LU58440A1 - - Google Patents
Info
- Publication number
- LU58440A1 LU58440A1 LU58440DA LU58440A1 LU 58440 A1 LU58440 A1 LU 58440A1 LU 58440D A LU58440D A LU 58440DA LU 58440 A1 LU58440 A1 LU 58440A1
- Authority
- LU
- Luxembourg
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/32—Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| BE60325 | 1968-06-28 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| LU58440A1 true LU58440A1 (de) | 1969-07-21 |
Family
ID=3841035
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| LU58440D LU58440A1 (de) | 1968-06-28 | 1969-04-17 |
Country Status (7)
| Country | Link |
|---|---|
| US (1) | US3693583A (de) |
| AT (1) | AT289501B (de) |
| DE (1) | DE1916818A1 (de) |
| FR (1) | FR2011775A1 (de) |
| IL (1) | IL32069A0 (de) |
| LU (1) | LU58440A1 (de) |
| NO (1) | NO124319B (de) |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3776181A (en) * | 1970-02-02 | 1973-12-04 | Ransburg Electro Coating Corp | Deposition apparatus for an organometallic material |
| US3928672A (en) * | 1970-05-18 | 1975-12-23 | Sperry Rand Corp | Process for providing a hard coating to magnetic transducing heads |
| DE19605335C1 (de) * | 1996-02-14 | 1997-04-03 | Fraunhofer Ges Forschung | Verfahren und Einrichtung zur Regelung eines Vakuumbedampfungsprozesses |
| FR3020381B1 (fr) * | 2014-04-24 | 2017-09-29 | Riber | Cellule d'evaporation |
Family Cites Families (14)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US2391595A (en) * | 1942-11-27 | 1945-12-25 | Vard Inc | Nonreflective lens coating |
| US2771568A (en) * | 1951-01-31 | 1956-11-20 | Zeiss Carl | Utilizing electron energy for physically and chemically changing members |
| US2932588A (en) * | 1955-07-06 | 1960-04-12 | English Electric Valve Co Ltd | Methods of manufacturing thin films of refractory dielectric materials |
| US3330251A (en) * | 1955-11-02 | 1967-07-11 | Siemens Ag | Apparatus for producing highest-purity silicon for electric semiconductor devices |
| US3243174A (en) * | 1960-03-08 | 1966-03-29 | Chilean Nitrate Sales Corp | Dissociation-deposition apparatus for the production of metals |
| US3192892A (en) * | 1961-11-24 | 1965-07-06 | Sperry Rand Corp | Ion bombardment cleaning and coating apparatus |
| US3347701A (en) * | 1963-02-05 | 1967-10-17 | Fujitsu Ltd | Method and apparatus for vapor deposition employing an electron beam |
| DE1244733B (de) * | 1963-11-05 | 1967-07-20 | Siemens Ag | Vorrichtung zum Aufwachsen einkristalliner Halbleitermaterialschichten auf einkristallinen Grundkoerpern |
| US3344054A (en) * | 1964-03-02 | 1967-09-26 | Schjeldahl Co G T | Art of controlling sputtering and metal evaporation by means of a plane acceptor |
| US3361591A (en) * | 1964-04-15 | 1968-01-02 | Hughes Aircraft Co | Production of thin films of cadmium sulfide, cadmium telluride or cadmium selenide |
| DE1521494B1 (de) * | 1966-02-25 | 1970-11-26 | Siemens Ag | Vorrichtung zum Eindiffundieren von Fremdstoffen in Halbleiterkoerper |
| US3437734A (en) * | 1966-06-21 | 1969-04-08 | Isofilm Intern | Apparatus and method for effecting the restructuring of materials |
| US3375804A (en) * | 1966-08-05 | 1968-04-02 | Fabri Tek Inc | Film deposition apparatus |
| US3552352A (en) * | 1968-02-13 | 1971-01-05 | Du Pont | Electron beam vaporization coating apparatus |
-
1969
- 1969-03-28 DE DE19691916818 patent/DE1916818A1/de active Pending
- 1969-04-17 LU LU58440D patent/LU58440A1/xx unknown
- 1969-04-22 US US818270A patent/US3693583A/en not_active Expired - Lifetime
- 1969-04-24 IL IL32069A patent/IL32069A0/xx unknown
- 1969-05-28 AT AT506169A patent/AT289501B/de not_active IP Right Cessation
- 1969-06-23 NO NO2602/69A patent/NO124319B/no unknown
- 1969-06-27 FR FR6921855A patent/FR2011775A1/fr not_active Withdrawn
Also Published As
| Publication number | Publication date |
|---|---|
| IL32069A0 (en) | 1969-06-25 |
| NO124319B (de) | 1972-04-04 |
| FR2011775A1 (de) | 1970-03-06 |
| AT289501B (de) | 1971-04-26 |
| US3693583A (en) | 1972-09-26 |
| DE1916818A1 (de) | 1970-03-12 |