IL297618B2 - אימון בחירת מצב וגילוי פגמים - Google Patents
אימון בחירת מצב וגילוי פגמיםInfo
- Publication number
- IL297618B2 IL297618B2 IL297618A IL29761822A IL297618B2 IL 297618 B2 IL297618 B2 IL 297618B2 IL 297618 A IL297618 A IL 297618A IL 29761822 A IL29761822 A IL 29761822A IL 297618 B2 IL297618 B2 IL 297618B2
- Authority
- IL
- Israel
- Prior art keywords
- mode selection
- defect
- optical
- optical modes
- model
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
- G01N21/8851—Scan or image signal processing specially adapted therefor, e.g. for scan signal adjustment, for detecting different kinds of defects, for compensating for structures, markings, edges
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
- G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
- G01N21/9501—Semiconductor wafers
-
- G—PHYSICS
- G06—COMPUTING OR CALCULATING; COUNTING
- G06N—COMPUTING ARRANGEMENTS BASED ON SPECIFIC COMPUTATIONAL MODELS
- G06N3/00—Computing arrangements based on biological models
- G06N3/02—Neural networks
- G06N3/08—Learning methods
- G06N3/082—Learning methods modifying the architecture, e.g. adding, deleting or silencing nodes or connections
-
- G—PHYSICS
- G06—COMPUTING OR CALCULATING; COUNTING
- G06T—IMAGE DATA PROCESSING OR GENERATION, IN GENERAL
- G06T7/00—Image analysis
- G06T7/0002—Inspection of images, e.g. flaw detection
- G06T7/0004—Industrial image inspection
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
- G01N21/8851—Scan or image signal processing specially adapted therefor, e.g. for scan signal adjustment, for detecting different kinds of defects, for compensating for structures, markings, edges
- G01N2021/8854—Grading and classifying of flaws
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
- G01N21/8851—Scan or image signal processing specially adapted therefor, e.g. for scan signal adjustment, for detecting different kinds of defects, for compensating for structures, markings, edges
- G01N2021/8883—Scan or image signal processing specially adapted therefor, e.g. for scan signal adjustment, for detecting different kinds of defects, for compensating for structures, markings, edges involving the calculation of gauges, generating models
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
- G01N21/8851—Scan or image signal processing specially adapted therefor, e.g. for scan signal adjustment, for detecting different kinds of defects, for compensating for structures, markings, edges
- G01N2021/8887—Scan or image signal processing specially adapted therefor, e.g. for scan signal adjustment, for detecting different kinds of defects, for compensating for structures, markings, edges based on image processing techniques
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N2201/00—Features of devices classified in G01N21/00
- G01N2201/12—Circuits of general importance; Signal processing
- G01N2201/129—Using chemometrical methods
- G01N2201/1296—Using chemometrical methods using neural networks
-
- G—PHYSICS
- G06—COMPUTING OR CALCULATING; COUNTING
- G06N—COMPUTING ARRANGEMENTS BASED ON SPECIFIC COMPUTATIONAL MODELS
- G06N5/00—Computing arrangements using knowledge-based models
- G06N5/01—Dynamic search techniques; Heuristics; Dynamic trees; Branch-and-bound
-
- G—PHYSICS
- G06—COMPUTING OR CALCULATING; COUNTING
- G06T—IMAGE DATA PROCESSING OR GENERATION, IN GENERAL
- G06T2207/00—Indexing scheme for image analysis or image enhancement
- G06T2207/20—Special algorithmic details
- G06T2207/20081—Training; Learning
-
- G—PHYSICS
- G06—COMPUTING OR CALCULATING; COUNTING
- G06T—IMAGE DATA PROCESSING OR GENERATION, IN GENERAL
- G06T2207/00—Indexing scheme for image analysis or image enhancement
- G06T2207/20—Special algorithmic details
- G06T2207/20084—Artificial neural networks [ANN]
-
- G—PHYSICS
- G06—COMPUTING OR CALCULATING; COUNTING
- G06T—IMAGE DATA PROCESSING OR GENERATION, IN GENERAL
- G06T2207/00—Indexing scheme for image analysis or image enhancement
- G06T2207/30—Subject of image; Context of image processing
- G06T2207/30108—Industrial image inspection
- G06T2207/30148—Semiconductor; IC; Wafer
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Theoretical Computer Science (AREA)
- Health & Medical Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- General Health & Medical Sciences (AREA)
- Computer Vision & Pattern Recognition (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Biochemistry (AREA)
- Immunology (AREA)
- Pathology (AREA)
- Quality & Reliability (AREA)
- Artificial Intelligence (AREA)
- Biomedical Technology (AREA)
- Biophysics (AREA)
- Computational Linguistics (AREA)
- Data Mining & Analysis (AREA)
- Evolutionary Computation (AREA)
- Molecular Biology (AREA)
- Computing Systems (AREA)
- General Engineering & Computer Science (AREA)
- Mathematical Physics (AREA)
- Software Systems (AREA)
- Signal Processing (AREA)
- Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
- Investigating Or Analyzing Materials By The Use Of Ultrasonic Waves (AREA)
- Interface Circuits In Exchanges (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US202063027975P | 2020-05-21 | 2020-05-21 | |
| US17/128,502 US11769242B2 (en) | 2020-05-21 | 2020-12-21 | Mode selection and defect detection training |
| PCT/US2021/032661 WO2021236473A1 (en) | 2020-05-21 | 2021-05-17 | Mode selection and defect detection training |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| IL297618A IL297618A (he) | 2022-12-01 |
| IL297618B1 IL297618B1 (he) | 2025-05-01 |
| IL297618B2 true IL297618B2 (he) | 2025-09-01 |
Family
ID=78608155
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| IL297618A IL297618B2 (he) | 2020-05-21 | 2021-05-17 | אימון בחירת מצב וגילוי פגמים |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US11769242B2 (he) |
| KR (1) | KR102735958B1 (he) |
| CN (1) | CN115516293A (he) |
| IL (1) | IL297618B2 (he) |
| TW (1) | TWI868343B (he) |
| WO (1) | WO2021236473A1 (he) |
Families Citing this family (13)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US10607484B2 (en) | 2017-12-28 | 2020-03-31 | Intel Corporation | Privacy-preserving distributed visual data processing |
| DE112018006630T5 (de) * | 2017-12-28 | 2020-09-24 | Intel Corporation | Visual fog |
| JP7604190B2 (ja) * | 2020-11-25 | 2024-12-23 | キヤノン株式会社 | 検査システム、管理装置、検査方法、プログラム、記録媒体および物品の製造方法 |
| TWI801038B (zh) * | 2021-12-16 | 2023-05-01 | 新加坡商鴻運科股份有限公司 | 瑕疵檢測方法、系統、電子設備及介質 |
| US20230306579A1 (en) * | 2022-03-28 | 2023-09-28 | Intel Corporation | Registration metrology tool using darkfield and phase contrast imaging |
| US11921052B2 (en) * | 2022-03-31 | 2024-03-05 | Kla Corporation | Inspection with previous step subtraction |
| US11922619B2 (en) | 2022-03-31 | 2024-03-05 | Kla Corporation | Context-based defect inspection |
| WO2023248355A1 (ja) * | 2022-06-21 | 2023-12-28 | 株式会社日立ハイテク | 不適合検出装置、および、不適合検出方法 |
| CN117408931A (zh) * | 2022-07-06 | 2024-01-16 | 纬创资通(昆山)有限公司 | 影像缺陷检测系统、其产生方法及计算机可读取记录媒体 |
| WO2024039785A1 (en) * | 2022-08-18 | 2024-02-22 | Onto Innovation Inc. | Substrate defect-detection and comparison |
| US12480890B2 (en) * | 2023-07-14 | 2025-11-25 | Kla Corporation | Deep learning based mode selection for inspection |
| US20250071419A1 (en) * | 2023-08-22 | 2025-02-27 | Kla Corporation | Recommender systems and methods for autonomous mode selection in inspection and other tools |
| CN119810098B (zh) * | 2025-03-12 | 2025-05-13 | 宝鸡东宇汽车部件有限公司 | 一种汽车管件缺陷检测方法及系统 |
Family Cites Families (14)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP5427609B2 (ja) | 2006-12-19 | 2014-02-26 | ケーエルエー−テンカー・コーポレーション | 検査レシピ作成システムおよびその方法 |
| US10354929B2 (en) | 2012-05-08 | 2019-07-16 | Kla-Tencor Corporation | Measurement recipe optimization based on spectral sensitivity and process variation |
| US10346740B2 (en) | 2016-06-01 | 2019-07-09 | Kla-Tencor Corp. | Systems and methods incorporating a neural network and a forward physical model for semiconductor applications |
| US10223615B2 (en) | 2016-08-23 | 2019-03-05 | Dongfang Jingyuan Electron Limited | Learning based defect classification |
| US10115040B2 (en) | 2016-09-14 | 2018-10-30 | Kla-Tencor Corporation | Convolutional neural network-based mode selection and defect classification for image fusion |
| US11580398B2 (en) | 2016-10-14 | 2023-02-14 | KLA-Tenor Corp. | Diagnostic systems and methods for deep learning models configured for semiconductor applications |
| US10510633B1 (en) | 2018-07-16 | 2019-12-17 | Taiwan Semiconductor Manufacturing Co., Ltd. | Package and printed circuit board attachment |
| US11668655B2 (en) | 2018-07-20 | 2023-06-06 | Kla Corporation | Multimode defect classification in semiconductor inspection |
| US10867108B2 (en) * | 2018-09-18 | 2020-12-15 | Taiwan Semiconductor Manufacturing Co., Ltd. | Optical mode optimization for wafer inspection |
| US10832396B2 (en) | 2018-10-19 | 2020-11-10 | Kla-Tencor Corp. | And noise based care areas |
| US11037289B2 (en) | 2018-10-26 | 2021-06-15 | Taiwan Semiconductor Manufacturing Company Ltd. | Method and system for scanning wafer |
| US10801968B2 (en) | 2018-10-26 | 2020-10-13 | Kla-Tencor Corporation | Algorithm selector based on image frames |
| US11468553B2 (en) | 2018-11-02 | 2022-10-11 | Kla Corporation | System and method for determining type and size of defects on blank reticles |
| EP3705962A1 (de) * | 2019-03-07 | 2020-09-09 | Siemens Aktiengesellschaft | Verfahren und system zur qualitätskontrolle in der industriellen fertigung |
-
2020
- 2020-12-21 US US17/128,502 patent/US11769242B2/en active Active
-
2021
- 2021-04-08 TW TW110112673A patent/TWI868343B/zh active
- 2021-05-17 CN CN202180032403.2A patent/CN115516293A/zh active Pending
- 2021-05-17 KR KR1020227043951A patent/KR102735958B1/ko active Active
- 2021-05-17 WO PCT/US2021/032661 patent/WO2021236473A1/en not_active Ceased
- 2021-05-17 IL IL297618A patent/IL297618B2/he unknown
Also Published As
| Publication number | Publication date |
|---|---|
| TW202208840A (zh) | 2022-03-01 |
| KR20230011375A (ko) | 2023-01-20 |
| IL297618A (he) | 2022-12-01 |
| CN115516293A (zh) | 2022-12-23 |
| TWI868343B (zh) | 2025-01-01 |
| KR102735958B1 (ko) | 2024-11-28 |
| WO2021236473A1 (en) | 2021-11-25 |
| US11769242B2 (en) | 2023-09-26 |
| US20210366103A1 (en) | 2021-11-25 |
| IL297618B1 (he) | 2025-05-01 |
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