IN165372B - - Google Patents
Info
- Publication number
- IN165372B IN165372B IN255/CAL/82A IN255CA1982A IN165372B IN 165372 B IN165372 B IN 165372B IN 255CA1982 A IN255CA1982 A IN 255CA1982A IN 165372 B IN165372 B IN 165372B
- Authority
- IN
- India
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
- C23C16/505—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using radio frequency discharges
- C23C16/509—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using radio frequency discharges using internal electrodes
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/54—Apparatus specially adapted for continuous coating
- C23C16/545—Apparatus specially adapted for continuous coating for coating elongated substrates
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- Plasma & Fusion (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| IN1056/DEL/85A IN166755B (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) | 1981-03-16 | 1985-12-12 |
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US06/244,383 US4369730A (en) | 1981-03-16 | 1981-03-16 | Cathode for generating a plasma |
| US06/244,386 US4542711A (en) | 1981-03-16 | 1981-03-16 | Continuous system for depositing amorphous semiconductor material |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| IN165372B true IN165372B (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) | 1989-10-07 |
Family
ID=26936496
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| IN255/CAL/82A IN165372B (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) | 1981-03-16 | 1982-03-05 |
Country Status (9)
Families Citing this family (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4501766A (en) * | 1982-02-03 | 1985-02-26 | Tokyo Shibaura Denki Kabushiki Kaisha | Film depositing apparatus and a film depositing method |
| US4462333A (en) * | 1982-10-27 | 1984-07-31 | Energy Conversion Devices, Inc. | Process gas introduction, confinement and evacuation system for glow discharge deposition apparatus |
| US4483883A (en) * | 1982-12-22 | 1984-11-20 | Energy Conversion Devices, Inc. | Upstream cathode assembly |
| GB2132637A (en) * | 1983-01-03 | 1984-07-11 | Lfe Corp | Process for depositing dielectric films in a plasma glow discharge |
| AU584607B2 (en) * | 1984-02-17 | 1989-06-01 | Kanegafuchi Kagaku Kogyo Kabushiki Kaisha | Film forming method and apparatus |
| US4514437A (en) * | 1984-05-02 | 1985-04-30 | Energy Conversion Devices, Inc. | Apparatus for plasma assisted evaporation of thin films and corresponding method of deposition |
| US4608943A (en) * | 1984-10-24 | 1986-09-02 | Sovonics Solar Systems | Cathode assembly with localized profiling capabilities |
| US4626447A (en) * | 1985-03-18 | 1986-12-02 | Energy Conversion Devices, Inc. | Plasma confining apparatus |
| US4920917A (en) * | 1987-03-18 | 1990-05-01 | Teijin Limited | Reactor for depositing a layer on a moving substrate |
Family Cites Families (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| GB864869A (en) * | 1958-03-12 | 1961-04-12 | Ohio Commw Eng Co | A method of producing metallic patterns by gas plating |
| US3683846A (en) * | 1968-10-29 | 1972-08-15 | Texaco Inc | Filament plating system |
| US4048953A (en) * | 1974-06-19 | 1977-09-20 | Pfizer Inc. | Apparatus for vapor depositing pyrolytic carbon on porous sheets of carbon material |
| DE2538300B2 (de) * | 1975-08-28 | 1977-06-30 | Dornier System Gmbh, 7990 Friedrichshafen | Verfahren zur herstellung einer solarabsorberschicht |
| JPS5591968A (en) * | 1978-12-28 | 1980-07-11 | Canon Inc | Film forming method by glow discharge |
| US4209357A (en) * | 1979-05-18 | 1980-06-24 | Tegal Corporation | Plasma reactor apparatus |
-
1982
- 1982-03-03 EP EP19820301080 patent/EP0060651B1/en not_active Expired
- 1982-03-03 DE DE8282301080T patent/DE3272239D1/de not_active Expired
- 1982-03-05 IN IN255/CAL/82A patent/IN165372B/en unknown
- 1982-03-08 IE IE52282A patent/IE53099B1/en unknown
- 1982-03-14 EG EG13182A patent/EG15565A/xx active
- 1982-03-15 BR BR8201386A patent/BR8201386A/pt not_active IP Right Cessation
- 1982-03-16 IL IL6526182A patent/IL65261A/xx unknown
- 1982-03-16 MX MX19182782A patent/MX161183A/es unknown
- 1982-03-16 AU AU81541/82A patent/AU543823B2/en not_active Expired
-
1985
- 1985-02-21 AU AU39049/85A patent/AU547920B2/en not_active Expired
Also Published As
| Publication number | Publication date |
|---|---|
| IL65261A (en) | 1985-07-31 |
| AU543823B2 (en) | 1985-05-02 |
| EP0060651B1 (en) | 1986-07-30 |
| EP0060651A2 (en) | 1982-09-22 |
| BR8201386A (pt) | 1983-01-25 |
| IE820522L (en) | 1982-09-16 |
| IE53099B1 (en) | 1988-06-22 |
| AU8154182A (en) | 1982-11-04 |
| AU547920B2 (en) | 1985-11-14 |
| AU3904985A (en) | 1985-09-19 |
| DE3272239D1 (en) | 1986-09-04 |
| EG15565A (en) | 1986-09-30 |
| EP0060651A3 (en) | 1983-01-26 |
| MX161183A (es) | 1990-08-14 |