IL324087A - פיצוי על שינויים באיסוף של מכשיר אופטי סורק טעון חלקיקים - Google Patents

פיצוי על שינויים באיסוף של מכשיר אופטי סורק טעון חלקיקים

Info

Publication number
IL324087A
IL324087A IL324087A IL32408725A IL324087A IL 324087 A IL324087 A IL 324087A IL 324087 A IL324087 A IL 324087A IL 32408725 A IL32408725 A IL 32408725A IL 324087 A IL324087 A IL 324087A
Authority
IL
Israel
Prior art keywords
charged particle
variation
sample
view
optical apparatus
Prior art date
Application number
IL324087A
Other languages
English (en)
Inventor
Maikel Robert Goosen
Rens Jasper Frans Mathijs Van
Original Assignee
Asml Netherlands Bv
Maikel Robert Goosen
Rens Jasper Frans Mathijs Van
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Asml Netherlands Bv, Maikel Robert Goosen, Rens Jasper Frans Mathijs Van filed Critical Asml Netherlands Bv
Publication of IL324087A publication Critical patent/IL324087A/he

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/26Electron or ion microscopes; Electron or ion diffraction tubes
    • H01J37/261Details
    • H01J37/265Controlling the tube; circuit arrangements adapted to a particular application not otherwise provided, e.g. bright-field-dark-field illumination
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02Details
    • H01J37/244Detectors; Associated components or circuits therefor
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/26Electron or ion microscopes; Electron or ion diffraction tubes
    • H01J37/28Electron or ion microscopes; Electron or ion diffraction tubes with scanning beams
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/244Detection characterized by the detecting means
    • H01J2237/2446Position sensitive detectors
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/244Detection characterized by the detecting means
    • H01J2237/24495Signal processing, e.g. mixing of two or more signals
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/26Electron or ion microscopes
    • H01J2237/28Scanning microscopes
    • H01J2237/2809Scanning microscopes characterised by the imaging problems involved

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
IL324087A 2023-05-08 2025-10-20 פיצוי על שינויים באיסוף של מכשיר אופטי סורק טעון חלקיקים IL324087A (he)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
EP23172032 2023-05-08
PCT/EP2024/059497 WO2024231004A1 (en) 2023-05-08 2024-04-08 Compensating for collection variation of scanning charged particle-optical apparatus

Publications (1)

Publication Number Publication Date
IL324087A true IL324087A (he) 2025-12-01

Family

ID=86330428

Family Applications (1)

Application Number Title Priority Date Filing Date
IL324087A IL324087A (he) 2023-05-08 2025-10-20 פיצוי על שינויים באיסוף של מכשיר אופטי סורק טעון חלקיקים

Country Status (6)

Country Link
EP (1) EP4710358A1 (he)
KR (1) KR20260006580A (he)
CN (1) CN121153098A (he)
IL (1) IL324087A (he)
TW (1) TW202520320A (he)
WO (1) WO2024231004A1 (he)

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1271605A4 (en) * 2000-11-02 2009-09-02 Ebara Corp ELECTRON BEAM APPARATUS AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE COMPRISING SAID APPARATUS
JP2012018758A (ja) * 2010-07-06 2012-01-26 Hitachi High-Technologies Corp 走査電子顕微鏡
JP5948084B2 (ja) * 2012-02-28 2016-07-06 株式会社日立ハイテクノロジーズ 走査電子顕微鏡
US9691588B2 (en) 2015-03-10 2017-06-27 Hermes Microvision, Inc. Apparatus of plural charged-particle beams
US9922799B2 (en) 2015-07-21 2018-03-20 Hermes Microvision, Inc. Apparatus of plural charged-particle beams
IL294759B2 (he) 2015-07-22 2024-09-01 Asml Netherlands Bv מכשיר לאלומות חלקיקים טעונים מרובות

Also Published As

Publication number Publication date
KR20260006580A (ko) 2026-01-13
WO2024231004A1 (en) 2024-11-14
EP4710358A1 (en) 2026-03-18
CN121153098A (zh) 2025-12-16
TW202520320A (zh) 2025-05-16

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