IL32069A0 - Process and device for depositing under vacuum monocrystalline layers - Google Patents

Process and device for depositing under vacuum monocrystalline layers

Info

Publication number
IL32069A0
IL32069A0 IL32069A IL3206969A IL32069A0 IL 32069 A0 IL32069 A0 IL 32069A0 IL 32069 A IL32069 A IL 32069A IL 3206969 A IL3206969 A IL 3206969A IL 32069 A0 IL32069 A0 IL 32069A0
Authority
IL
Israel
Prior art keywords
under vacuum
monocrystalline layers
depositing under
depositing
monocrystalline
Prior art date
Application number
IL32069A
Other languages
English (en)
Original Assignee
Euratom
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Euratom filed Critical Euratom
Publication of IL32069A0 publication Critical patent/IL32069A0/xx

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/32—Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
IL32069A 1968-06-28 1969-04-24 Process and device for depositing under vacuum monocrystalline layers IL32069A0 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
BE60325 1968-06-28

Publications (1)

Publication Number Publication Date
IL32069A0 true IL32069A0 (en) 1969-06-25

Family

ID=3841035

Family Applications (1)

Application Number Title Priority Date Filing Date
IL32069A IL32069A0 (en) 1968-06-28 1969-04-24 Process and device for depositing under vacuum monocrystalline layers

Country Status (7)

Country Link
US (1) US3693583A (de)
AT (1) AT289501B (de)
DE (1) DE1916818A1 (de)
FR (1) FR2011775A1 (de)
IL (1) IL32069A0 (de)
LU (1) LU58440A1 (de)
NO (1) NO124319B (de)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3776181A (en) * 1970-02-02 1973-12-04 Ransburg Electro Coating Corp Deposition apparatus for an organometallic material
US3928672A (en) * 1970-05-18 1975-12-23 Sperry Rand Corp Process for providing a hard coating to magnetic transducing heads
DE19605335C1 (de) * 1996-02-14 1997-04-03 Fraunhofer Ges Forschung Verfahren und Einrichtung zur Regelung eines Vakuumbedampfungsprozesses
FR3020381B1 (fr) * 2014-04-24 2017-09-29 Riber Cellule d'evaporation

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2391595A (en) * 1942-11-27 1945-12-25 Vard Inc Nonreflective lens coating
US2771568A (en) * 1951-01-31 1956-11-20 Zeiss Carl Utilizing electron energy for physically and chemically changing members
US2932588A (en) * 1955-07-06 1960-04-12 English Electric Valve Co Ltd Methods of manufacturing thin films of refractory dielectric materials
US3330251A (en) * 1955-11-02 1967-07-11 Siemens Ag Apparatus for producing highest-purity silicon for electric semiconductor devices
US3243174A (en) * 1960-03-08 1966-03-29 Chilean Nitrate Sales Corp Dissociation-deposition apparatus for the production of metals
US3192892A (en) * 1961-11-24 1965-07-06 Sperry Rand Corp Ion bombardment cleaning and coating apparatus
US3347701A (en) * 1963-02-05 1967-10-17 Fujitsu Ltd Method and apparatus for vapor deposition employing an electron beam
DE1244733B (de) * 1963-11-05 1967-07-20 Siemens Ag Vorrichtung zum Aufwachsen einkristalliner Halbleitermaterialschichten auf einkristallinen Grundkoerpern
US3344054A (en) * 1964-03-02 1967-09-26 Schjeldahl Co G T Art of controlling sputtering and metal evaporation by means of a plane acceptor
US3361591A (en) * 1964-04-15 1968-01-02 Hughes Aircraft Co Production of thin films of cadmium sulfide, cadmium telluride or cadmium selenide
DE1521494B1 (de) * 1966-02-25 1970-11-26 Siemens Ag Vorrichtung zum Eindiffundieren von Fremdstoffen in Halbleiterkoerper
US3437734A (en) * 1966-06-21 1969-04-08 Isofilm Intern Apparatus and method for effecting the restructuring of materials
US3375804A (en) * 1966-08-05 1968-04-02 Fabri Tek Inc Film deposition apparatus
US3552352A (en) * 1968-02-13 1971-01-05 Du Pont Electron beam vaporization coating apparatus

Also Published As

Publication number Publication date
NO124319B (de) 1972-04-04
FR2011775A1 (de) 1970-03-06
AT289501B (de) 1971-04-26
US3693583A (en) 1972-09-26
DE1916818A1 (de) 1970-03-12
LU58440A1 (de) 1969-07-21

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