparatus and method for pretreating and coating bodies |
| DE102008021912C5 (en) | 2008-05-01 | 2018-01-11 | Cemecon Ag | coating process |
| US8202820B2 (en) * | 2008-08-26 | 2012-06-19 | Northwestern University | Non-stoichiometric mixed-phase titania photocatalyst |
| EP2366488A1 (en) | 2010-03-19 | 2011-09-21 | Siemens Aktiengesellschaft | Method for reconditioning a turbine blade with at least one platform |
| DE102010028558A1 (en) | 2010-05-04 | 2011-11-10 | Walter Ag | PVD hybrid process for the deposition of mixed crystal layers |
-
2012
- 2012-07-10 DE DE201210013577 patent/DE102012013577A1/en not_active Withdrawn
-
2013
- 2013-06-24 SG SG11201500131PA patent/SG11201500131PA/en unknown
- 2013-06-24 MX MX2015000441A patent/MX2015000441A/en unknown
- 2013-06-24 KR KR1020217022307A patent/KR102408543B1/en active IP Right Grant
- 2013-06-24 US US14/413,480 patent/US10060026B2/en active Active
- 2013-06-24 MY MYPI2015000022A patent/MY171167A/en unknown
- 2013-06-24 KR KR20157001115A patent/KR20150030729A/en active Application Filing
- 2013-06-24 RU RU2015104267A patent/RU2015104267A/en unknown
- 2013-06-24 CA CA2878324A patent/CA2878324C/en active Active
- 2013-06-24 CN CN201380037131.0A patent/CN104428442B/en active Active
- 2013-06-24 JP JP2015520840A patent/JP6271533B2/en active Active
- 2013-06-24 BR BR112015000253-6A patent/BR112015000253B1/en active IP Right Grant
- 2013-06-24 WO PCT/EP2013/001853 patent/WO2014008984A1/en active Application Filing
- 2013-06-24 EP EP13732096.6A patent/EP2872665B1/en active Active
- 2013-06-29 JP JP2015520843A patent/JP6669496B2/en active Active
- 2013-06-29 SG SG11201500185SA patent/SG11201500185SA/en unknown
- 2013-06-29 CA CA2878536A patent/CA2878536C/en active Active
- 2013-06-29 KR KR1020157001850A patent/KR102209219B1/en active IP Right Grant
- 2013-06-29 EP EP13735196.1A patent/EP2872666B1/en active Active
- 2013-06-29 BR BR112015000350-8A patent/BR112015000350B1/en active IP Right Grant
- 2013-06-29 US US14/413,487 patent/US10392694B2/en active Active
- 2013-06-29 MX MX2015000444A patent/MX2015000444A/en unknown
- 2013-06-29 WO PCT/EP2013/001914 patent/WO2014008989A1/en active Application Filing
- 2013-06-29 CN CN201380037123.6A patent/CN104411863B/en active Active
- 2013-06-29 RU RU2015104164A patent/RU2015104164A/en unknown
- 2013-06-29 IN IN119DEN2015 patent/IN2015DN00119A/en unknown
- 2013-06-29 MY MYPI2015000044A patent/MY175241A/en unknown
- 2013-07-08 AR ARP130102431 patent/AR091708A1/en unknown
-
2015
- 2015-01-09 PH PH12015500057A patent/PH12015500057B1/en unknown
- 2015-01-09 PH PH12015500056A patent/PH12015500056A1/en unknown
-
2019
- 2019-01-08 JP JP2019001339A patent/JP2019090113A/en not_active Withdrawn
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