IL282726A - Process optimization using design of experiments and response surface models - Google Patents

Process optimization using design of experiments and response surface models

Info

Publication number
IL282726A
IL282726A IL282726A IL28272621A IL282726A IL 282726 A IL282726 A IL 282726A IL 282726 A IL282726 A IL 282726A IL 28272621 A IL28272621 A IL 28272621A IL 282726 A IL282726 A IL 282726A
Authority
IL
Israel
Prior art keywords
experiments
design
response surface
process optimization
surface models
Prior art date
Application number
IL282726A
Other languages
Hebrew (he)
Original Assignee
Kla Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from US16/594,845 external-priority patent/US11062928B2/en
Application filed by Kla Corp filed Critical Kla Corp
Publication of IL282726A publication Critical patent/IL282726A/en

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L22/00Testing or measuring during manufacture or treatment; Reliability measurements, i.e. testing of parts without further processing to modify the parts as such; Structural arrangements therefor
    • H01L22/30Structural arrangements specially adapted for testing or measuring during manufacture or treatment, or specially adapted for reliability measurements
    • H01L22/34Circuits for electrically characterising or monitoring manufacturing processes, e. g. whole test die, wafers filled with test structures, on-board-devices incorporated on each die, process control monitors or pad structures thereof, devices in scribe line
    • GPHYSICS
    • G05CONTROLLING; REGULATING
    • G05BCONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
    • G05B19/00Programme-control systems
    • G05B19/02Programme-control systems electric
    • G05B19/04Programme control other than numerical control, i.e. in sequence controllers or logic controllers
    • G05B19/042Programme control other than numerical control, i.e. in sequence controllers or logic controllers using digital processors
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005Apparatus not specifically provided for elsewhere
    • H01L21/67242Apparatus for monitoring, sorting or marking
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L22/00Testing or measuring during manufacture or treatment; Reliability measurements, i.e. testing of parts without further processing to modify the parts as such; Structural arrangements therefor
    • H01L22/10Measuring as part of the manufacturing process
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L22/00Testing or measuring during manufacture or treatment; Reliability measurements, i.e. testing of parts without further processing to modify the parts as such; Structural arrangements therefor
    • H01L22/10Measuring as part of the manufacturing process
    • H01L22/12Measuring as part of the manufacturing process for structural parameters, e.g. thickness, line width, refractive index, temperature, warp, bond strength, defects, optical inspection, electrical measurement of structural dimensions, metallurgic measurement of diffusions
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L22/00Testing or measuring during manufacture or treatment; Reliability measurements, i.e. testing of parts without further processing to modify the parts as such; Structural arrangements therefor
    • H01L22/20Sequence of activities consisting of a plurality of measurements, corrections, marking or sorting steps
    • H01L22/24Optical enhancement of defects or not directly visible states, e.g. selective electrolytic deposition, bubbles in liquids, light emission, colour change
    • GPHYSICS
    • G05CONTROLLING; REGULATING
    • G05BCONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
    • G05B2219/00Program-control systems
    • G05B2219/30Nc systems
    • G05B2219/45Nc applications
    • G05B2219/45031Manufacturing semiconductor wafers

Landscapes

  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Automation & Control Theory (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
  • Length Measuring Devices By Optical Means (AREA)
  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
IL282726A 2018-11-21 2021-04-28 Process optimization using design of experiments and response surface models IL282726A (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US201862770647P 2018-11-21 2018-11-21
US16/594,845 US11062928B2 (en) 2019-10-07 2019-10-07 Process optimization using design of experiments and response surface models
PCT/US2019/062308 WO2020106784A1 (en) 2018-11-21 2019-11-20 Process optimization using design of experiments and response surface models

Publications (1)

Publication Number Publication Date
IL282726A true IL282726A (en) 2021-06-30

Family

ID=70774217

Family Applications (1)

Application Number Title Priority Date Filing Date
IL282726A IL282726A (en) 2018-11-21 2021-04-28 Process optimization using design of experiments and response surface models

Country Status (6)

Country Link
JP (1) JP7329597B2 (en)
KR (1) KR102548663B1 (en)
CN (1) CN113039632B (en)
IL (1) IL282726A (en)
SG (1) SG11202104655QA (en)
WO (1) WO2020106784A1 (en)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP7496498B2 (en) 2020-08-27 2024-06-07 パナソニックIpマネジメント株式会社 Information processing method, program, and information processing device
JP7496497B2 (en) 2020-08-27 2024-06-07 パナソニックIpマネジメント株式会社 Information processing method, program, and information processing device

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6965808B1 (en) * 2004-04-28 2005-11-15 International Business Machines Corporation System and method for optimizing metrology sampling in APC applications
US7065423B2 (en) * 2004-07-08 2006-06-20 Timbre Technologies, Inc. Optical metrology model optimization for process control
US7269526B2 (en) * 2005-05-04 2007-09-11 Hitachi Global Storage Technologies Netherlands B.V. Aggregated run-to-run process control for wafer yield optimization
JP2007285906A (en) 2006-04-18 2007-11-01 Hitachi High-Technologies Corp Charged particle beam system and measuring parameter setting method
US9076827B2 (en) * 2010-09-14 2015-07-07 Applied Materials, Inc. Transfer chamber metrology for improved device yield
US20140214192A1 (en) * 2013-01-25 2014-07-31 Dmo Systems Limited Apparatus For Design-Based Manufacturing Optimization In Semiconductor Fab
US9255877B2 (en) * 2013-05-21 2016-02-09 Kla-Tencor Corporation Metrology system optimization for parameter tracking
US9412673B2 (en) * 2013-08-23 2016-08-09 Kla-Tencor Corporation Multi-model metrology
WO2017147261A1 (en) * 2016-02-24 2017-08-31 Kla-Tencor Corporation Accuracy improvements in optical metrology

Also Published As

Publication number Publication date
JP7329597B2 (en) 2023-08-18
CN113039632A (en) 2021-06-25
SG11202104655QA (en) 2021-06-29
KR20210080585A (en) 2021-06-30
CN113039632B (en) 2022-03-25
WO2020106784A1 (en) 2020-05-28
JP2022507871A (en) 2022-01-18
KR102548663B1 (en) 2023-06-27

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