IL154038A0 - Single crystal fine diamond powder having narrow particle size distribution and method for production thereof - Google Patents

Single crystal fine diamond powder having narrow particle size distribution and method for production thereof

Info

Publication number
IL154038A0
IL154038A0 IL15403801A IL15403801A IL154038A0 IL 154038 A0 IL154038 A0 IL 154038A0 IL 15403801 A IL15403801 A IL 15403801A IL 15403801 A IL15403801 A IL 15403801A IL 154038 A0 IL154038 A0 IL 154038A0
Authority
IL
Israel
Prior art keywords
production
particle size
single crystal
size distribution
narrow particle
Prior art date
Application number
IL15403801A
Original Assignee
Ishizuka Res Inst Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP2000221119A external-priority patent/JP3655811B2/en
Priority claimed from JP2001142118A external-priority patent/JP4925233B2/en
Application filed by Ishizuka Res Inst Ltd filed Critical Ishizuka Res Inst Ltd
Publication of IL154038A0 publication Critical patent/IL154038A0/en

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B03—SEPARATION OF SOLID MATERIALS USING LIQUIDS OR USING PNEUMATIC TABLES OR JIGS; MAGNETIC OR ELECTROSTATIC SEPARATION OF SOLID MATERIALS FROM SOLID MATERIALS OR FLUIDS; SEPARATION BY HIGH-VOLTAGE ELECTRIC FIELDS
    • B03B—SEPARATING SOLID MATERIALS USING LIQUIDS OR USING PNEUMATIC TABLES OR JIGS
    • B03B5/00—Washing granular, powdered or lumpy materials; Wet separating
    • B03B5/62—Washing granular, powdered or lumpy materials; Wet separating by hydraulic classifiers, e.g. of launder, tank, spiral or helical chute concentrator type
    • C—CHEMISTRY; METALLURGY
    • C30—CRYSTAL GROWTH
    • C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B29/00—Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape
    • C30B29/02—Elements
    • C30B29/04—Diamond
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K3/00—Materials not provided for elsewhere
    • C09K3/14—Anti-slip materials; Abrasives
    • C09K3/1409—Abrasive particles per se
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2004/00—Particle morphology
    • C01P2004/51—Particles with a specific particle size distribution
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2004/00—Particle morphology
    • C01P2004/60—Particles characterised by their size
    • C01P2004/62—Submicrometer sized, i.e. from 0.1-1 micrometer
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2004/00—Particle morphology
    • C01P2004/60—Particles characterised by their size
    • C01P2004/64—Nanometer sized, i.e. from 1-100 nanometer

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Metallurgy (AREA)
  • Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
  • Polishing Bodies And Polishing Tools (AREA)
  • Carbon And Carbon Compounds (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
IL15403801A 2000-07-21 2001-07-23 Single crystal fine diamond powder having narrow particle size distribution and method for production thereof IL154038A0 (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2000221119A JP3655811B2 (en) 2000-07-21 2000-07-21 Monocrystalline diamond fine powder
JP2001142118A JP4925233B2 (en) 2001-05-11 2001-05-11 Diamond particle abrasive
PCT/JP2001/006337 WO2002008122A1 (en) 2000-07-21 2001-07-23 Single crystal fine diamond powder having narrow particle size distribution and method for production thereof

Publications (1)

Publication Number Publication Date
IL154038A0 true IL154038A0 (en) 2003-07-31

Family

ID=26596458

Family Applications (1)

Application Number Title Priority Date Filing Date
IL15403801A IL154038A0 (en) 2000-07-21 2001-07-23 Single crystal fine diamond powder having narrow particle size distribution and method for production thereof

Country Status (8)

Country Link
KR (1) KR20030038673A (en)
CN (1) CN1447775A (en)
AU (1) AU2001272778A1 (en)
BR (1) BR0112596A (en)
CA (1) CA2416522A1 (en)
EA (1) EA200300182A1 (en)
IL (1) IL154038A0 (en)
WO (1) WO2002008122A1 (en)

Families Citing this family (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4925233B2 (en) * 2001-05-11 2012-04-25 トーメイダイヤ株式会社 Diamond particle abrasive
JP3877677B2 (en) * 2002-12-18 2007-02-07 独立行政法人科学技術振興機構 Heat resistant diamond composite sintered body and its manufacturing method
US7292550B2 (en) 2003-03-27 2007-11-06 Kyocera Wireless Corp. System and method for minimizing voice packet loss during a wireless communications device candidate frequency search (CFS)
US8506919B2 (en) * 2005-01-11 2013-08-13 Hiroshi Ishizuka Fine powder of single crystalline diamond particles and a method for the production thereof
JP5276995B2 (en) * 2007-02-09 2013-08-28 博 石塚 Diamond fine powder collection method
EP1990313A1 (en) 2007-05-10 2008-11-12 INSERM (Institut National de la Santé et de la Recherche Médicale) Method to produce light-emitting nano-particles of diamond
CN101831243A (en) * 2010-04-30 2010-09-15 中国计量学院 High-precision non-water-based nano-diamond grinding fluid and preparation method and application thereof
CN101975731A (en) * 2010-07-28 2011-02-16 常州天合光能有限公司 Method for detecting SiC sand
CN102250582B (en) * 2011-05-19 2013-10-30 北京保利世达科技有限公司 Method for preparing submicron polycrystalline diamond abrasive with narrow particle size distribution
CN105176406B (en) * 2015-10-09 2017-05-24 同济大学 Method for screening micron and submicron polishing solutions through mixing through high-purity gas
EP3538689A1 (en) * 2016-11-10 2019-09-18 Element Six Technologies Limited Synthesis of thick single crystal diamond material via chemical vapour deposition
CN108855585A (en) * 2018-07-10 2018-11-23 辽宁新瑞碳材料科技有限公司 A method of separation diamond matrix
CN114199610A (en) * 2021-12-13 2022-03-18 郑州磨料磨具磨削研究所有限公司 Diamond strength testing device and method
CN115895596B (en) * 2022-11-28 2024-03-22 宁波平恒电子材料有限公司 Stainless steel coarse grinding fluid and preparation method and application thereof

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5316933B2 (en) * 1973-06-18 1978-06-05
JP2989018B2 (en) * 1991-01-24 1999-12-13 三菱化学株式会社 Continuous wet type countercurrent classifier
JPH08252766A (en) * 1995-03-17 1996-10-01 Fuji Electric Co Ltd Abrasive grain and magnetic disk manufactured by using the abrasive grain
JP3184450B2 (en) * 1996-02-01 2001-07-09 日本ミクロコーティング株式会社 Powder classifier and method
JPH11250448A (en) * 1998-03-03 1999-09-17 Fuji Photo Film Co Ltd Magnetic recording medium
JP2000030242A (en) * 1998-07-14 2000-01-28 Fuji Photo Film Co Ltd Magnetic recording medium
JP3411239B2 (en) * 1998-08-28 2003-05-26 石塚 博 Diamond abrasive particles and method for producing the same
JP2000144113A (en) * 1998-11-17 2000-05-26 Tokyo Magnetic Printing Co Ltd Free abrasive grain slurry composition

Also Published As

Publication number Publication date
AU2001272778A1 (en) 2002-02-05
EA200300182A1 (en) 2003-06-26
CA2416522A1 (en) 2003-01-21
BR0112596A (en) 2003-09-09
KR20030038673A (en) 2003-05-16
WO2002008122A1 (en) 2002-01-31
CN1447775A (en) 2003-10-08

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