GB9704550D0 - Deposition of thin films - Google Patents
Deposition of thin filmsInfo
- Publication number
- GB9704550D0 GB9704550D0 GBGB9704550.4A GB9704550A GB9704550D0 GB 9704550 D0 GB9704550 D0 GB 9704550D0 GB 9704550 A GB9704550 A GB 9704550A GB 9704550 D0 GB9704550 D0 GB 9704550D0
- Authority
- GB
- United Kingdom
- Prior art keywords
- deposition
- thin films
- films
- thin
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
GBGB9704550.4A GB9704550D0 (en) | 1997-03-05 | 1997-03-05 | Deposition of thin films |
PCT/GB1998/000539 WO1998039497A1 (en) | 1997-03-05 | 1998-02-20 | Deposition of thin films |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
GBGB9704550.4A GB9704550D0 (en) | 1997-03-05 | 1997-03-05 | Deposition of thin films |
Publications (1)
Publication Number | Publication Date |
---|---|
GB9704550D0 true GB9704550D0 (en) | 1997-04-23 |
Family
ID=10808735
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
GBGB9704550.4A Pending GB9704550D0 (en) | 1997-03-05 | 1997-03-05 | Deposition of thin films |
Country Status (2)
Country | Link |
---|---|
GB (1) | GB9704550D0 (en) |
WO (1) | WO1998039497A1 (en) |
Families Citing this family (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6943392B2 (en) * | 1999-08-30 | 2005-09-13 | Micron Technology, Inc. | Capacitors having a capacitor dielectric layer comprising a metal oxide having multiple different metals bonded with oxygen |
US6444478B1 (en) | 1999-08-31 | 2002-09-03 | Micron Technology, Inc. | Dielectric films and methods of forming same |
US6335049B1 (en) * | 2000-01-03 | 2002-01-01 | Micron Technology, Inc. | Chemical vapor deposition methods of forming a high K dielectric layer and methods of forming a capacitor |
US6558517B2 (en) | 2000-05-26 | 2003-05-06 | Micron Technology, Inc. | Physical vapor deposition methods |
US6566147B2 (en) | 2001-02-02 | 2003-05-20 | Micron Technology, Inc. | Method for controlling deposition of dielectric films |
US20030017266A1 (en) | 2001-07-13 | 2003-01-23 | Cem Basceri | Chemical vapor deposition methods of forming barium strontium titanate comprising dielectric layers, including such layers having a varied concentration of barium and strontium within the layer |
US6838122B2 (en) | 2001-07-13 | 2005-01-04 | Micron Technology, Inc. | Chemical vapor deposition methods of forming barium strontium titanate comprising dielectric layers |
US7011978B2 (en) | 2001-08-17 | 2006-03-14 | Micron Technology, Inc. | Methods of forming capacitor constructions comprising perovskite-type dielectric materials with different amount of crystallinity regions |
US7449246B2 (en) | 2004-06-30 | 2008-11-11 | General Electric Company | Barrier coatings |
US8691371B2 (en) | 2002-09-11 | 2014-04-08 | General Electric Company | Barrier coating and method |
US8034419B2 (en) | 2004-06-30 | 2011-10-11 | General Electric Company | Method for making a graded barrier coating |
WO2014159904A1 (en) | 2013-03-14 | 2014-10-02 | The Government Of The United States Of America, As Represented By The Secretary Of The Navy | Porphyrin-modified antimicrobial peptides for application as indicators of microbial targets |
WO2014151756A1 (en) * | 2013-03-14 | 2014-09-25 | The Government Of The United States Of America, As Represented By The Secretary Of The Navy | Microwave initiation for deposition of porous organosilicate materials on fabrics |
Family Cites Families (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4599135A (en) * | 1983-09-30 | 1986-07-08 | Hitachi, Ltd. | Thin film deposition |
JPH0712033B2 (en) * | 1984-05-10 | 1995-02-08 | 工業技術院長 | Fine pattern formation method by ion beam |
US4803947A (en) * | 1986-01-15 | 1989-02-14 | Canon Kabushiki Kaisha | Apparatus for forming deposited film |
US5083033A (en) * | 1989-03-31 | 1992-01-21 | Kabushiki Kaisha Toshiba | Method of depositing an insulating film and a focusing ion beam apparatus |
WO1996000803A1 (en) * | 1994-06-28 | 1996-01-11 | Fei Company | Charged particle deposition of electrically insulating films |
-
1997
- 1997-03-05 GB GBGB9704550.4A patent/GB9704550D0/en active Pending
-
1998
- 1998-02-20 WO PCT/GB1998/000539 patent/WO1998039497A1/en active Application Filing
Also Published As
Publication number | Publication date |
---|---|
WO1998039497A1 (en) | 1998-09-11 |
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