IL115252A0 - Substrate thickness measurement using oblique incidence multispectral imaging - Google Patents

Substrate thickness measurement using oblique incidence multispectral imaging

Info

Publication number
IL115252A0
IL115252A0 IL11525295A IL11525295A IL115252A0 IL 115252 A0 IL115252 A0 IL 115252A0 IL 11525295 A IL11525295 A IL 11525295A IL 11525295 A IL11525295 A IL 11525295A IL 115252 A0 IL115252 A0 IL 115252A0
Authority
IL
Israel
Prior art keywords
thickness measurement
substrate thickness
oblique incidence
multispectral imaging
multispectral
Prior art date
Application number
IL11525295A
Other languages
English (en)
Original Assignee
Hughes Aircraft Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hughes Aircraft Co filed Critical Hughes Aircraft Co
Publication of IL115252A0 publication Critical patent/IL115252A0/xx

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/02—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness
    • G01B11/06—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/14—Measuring arrangements characterised by the use of optical techniques for measuring distance or clearance between spaced objects or spaced apertures

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Length Measuring Devices By Optical Means (AREA)
  • Instruments For Measurement Of Length By Optical Means (AREA)
IL11525295A 1994-09-13 1995-09-11 Substrate thickness measurement using oblique incidence multispectral imaging IL115252A0 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US08/304,982 US5502564A (en) 1994-09-13 1994-09-13 Substrate thickness measurement using oblique incidence multispectral interferometry

Publications (1)

Publication Number Publication Date
IL115252A0 true IL115252A0 (en) 1995-12-31

Family

ID=23178789

Family Applications (1)

Application Number Title Priority Date Filing Date
IL11525295A IL115252A0 (en) 1994-09-13 1995-09-11 Substrate thickness measurement using oblique incidence multispectral imaging

Country Status (4)

Country Link
US (1) US5502564A (fr)
EP (1) EP0702206A2 (fr)
JP (1) JPH08178626A (fr)
IL (1) IL115252A0 (fr)

Families Citing this family (38)

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US5657123A (en) * 1994-09-16 1997-08-12 Mitsubishi Materials Corp. Film thickness measuring apparatus, film thickness measuring method and wafer polishing system measuring a film thickness in conjunction with a liquid tank
US6033721A (en) * 1994-10-26 2000-03-07 Revise, Inc. Image-based three-axis positioner for laser direct write microchemical reaction
WO1997045698A1 (fr) * 1996-05-31 1997-12-04 Tropel Corporation Interferometre destine a la mesure des variations d'epaisseur de plaquettes de semi-conducteurs
US5739906A (en) * 1996-06-07 1998-04-14 The United States Of America As Represented By The Secretary Of Commerce Interferometric thickness variation test method for windows and silicon wafers using a diverging wavefront
US6310689B1 (en) 1996-08-23 2001-10-30 Asahi Kogaku Kogyo Kabushiki Kaisha Pattern reading apparatus
JPH112512A (ja) * 1997-06-11 1999-01-06 Super Silicon Kenkyusho:Kk ウェーハの光学式形状測定器
US6249351B1 (en) 1999-06-03 2001-06-19 Zygo Corporation Grazing incidence interferometer and method
JP4909480B2 (ja) 1999-09-16 2012-04-04 エムケーエス インストゥルメンツ インコーポレーテッド 層および表面特性の光学測定方法およびその装置
DE19948797C2 (de) * 1999-10-11 2001-11-08 Leica Microsystems Substrathalter und Verwendung des Substrathalters in einem hochgenauen Messgerät
DE10195052B3 (de) * 2000-01-25 2015-06-18 Zygo Corp. Verfahren und Einrichtungen zur Bestimmung einer geometrischen Eigenschaft eines Versuchsgegenstands sowie optisches Profilmesssystem
US6368881B1 (en) * 2000-02-29 2002-04-09 International Business Machines Corporation Wafer thickness control during backside grind
US6612240B1 (en) * 2000-09-15 2003-09-02 Silverbrook Research Pty Ltd Drying of an image on print media in a modular commercial printer
US6937350B2 (en) * 2001-06-29 2005-08-30 Massachusetts Institute Of Technology Apparatus and methods for optically monitoring thickness
US6589800B2 (en) * 2001-08-21 2003-07-08 Texas Instruments Incorporated Method of estimation of wafer-to-wafer thickness
KR100437024B1 (ko) * 2001-10-18 2004-06-23 엘지전자 주식회사 박막 검사 방법 및 그 장치
US7095496B2 (en) * 2001-12-12 2006-08-22 Tokyo Electron Limited Method and apparatus for position-dependent optical metrology calibration
EP1476715B1 (fr) * 2002-01-24 2018-10-10 Icos Vision Systems N.V. Analyse spatiale amelioree d'un front d'onde et mesure en 3d
DE60302698T2 (de) * 2002-04-26 2006-08-24 Optrex Corp. Nematische Flüssigkristallanzeigevorrichtung vom Doppelschichttyp
UA74801C2 (en) * 2002-05-20 2006-02-15 Swedish Lcd Ct Method for measuring the parameters of a liquid crystal cell
US7097101B2 (en) * 2003-02-13 2006-08-29 Symbol Technologies, Inc. Interface for interfacing an imaging engine to an optical code reader
US6847458B2 (en) * 2003-03-20 2005-01-25 Phase Shift Technology, Inc. Method and apparatus for measuring the shape and thickness variation of polished opaque plates
US7262070B2 (en) * 2003-09-29 2007-08-28 Intel Corporation Method to make a weight compensating/tuning layer on a substrate
US9307648B2 (en) * 2004-01-21 2016-04-05 Microcontinuum, Inc. Roll-to-roll patterning of transparent and metallic layers
DE102007037705A1 (de) 2007-08-09 2009-02-12 Vistec Semiconductor Systems Jena Gmbh Halteeinrichtung für ein zweidimensionales Substrat und Verwendung der Halteeinrichtung in einer Koordinaten-Messmaschine
US9589797B2 (en) 2013-05-17 2017-03-07 Microcontinuum, Inc. Tools and methods for producing nanoantenna electronic devices
JP6310263B2 (ja) * 2014-01-30 2018-04-11 株式会社ニューフレアテクノロジー 検査装置
JP6301815B2 (ja) * 2014-11-17 2018-03-28 株式会社神戸製鋼所 形状測定装置
JP2017032457A (ja) * 2015-08-04 2017-02-09 株式会社ニューフレアテクノロジー パターン検査装置
JP7009389B2 (ja) 2016-05-09 2022-01-25 グラバンゴ コーポレイション 環境内のコンピュータビジョン駆動型アプリケーションのためのシステムおよび方法
US10282621B2 (en) 2016-07-09 2019-05-07 Grabango Co. Remote state following device
JP7093783B2 (ja) 2017-02-10 2022-06-30 グラバンゴ コーポレイション 自動化買物環境における動的な顧客チェックアウト体験のためのシステム及び方法
JP7165140B2 (ja) * 2017-05-10 2022-11-02 グラバンゴ コーポレイション 効率的配置のための直列構成カメラアレイ
WO2018237210A1 (fr) 2017-06-21 2018-12-27 Grabango Co. Liaison d'une activité humaine observée sur une vidéo à un compte d'utilisateur
US20190079591A1 (en) 2017-09-14 2019-03-14 Grabango Co. System and method for human gesture processing from video input
US10963704B2 (en) 2017-10-16 2021-03-30 Grabango Co. Multiple-factor verification for vision-based systems
US11481805B2 (en) 2018-01-03 2022-10-25 Grabango Co. Marketing and couponing in a retail environment using computer vision
CA3117918A1 (fr) 2018-10-29 2020-05-07 Grabango Co. Automatisation de commerce pour une station de ravitaillement en carburant
US11507933B2 (en) 2019-03-01 2022-11-22 Grabango Co. Cashier interface for linking customers to virtual data

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0252205A (ja) * 1988-08-17 1990-02-21 Dainippon Screen Mfg Co Ltd 膜厚測定方法
US5331049A (en) 1990-06-22 1994-07-19 Exxon Chemical Patents Inc. Water-curable, hot melt adhesive composition
US5291269A (en) 1991-12-06 1994-03-01 Hughes Aircraft Company Apparatus and method for performing thin film layer thickness metrology on a thin film layer having shape deformations and local slope variations

Also Published As

Publication number Publication date
JPH08178626A (ja) 1996-07-12
US5502564A (en) 1996-03-26
EP0702206A2 (fr) 1996-03-20

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