IL282726A - Process optimization using design of experiments and response surface models - Google Patents
Process optimization using design of experiments and response surface modelsInfo
- Publication number
- IL282726A IL282726A IL282726A IL28272621A IL282726A IL 282726 A IL282726 A IL 282726A IL 282726 A IL282726 A IL 282726A IL 28272621 A IL28272621 A IL 28272621A IL 282726 A IL282726 A IL 282726A
- Authority
- IL
- Israel
- Prior art keywords
- experiments
- design
- response surface
- process optimization
- surface models
- Prior art date
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L22/00—Testing or measuring during manufacture or treatment; Reliability measurements, i.e. testing of parts without further processing to modify the parts as such; Structural arrangements therefor
- H01L22/30—Structural arrangements specially adapted for testing or measuring during manufacture or treatment, or specially adapted for reliability measurements
- H01L22/34—Circuits for electrically characterising or monitoring manufacturing processes, e. g. whole test die, wafers filled with test structures, on-board-devices incorporated on each die, process control monitors or pad structures thereof, devices in scribe line
-
- G—PHYSICS
- G05—CONTROLLING; REGULATING
- G05B—CONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
- G05B19/00—Programme-control systems
- G05B19/02—Programme-control systems electric
- G05B19/04—Programme control other than numerical control, i.e. in sequence controllers or logic controllers
- G05B19/042—Programme control other than numerical control, i.e. in sequence controllers or logic controllers using digital processors
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67242—Apparatus for monitoring, sorting or marking
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L22/00—Testing or measuring during manufacture or treatment; Reliability measurements, i.e. testing of parts without further processing to modify the parts as such; Structural arrangements therefor
- H01L22/10—Measuring as part of the manufacturing process
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L22/00—Testing or measuring during manufacture or treatment; Reliability measurements, i.e. testing of parts without further processing to modify the parts as such; Structural arrangements therefor
- H01L22/10—Measuring as part of the manufacturing process
- H01L22/12—Measuring as part of the manufacturing process for structural parameters, e.g. thickness, line width, refractive index, temperature, warp, bond strength, defects, optical inspection, electrical measurement of structural dimensions, metallurgic measurement of diffusions
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L22/00—Testing or measuring during manufacture or treatment; Reliability measurements, i.e. testing of parts without further processing to modify the parts as such; Structural arrangements therefor
- H01L22/20—Sequence of activities consisting of a plurality of measurements, corrections, marking or sorting steps
- H01L22/24—Optical enhancement of defects or not directly visible states, e.g. selective electrolytic deposition, bubbles in liquids, light emission, colour change
-
- G—PHYSICS
- G05—CONTROLLING; REGULATING
- G05B—CONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
- G05B2219/00—Program-control systems
- G05B2219/30—Nc systems
- G05B2219/45—Nc applications
- G05B2219/45031—Manufacturing semiconductor wafers
Landscapes
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Automation & Control Theory (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Testing Or Measuring Of Semiconductors Or The Like (AREA)
- Length Measuring Devices By Optical Means (AREA)
- Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US201862770647P | 2018-11-21 | 2018-11-21 | |
US16/594,845 US11062928B2 (en) | 2019-10-07 | 2019-10-07 | Process optimization using design of experiments and response surface models |
PCT/US2019/062308 WO2020106784A1 (en) | 2018-11-21 | 2019-11-20 | Process optimization using design of experiments and response surface models |
Publications (1)
Publication Number | Publication Date |
---|---|
IL282726A true IL282726A (en) | 2021-06-30 |
Family
ID=70774217
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
IL282726A IL282726A (en) | 2018-11-21 | 2021-04-28 | Process optimization using design of experiments and response surface models |
Country Status (6)
Country | Link |
---|---|
JP (1) | JP7329597B2 (en) |
KR (1) | KR102548663B1 (en) |
CN (1) | CN113039632B (en) |
IL (1) | IL282726A (en) |
SG (1) | SG11202104655QA (en) |
WO (1) | WO2020106784A1 (en) |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP7496498B2 (en) | 2020-08-27 | 2024-06-07 | パナソニックIpマネジメント株式会社 | Information processing method, program, and information processing device |
JP7496497B2 (en) | 2020-08-27 | 2024-06-07 | パナソニックIpマネジメント株式会社 | Information processing method, program, and information processing device |
Family Cites Families (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6965808B1 (en) * | 2004-04-28 | 2005-11-15 | International Business Machines Corporation | System and method for optimizing metrology sampling in APC applications |
US7065423B2 (en) * | 2004-07-08 | 2006-06-20 | Timbre Technologies, Inc. | Optical metrology model optimization for process control |
US7269526B2 (en) * | 2005-05-04 | 2007-09-11 | Hitachi Global Storage Technologies Netherlands B.V. | Aggregated run-to-run process control for wafer yield optimization |
JP2007285906A (en) | 2006-04-18 | 2007-11-01 | Hitachi High-Technologies Corp | Charged particle beam system and measuring parameter setting method |
US9076827B2 (en) * | 2010-09-14 | 2015-07-07 | Applied Materials, Inc. | Transfer chamber metrology for improved device yield |
US20140214192A1 (en) * | 2013-01-25 | 2014-07-31 | Dmo Systems Limited | Apparatus For Design-Based Manufacturing Optimization In Semiconductor Fab |
US9255877B2 (en) * | 2013-05-21 | 2016-02-09 | Kla-Tencor Corporation | Metrology system optimization for parameter tracking |
US9412673B2 (en) * | 2013-08-23 | 2016-08-09 | Kla-Tencor Corporation | Multi-model metrology |
WO2017147261A1 (en) * | 2016-02-24 | 2017-08-31 | Kla-Tencor Corporation | Accuracy improvements in optical metrology |
-
2019
- 2019-11-20 SG SG11202104655QA patent/SG11202104655QA/en unknown
- 2019-11-20 KR KR1020217019000A patent/KR102548663B1/en active IP Right Grant
- 2019-11-20 WO PCT/US2019/062308 patent/WO2020106784A1/en active Application Filing
- 2019-11-20 CN CN201980073210.4A patent/CN113039632B/en active Active
- 2019-11-20 JP JP2021528440A patent/JP7329597B2/en active Active
-
2021
- 2021-04-28 IL IL282726A patent/IL282726A/en unknown
Also Published As
Publication number | Publication date |
---|---|
JP7329597B2 (en) | 2023-08-18 |
CN113039632A (en) | 2021-06-25 |
SG11202104655QA (en) | 2021-06-29 |
KR20210080585A (en) | 2021-06-30 |
CN113039632B (en) | 2022-03-25 |
WO2020106784A1 (en) | 2020-05-28 |
JP2022507871A (en) | 2022-01-18 |
KR102548663B1 (en) | 2023-06-27 |
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