IL136608A0 - Test structure for metal cmp process monitoring - Google Patents

Test structure for metal cmp process monitoring

Info

Publication number
IL136608A0
IL136608A0 IL13660800A IL13660800A IL136608A0 IL 136608 A0 IL136608 A0 IL 136608A0 IL 13660800 A IL13660800 A IL 13660800A IL 13660800 A IL13660800 A IL 13660800A IL 136608 A0 IL136608 A0 IL 136608A0
Authority
IL
Israel
Prior art keywords
cmp process
test structure
process monitoring
metal cmp
metal
Prior art date
Application number
IL13660800A
Other languages
English (en)
Original Assignee
Nova Measuring Instr Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from IL134626A external-priority patent/IL134626A/en
Application filed by Nova Measuring Instr Ltd filed Critical Nova Measuring Instr Ltd
Priority to IL13660800A priority Critical patent/IL136608A0/xx
Priority to AU2001235927A priority patent/AU2001235927A1/en
Priority to PCT/IL2001/000159 priority patent/WO2001061746A2/fr
Priority to US09/789,276 priority patent/US20010015811A1/en
Publication of IL136608A0 publication Critical patent/IL136608A0/xx

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B37/00—Lapping machines or devices; Accessories
    • B24B37/005—Control means for lapping machines or devices
    • B24B37/013—Devices or means for detecting lapping completion
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B37/00—Lapping machines or devices; Accessories
    • B24B37/04—Lapping machines or devices; Accessories designed for working plane surfaces
    • B24B37/042—Lapping machines or devices; Accessories designed for working plane surfaces operating processes therefor
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B49/00—Measuring or gauging equipment for controlling the feed movement of the grinding tool or work; Arrangements of indicating or measuring equipment, e.g. for indicating the start of the grinding operation
    • B24B49/12—Measuring or gauging equipment for controlling the feed movement of the grinding tool or work; Arrangements of indicating or measuring equipment, e.g. for indicating the start of the grinding operation involving optical means
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B49/00—Measuring or gauging equipment for controlling the feed movement of the grinding tool or work; Arrangements of indicating or measuring equipment, e.g. for indicating the start of the grinding operation
    • B24B49/14—Measuring or gauging equipment for controlling the feed movement of the grinding tool or work; Arrangements of indicating or measuring equipment, e.g. for indicating the start of the grinding operation taking regard of the temperature during grinding
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
    • H01L21/31—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to form insulating layers thereon, e.g. for masking or by using photolithographic techniques; After treatment of these layers; Selection of materials for these layers
    • H01L21/3205—Deposition of non-insulating-, e.g. conductive- or resistive-, layers on insulating layers; After-treatment of these layers
    • H01L21/321—After treatment
    • H01L21/32115—Planarisation
    • H01L21/3212—Planarisation by chemical mechanical polishing [CMP]
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L22/00—Testing or measuring during manufacture or treatment; Reliability measurements, i.e. testing of parts without further processing to modify the parts as such; Structural arrangements therefor
    • H01L22/30—Structural arrangements specially adapted for testing or measuring during manufacture or treatment, or specially adapted for reliability measurements
    • H01L22/34—Circuits for electrically characterising or monitoring manufacturing processes, e. g. whole test die, wafers filled with test structures, on-board-devices incorporated on each die, process control monitors or pad structures thereof, devices in scribe line

Landscapes

  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Automation & Control Theory (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
IL13660800A 2000-02-20 2000-06-06 Test structure for metal cmp process monitoring IL136608A0 (en)

Priority Applications (4)

Application Number Priority Date Filing Date Title
IL13660800A IL136608A0 (en) 2000-02-20 2000-06-06 Test structure for metal cmp process monitoring
AU2001235927A AU2001235927A1 (en) 2000-02-20 2001-02-20 Test structure for metal cmp process control
PCT/IL2001/000159 WO2001061746A2 (fr) 2000-02-20 2001-02-20 Structure de test pour la commande de processus de planarisation mecanico-chimique de metaux
US09/789,276 US20010015811A1 (en) 2000-02-20 2001-02-20 Test structure for metal CMP process control

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
IL134626A IL134626A (en) 2000-02-20 2000-02-20 Test structure for metal cmp process control
IL13660800A IL136608A0 (en) 2000-02-20 2000-06-06 Test structure for metal cmp process monitoring

Publications (1)

Publication Number Publication Date
IL136608A0 true IL136608A0 (en) 2001-06-14

Family

ID=26323930

Family Applications (1)

Application Number Title Priority Date Filing Date
IL13660800A IL136608A0 (en) 2000-02-20 2000-06-06 Test structure for metal cmp process monitoring

Country Status (4)

Country Link
US (1) US20010015811A1 (fr)
AU (1) AU2001235927A1 (fr)
IL (1) IL136608A0 (fr)
WO (1) WO2001061746A2 (fr)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7097534B1 (en) 2000-07-10 2006-08-29 Applied Materials, Inc. Closed-loop control of a chemical mechanical polisher
US6531387B1 (en) 2002-06-17 2003-03-11 Mosel Vitelic, Inc. Polishing of conductive layers in fabrication of integrated circuits
TWI246952B (en) * 2002-11-22 2006-01-11 Applied Materials Inc Methods and apparatus for polishing control
KR100546330B1 (ko) * 2003-06-03 2006-01-26 삼성전자주식회사 측정의 신뢰도를 향상시킬 수 있는 측정용 패턴을구비하는 반도체장치 및 측정용 패턴을 이용한반도체장치의 측정방법
AU2003300005A1 (en) 2003-12-19 2005-08-03 International Business Machines Corporation Differential critical dimension and overlay metrology apparatus and measurement method
US7800108B2 (en) * 2007-11-30 2010-09-21 Nec Electronics Corporation Semiconductor device and method of manufacturing semiconductor device including optical test pattern above a light shielding film
US8975094B2 (en) 2013-01-21 2015-03-10 Globalfoundries Inc. Test structure and method to facilitate development/optimization of process parameters
CN110400789B (zh) * 2019-07-25 2021-04-09 上海华力微电子有限公司 套准标记及其形成方法

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5663797A (en) * 1996-05-16 1997-09-02 Micron Technology, Inc. Method and apparatus for detecting the endpoint in chemical-mechanical polishing of semiconductor wafers
US5723874A (en) * 1996-06-24 1998-03-03 International Business Machines Corporation Dishing and erosion monitor structure for damascene metal processing
IL123727A (en) * 1998-03-18 2002-05-23 Nova Measuring Instr Ltd Method and apparatus for measurement of patterned structures
US5952674A (en) * 1998-03-18 1999-09-14 International Business Machines Corporation Topography monitor
US5972787A (en) * 1998-08-18 1999-10-26 International Business Machines Corp. CMP process using indicator areas to determine endpoint
WO2000054325A1 (fr) * 1999-03-10 2000-09-14 Nova Measuring Instruments Ltd. Procede et appareil pour le controle d'un procede de planarisation chimico-mecanique applique a des objets a motif a base de metal

Also Published As

Publication number Publication date
WO2001061746A2 (fr) 2001-08-23
AU2001235927A1 (en) 2001-08-27
US20010015811A1 (en) 2001-08-23
WO2001061746A9 (fr) 2001-11-08
WO2001061746A3 (fr) 2002-02-21

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