IL117657A0 - Ceramic target for thin film deposition - Google Patents

Ceramic target for thin film deposition

Info

Publication number
IL117657A0
IL117657A0 IL11765796A IL11765796A IL117657A0 IL 117657 A0 IL117657 A0 IL 117657A0 IL 11765796 A IL11765796 A IL 11765796A IL 11765796 A IL11765796 A IL 11765796A IL 117657 A0 IL117657 A0 IL 117657A0
Authority
IL
Israel
Prior art keywords
thin film
film deposition
ceramic target
ceramic
target
Prior art date
Application number
IL11765796A
Original Assignee
Technion Res & Dev Foundation
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Technion Res & Dev Foundation filed Critical Technion Res & Dev Foundation
Priority to IL11765796A priority Critical patent/IL117657A0/en
Publication of IL117657A0 publication Critical patent/IL117657A0/en
Priority to AU19383/97A priority patent/AU1938397A/en
Priority to PCT/IL1997/000108 priority patent/WO1997036020A1/en

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
    • H01J37/3411—Constructional aspects of the reactor
    • H01J37/3414—Targets
    • H01J37/3423—Shape
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target
    • C23C14/3414—Metallurgical or chemical aspects of target preparation, e.g. casting, powder metallurgy
IL11765796A 1996-03-26 1996-03-26 Ceramic target for thin film deposition IL117657A0 (en)

Priority Applications (3)

Application Number Priority Date Filing Date Title
IL11765796A IL117657A0 (en) 1996-03-26 1996-03-26 Ceramic target for thin film deposition
AU19383/97A AU1938397A (en) 1996-03-26 1997-03-26 Ceramic target for thin film deposition
PCT/IL1997/000108 WO1997036020A1 (en) 1996-03-26 1997-03-26 Ceramic target for thin film deposition

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
IL11765796A IL117657A0 (en) 1996-03-26 1996-03-26 Ceramic target for thin film deposition

Publications (1)

Publication Number Publication Date
IL117657A0 true IL117657A0 (en) 1996-07-23

Family

ID=11068700

Family Applications (1)

Application Number Title Priority Date Filing Date
IL11765796A IL117657A0 (en) 1996-03-26 1996-03-26 Ceramic target for thin film deposition

Country Status (3)

Country Link
AU (1) AU1938397A (en)
IL (1) IL117657A0 (en)
WO (1) WO1997036020A1 (en)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20060006064A1 (en) * 2004-07-09 2006-01-12 Avi Tepman Target tiles in a staggered array
US7550066B2 (en) 2004-07-09 2009-06-23 Applied Materials, Inc. Staggered target tiles

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57145982A (en) * 1981-03-03 1982-09-09 Toshiba Corp Target for sputtering device
US4415427A (en) * 1982-09-30 1983-11-15 Gte Products Corporation Thin film deposition by sputtering
KR910007382B1 (en) * 1987-08-07 1991-09-25 가부시기가이샤 히다찌세이사꾸쇼 Superconductor material and method of manufacturing super-conductor film
JPH0621344B2 (en) * 1988-02-17 1994-03-23 工業技術院長 Superconducting thin film production equipment
JPH01290765A (en) * 1988-05-16 1989-11-22 Toshiba Corp Sputtering target
US5187147A (en) * 1991-05-31 1993-02-16 Florida State University Method for producing freestanding high Tc superconducting thin films
JPH05109655A (en) * 1991-10-15 1993-04-30 Applied Materials Japan Kk Cvd-sputtering system
JPH05230640A (en) * 1992-02-25 1993-09-07 Fujitsu Ltd Sputtering apparatus
US5344302A (en) * 1993-09-03 1994-09-06 B&W Nuclear Service Company Remote impression tool

Also Published As

Publication number Publication date
WO1997036020A1 (en) 1997-10-02
AU1938397A (en) 1997-10-17

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