IL291350A - - Google Patents
Info
- Publication number
- IL291350A IL291350A IL29135022A IL29135022A IL291350A IL 291350 A IL291350 A IL 291350A IL 29135022 A IL29135022 A IL 29135022A IL 29135022 A IL29135022 A IL 29135022A IL 291350 A IL291350 A IL 291350A
- Authority
- IL
- Israel
Links
Classifications
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
- G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
- G01N21/956—Inspecting patterns on the surface of objects
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- G—PHYSICS
- G06—COMPUTING; CALCULATING OR COUNTING
- G06T—IMAGE DATA PROCESSING OR GENERATION, IN GENERAL
- G06T7/00—Image analysis
- G06T7/0002—Inspection of images, e.g. flaw detection
- G06T7/0004—Industrial image inspection
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- G—PHYSICS
- G06—COMPUTING; CALCULATING OR COUNTING
- G06T—IMAGE DATA PROCESSING OR GENERATION, IN GENERAL
- G06T7/00—Image analysis
- G06T7/0002—Inspection of images, e.g. flaw detection
- G06T7/0004—Industrial image inspection
- G06T7/001—Industrial image inspection using an image reference approach
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/01—Arrangements or apparatus for facilitating the optical investigation
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
- G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
- G03F1/82—Auxiliary processes, e.g. cleaning or inspecting
- G03F1/84—Inspecting
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- G—PHYSICS
- G06—COMPUTING; CALCULATING OR COUNTING
- G06T—IMAGE DATA PROCESSING OR GENERATION, IN GENERAL
- G06T7/00—Image analysis
- G06T7/10—Segmentation; Edge detection
- G06T7/13—Edge detection
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- G—PHYSICS
- G06—COMPUTING; CALCULATING OR COUNTING
- G06T—IMAGE DATA PROCESSING OR GENERATION, IN GENERAL
- G06T7/00—Image analysis
- G06T7/30—Determination of transform parameters for the alignment of images, i.e. image registration
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/01—Arrangements or apparatus for facilitating the optical investigation
- G01N2021/0106—General arrangement of respective parts
- G01N2021/0112—Apparatus in one mechanical, optical or electronic block
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
- G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
- G01N21/956—Inspecting patterns on the surface of objects
- G01N2021/95676—Masks, reticles, shadow masks
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- G—PHYSICS
- G06—COMPUTING; CALCULATING OR COUNTING
- G06T—IMAGE DATA PROCESSING OR GENERATION, IN GENERAL
- G06T2207/00—Indexing scheme for image analysis or image enhancement
- G06T2207/30—Subject of image; Context of image processing
- G06T2207/30108—Industrial image inspection
- G06T2207/30148—Semiconductor; IC; Wafer
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Theoretical Computer Science (AREA)
- Computer Vision & Pattern Recognition (AREA)
- Biochemistry (AREA)
- Immunology (AREA)
- Life Sciences & Earth Sciences (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Pathology (AREA)
- General Health & Medical Sciences (AREA)
- Health & Medical Sciences (AREA)
- Quality & Reliability (AREA)
- Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
- Testing Or Measuring Of Semiconductors Or The Like (AREA)
- Length Measuring Devices By Optical Means (AREA)
- Pharmaceuticals Containing Other Organic And Inorganic Compounds (AREA)
- Analysing Materials By The Use Of Radiation (AREA)
- Physical Deposition Of Substances That Are Components Of Semiconductor Devices (AREA)
Priority Applications (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| IL291350A IL291350B2 (en) | 2022-03-14 | 2022-03-14 | Mask testing for the production of semiconductor samples |
| TW112103644A TW202407638A (zh) | 2022-03-14 | 2023-02-02 | 半導體樣品製造的遮罩檢查 |
| KR1020230031114A KR20230134442A (ko) | 2022-03-14 | 2023-03-09 | 반도체 시편 제조를 위한 마스크 검사 |
| CN202310257817.6A CN116754580A (zh) | 2022-03-14 | 2023-03-10 | 半导体样品制造的掩模检查 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| IL291350A IL291350B2 (en) | 2022-03-14 | 2022-03-14 | Mask testing for the production of semiconductor samples |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| IL291350A true IL291350A (ko) | 2022-04-01 |
| IL291350B1 IL291350B1 (ko) | 2023-02-01 |
| IL291350B2 IL291350B2 (en) | 2023-06-01 |
Family
ID=87202470
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| IL291350A IL291350B2 (en) | 2022-03-14 | 2022-03-14 | Mask testing for the production of semiconductor samples |
Country Status (4)
| Country | Link |
|---|---|
| KR (1) | KR20230134442A (ko) |
| CN (1) | CN116754580A (ko) |
| IL (1) | IL291350B2 (ko) |
| TW (1) | TW202407638A (ko) |
Family Cites Families (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US8463016B2 (en) * | 2010-02-05 | 2013-06-11 | Luminescent Technologies, Inc. | Extending the field of view of a mask-inspection image |
| US9311700B2 (en) * | 2012-09-24 | 2016-04-12 | Kla-Tencor Corporation | Model-based registration and critical dimension metrology |
| DE102015213045B4 (de) * | 2015-07-13 | 2018-05-24 | Carl Zeiss Smt Gmbh | Verfahren und Vorrichtung zur Positionsbestimmung von Strukturelementen einer photolithographischen Maske |
| US10572990B2 (en) * | 2017-04-07 | 2020-02-25 | Nuflare Technology, Inc. | Pattern inspection apparatus, pattern position measurement apparatus, aerial image measurement system, method for measuring aerial image, pattern position repairing apparatus, method for repairing pattern position, aerial image data processing apparatus, method for processing aerial image data, pattern exposure apparatus, method for exposing pattern, method for manufacturing mask, and mask manufacturing system |
| US11270430B2 (en) * | 2017-05-23 | 2022-03-08 | Kla-Tencor Corporation | Wafer inspection using difference images |
| KR102507304B1 (ko) * | 2017-10-30 | 2023-03-07 | 삼성전자주식회사 | 결함 검사 방법 및 이를 이용한 반도체 소자의 제조 방법 |
| US11348224B2 (en) * | 2019-09-11 | 2022-05-31 | Applied Materials Israel Ltd. | Mask inspection of a semiconductor specimen |
-
2022
- 2022-03-14 IL IL291350A patent/IL291350B2/en unknown
-
2023
- 2023-02-02 TW TW112103644A patent/TW202407638A/zh unknown
- 2023-03-09 KR KR1020230031114A patent/KR20230134442A/ko unknown
- 2023-03-10 CN CN202310257817.6A patent/CN116754580A/zh active Pending
Also Published As
| Publication number | Publication date |
|---|---|
| CN116754580A (zh) | 2023-09-15 |
| IL291350B2 (en) | 2023-06-01 |
| TW202407638A (zh) | 2024-02-16 |
| KR20230134442A (ko) | 2023-09-21 |
| IL291350B1 (ko) | 2023-02-01 |