IE52478B1 - Self-trimming photosensitive layer - Google Patents
Self-trimming photosensitive layerInfo
- Publication number
- IE52478B1 IE52478B1 IE1160/81A IE116081A IE52478B1 IE 52478 B1 IE52478 B1 IE 52478B1 IE 1160/81 A IE1160/81 A IE 1160/81A IE 116081 A IE116081 A IE 116081A IE 52478 B1 IE52478 B1 IE 52478B1
- Authority
- IE
- Ireland
- Prior art keywords
- layer
- photosensitive layer
- elongation
- break
- substrate
- Prior art date
Links
- 238000009966 trimming Methods 0.000 title claims abstract description 14
- 239000000758 substrate Substances 0.000 claims abstract description 39
- 239000007787 solid Substances 0.000 claims abstract description 17
- 239000011230 binding agent Substances 0.000 claims abstract description 13
- 239000000178 monomer Substances 0.000 claims abstract description 8
- 239000010410 layer Substances 0.000 claims description 92
- -1 polyethylene Polymers 0.000 claims description 40
- 239000002245 particle Substances 0.000 claims description 34
- 239000000203 mixture Substances 0.000 claims description 33
- 239000011248 coating agent Substances 0.000 claims description 19
- 238000000576 coating method Methods 0.000 claims description 19
- 229920002120 photoresistant polymer Polymers 0.000 claims description 18
- 238000000034 method Methods 0.000 claims description 15
- 239000011324 bead Substances 0.000 claims description 11
- 239000000463 material Substances 0.000 claims description 11
- 230000003287 optical effect Effects 0.000 claims description 11
- 239000004698 Polyethylene Substances 0.000 claims description 10
- 229920000573 polyethylene Polymers 0.000 claims description 10
- 230000005855 radiation Effects 0.000 claims description 8
- 229920000098 polyolefin Polymers 0.000 claims description 6
- 239000013047 polymeric layer Substances 0.000 claims description 4
- VGGSQFUCUMXWEO-UHFFFAOYSA-N Ethene Chemical compound C=C VGGSQFUCUMXWEO-UHFFFAOYSA-N 0.000 claims description 3
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- 239000004743 Polypropylene Substances 0.000 claims description 3
- 229920001155 polypropylene Polymers 0.000 claims description 3
- 230000001681 protective effect Effects 0.000 claims description 3
- 230000000977 initiatory effect Effects 0.000 claims description 2
- 229920000620 organic polymer Polymers 0.000 claims description 2
- 238000003475 lamination Methods 0.000 abstract description 5
- 229920000642 polymer Polymers 0.000 abstract description 5
- 239000003999 initiator Substances 0.000 abstract description 4
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 24
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 24
- VVBLNCFGVYUYGU-UHFFFAOYSA-N 4,4'-Bis(dimethylamino)benzophenone Chemical compound C1=CC(N(C)C)=CC=C1C(=O)C1=CC=C(N(C)C)C=C1 VVBLNCFGVYUYGU-UHFFFAOYSA-N 0.000 description 16
- 239000000243 solution Substances 0.000 description 16
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- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 15
- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 description 14
- NIXOWILDQLNWCW-UHFFFAOYSA-N 2-Propenoic acid Natural products OC(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 14
- 239000007788 liquid Substances 0.000 description 14
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- DAKWPKUUDNSNPN-UHFFFAOYSA-N Trimethylolpropane triacrylate Chemical compound C=CC(=O)OCC(CC)(COC(=O)C=C)COC(=O)C=C DAKWPKUUDNSNPN-UHFFFAOYSA-N 0.000 description 11
- 239000002253 acid Substances 0.000 description 11
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- ZXEKIIBDNHEJCQ-UHFFFAOYSA-N isobutanol Chemical compound CC(C)CO ZXEKIIBDNHEJCQ-UHFFFAOYSA-N 0.000 description 8
- 239000000049 pigment Substances 0.000 description 8
- ZKYCLDTVJCJYIB-UHFFFAOYSA-N 2-methylidenedecanamide Chemical compound CCCCCCCCC(=C)C(N)=O ZKYCLDTVJCJYIB-UHFFFAOYSA-N 0.000 description 7
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- OAZWDJGLIYNYMU-UHFFFAOYSA-N Leucocrystal Violet Chemical compound C1=CC(N(C)C)=CC=C1C(C=1C=CC(=CC=1)N(C)C)C1=CC=C(N(C)C)C=C1 OAZWDJGLIYNYMU-UHFFFAOYSA-N 0.000 description 7
- 229920001897 terpolymer Polymers 0.000 description 7
- BEWCNXNIQCLWHP-UHFFFAOYSA-N 2-(tert-butylamino)ethyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCCNC(C)(C)C BEWCNXNIQCLWHP-UHFFFAOYSA-N 0.000 description 6
- GNSFRPWPOGYVLO-UHFFFAOYSA-N 3-hydroxypropyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCCCO GNSFRPWPOGYVLO-UHFFFAOYSA-N 0.000 description 6
- KAKZBPTYRLMSJV-UHFFFAOYSA-N Butadiene Chemical compound C=CC=C KAKZBPTYRLMSJV-UHFFFAOYSA-N 0.000 description 6
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- CDBYLPFSWZWCQE-UHFFFAOYSA-L Sodium Carbonate Chemical compound [Na+].[Na+].[O-]C([O-])=O CDBYLPFSWZWCQE-UHFFFAOYSA-L 0.000 description 6
- RWCCWEUUXYIKHB-UHFFFAOYSA-N benzophenone Chemical compound C=1C=CC=CC=1C(=O)C1=CC=CC=C1 RWCCWEUUXYIKHB-UHFFFAOYSA-N 0.000 description 6
- 239000012965 benzophenone Substances 0.000 description 6
- QRUDEWIWKLJBPS-UHFFFAOYSA-N benzotriazole Chemical compound C1=CC=C2N[N][N]C2=C1 QRUDEWIWKLJBPS-UHFFFAOYSA-N 0.000 description 6
- 239000012964 benzotriazole Substances 0.000 description 6
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 description 6
- 239000003795 chemical substances by application Substances 0.000 description 6
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 6
- 238000002360 preparation method Methods 0.000 description 6
- 230000008569 process Effects 0.000 description 6
- 150000003504 terephthalic acids Chemical class 0.000 description 6
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 5
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- OPLZHVSHWLZOCP-UHFFFAOYSA-N [2-hydroxy-3-[2-hydroxy-3-(2-methylprop-2-enoyloxy)propoxy]propyl] 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCC(O)COCC(O)COC(=O)C(C)=C OPLZHVSHWLZOCP-UHFFFAOYSA-N 0.000 description 5
- 229910052782 aluminium Inorganic materials 0.000 description 5
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 5
- 238000010030 laminating Methods 0.000 description 5
- 239000011236 particulate material Substances 0.000 description 5
- 229920000139 polyethylene terephthalate Polymers 0.000 description 5
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- NLHHRLWOUZZQLW-UHFFFAOYSA-N Acrylonitrile Chemical compound C=CC#N NLHHRLWOUZZQLW-UHFFFAOYSA-N 0.000 description 4
- 239000007864 aqueous solution Substances 0.000 description 4
- 238000004140 cleaning Methods 0.000 description 4
- 229940035429 isobutyl alcohol Drugs 0.000 description 4
- 230000002829 reductive effect Effects 0.000 description 4
- 150000003330 sebacic acids Chemical class 0.000 description 4
- CXVGEDCSTKKODG-UHFFFAOYSA-N sulisobenzone Chemical compound C1=C(S(O)(=O)=O)C(OC)=CC(O)=C1C(=O)C1=CC=CC=C1 CXVGEDCSTKKODG-UHFFFAOYSA-N 0.000 description 4
- LEJBBGNFPAFPKQ-UHFFFAOYSA-N 2-(2-prop-2-enoyloxyethoxy)ethyl prop-2-enoate Chemical compound C=CC(=O)OCCOCCOC(=O)C=C LEJBBGNFPAFPKQ-UHFFFAOYSA-N 0.000 description 3
- OEPOKWHJYJXUGD-UHFFFAOYSA-N 2-(3-phenylmethoxyphenyl)-1,3-thiazole-4-carbaldehyde Chemical compound O=CC1=CSC(C=2C=C(OCC=3C=CC=CC=3)C=CC=2)=N1 OEPOKWHJYJXUGD-UHFFFAOYSA-N 0.000 description 3
- XFCMNSHQOZQILR-UHFFFAOYSA-N 2-[2-(2-methylprop-2-enoyloxy)ethoxy]ethyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCCOCCOC(=O)C(C)=C XFCMNSHQOZQILR-UHFFFAOYSA-N 0.000 description 3
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 3
- 241001269524 Dura Species 0.000 description 3
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 3
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- 150000008064 anhydrides Chemical class 0.000 description 3
- ISAOCJYIOMOJEB-UHFFFAOYSA-N benzoin Chemical compound C=1C=CC=CC=1C(O)C(=O)C1=CC=CC=C1 ISAOCJYIOMOJEB-UHFFFAOYSA-N 0.000 description 3
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- 150000002148 esters Chemical class 0.000 description 3
- LYCAIKOWRPUZTN-UHFFFAOYSA-N ethylene glycol Natural products OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 3
- 239000000945 filler Substances 0.000 description 3
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- AZQWKYJCGOJGHM-UHFFFAOYSA-N 1,4-benzoquinone Chemical compound O=C1C=CC(=O)C=C1 AZQWKYJCGOJGHM-UHFFFAOYSA-N 0.000 description 2
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- NJWGQARXZDRHCD-UHFFFAOYSA-N 2-methylanthraquinone Chemical compound C1=CC=C2C(=O)C3=CC(C)=CC=C3C(=O)C2=C1 NJWGQARXZDRHCD-UHFFFAOYSA-N 0.000 description 2
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- VEORPZCZECFIRK-UHFFFAOYSA-N 3,3',5,5'-tetrabromobisphenol A Chemical compound C=1C(Br)=C(O)C(Br)=CC=1C(C)(C)C1=CC(Br)=C(O)C(Br)=C1 VEORPZCZECFIRK-UHFFFAOYSA-N 0.000 description 2
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- 125000000217 alkyl group Chemical group 0.000 description 2
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- LNAZSHAWQACDHT-XIYTZBAFSA-N (2r,3r,4s,5r,6s)-4,5-dimethoxy-2-(methoxymethyl)-3-[(2s,3r,4s,5r,6r)-3,4,5-trimethoxy-6-(methoxymethyl)oxan-2-yl]oxy-6-[(2r,3r,4s,5r,6r)-4,5,6-trimethoxy-2-(methoxymethyl)oxan-3-yl]oxyoxane Chemical compound CO[C@@H]1[C@@H](OC)[C@H](OC)[C@@H](COC)O[C@H]1O[C@H]1[C@H](OC)[C@@H](OC)[C@H](O[C@H]2[C@@H]([C@@H](OC)[C@H](OC)O[C@@H]2COC)OC)O[C@@H]1COC LNAZSHAWQACDHT-XIYTZBAFSA-N 0.000 description 1
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- ISXSCDLOGDJUNJ-UHFFFAOYSA-N tert-butyl prop-2-enoate Chemical compound CC(C)(C)OC(=O)C=C ISXSCDLOGDJUNJ-UHFFFAOYSA-N 0.000 description 1
- UGNWTBMOAKPKBL-UHFFFAOYSA-N tetrachloro-1,4-benzoquinone Chemical compound ClC1=C(Cl)C(=O)C(Cl)=C(Cl)C1=O UGNWTBMOAKPKBL-UHFFFAOYSA-N 0.000 description 1
- BSVBQGMMJUBVOD-UHFFFAOYSA-N trisodium borate Chemical compound [Na+].[Na+].[Na+].[O-]B([O-])[O-] BSVBQGMMJUBVOD-UHFFFAOYSA-N 0.000 description 1
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Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/0073—Masks not provided for in groups H05K3/02 - H05K3/46, e.g. for photomechanical production of patterned surfaces
- H05K3/0076—Masks not provided for in groups H05K3/02 - H05K3/46, e.g. for photomechanical production of patterned surfaces characterised by the composition of the mask
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/0073—Masks not provided for in groups H05K3/02 - H05K3/46, e.g. for photomechanical production of patterned surfaces
- H05K3/0079—Masks not provided for in groups H05K3/02 - H05K3/46, e.g. for photomechanical production of patterned surfaces characterised by the method of application or removal of the mask
Landscapes
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing Of Printed Circuit Boards (AREA)
- Laminated Bodies (AREA)
- Manufacturing Optical Record Carriers (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Apparatuses And Processes For Manufacturing Resistors (AREA)
- Polymerisation Methods In General (AREA)
- Paper (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US15363580A | 1980-05-27 | 1980-05-27 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| IE811160L IE811160L (en) | 1981-11-27 |
| IE52478B1 true IE52478B1 (en) | 1987-11-11 |
Family
ID=22548052
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| IE1160/81A IE52478B1 (en) | 1980-05-27 | 1981-05-25 | Self-trimming photosensitive layer |
Country Status (10)
Families Citing this family (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4601970A (en) * | 1982-04-22 | 1986-07-22 | E. I. Du Pont De Nemours And Company | Dry photosensitive film containing crosslinked beads |
| US4668604A (en) * | 1982-04-22 | 1987-05-26 | E.I. Du Pont De Nemours And Company | Positive-working photosensitive elements containing crosslinked beads and process of use |
| US4551415A (en) * | 1982-04-22 | 1985-11-05 | E. I. Du Pont De Nemours And Company | Photosensitive coatings containing crosslinked beads |
| US4495014A (en) * | 1983-02-18 | 1985-01-22 | E. I. Du Pont De Nemours And Company | Laminating and trimming process |
| JPS61162501A (ja) * | 1985-01-10 | 1986-07-23 | Nippon Paint Co Ltd | 高エネルギ−線硬化樹脂組成物 |
| JPH0746224B2 (ja) * | 1986-06-27 | 1995-05-17 | 日本ペイント株式会社 | 感光性フレキソ印刷版 |
| US4894315A (en) * | 1988-08-30 | 1990-01-16 | E. I. Du Pont De Nemours And Company | Process for making flexographic printing plates with increased flexibility |
| CN115298612A (zh) * | 2020-03-19 | 2022-11-04 | 富士胶片株式会社 | 感光性转印材料、树脂图案的制造方法、电路配线的制造方法以及感光性转印材料用临时支承体 |
| CN115398341A (zh) * | 2020-03-30 | 2022-11-25 | 富士胶片株式会社 | 感光性转印材料、树脂图案的制造方法、电路配线的制造方法以及感光性转印材料用临时支承体 |
Family Cites Families (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| NL87862C (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) * | 1951-08-20 | |||
| US3525615A (en) * | 1966-07-07 | 1970-08-25 | Du Pont | Photopolymerization processes and elements therefor |
| US3958996A (en) * | 1973-05-07 | 1976-05-25 | E. I. Du Pont De Nemours And Company | Photopolymerizable paste composition |
| JPS5233520A (en) * | 1975-09-09 | 1977-03-14 | Nitto Electric Ind Co Ltd | Method for preventing image formation material from fluidizing |
| US4075051A (en) * | 1976-11-29 | 1978-02-21 | E. I. Du Pont De Nemours And Company | Method of trimming photoresist film |
| NO159729C (no) * | 1978-11-01 | 1989-02-01 | Coates Brothers & Co | Fremgangsmaate for fremstilling av et moenster av loddemetall paa et lag elektrisk ledende metall baaret av et ikke-ledende underlag. |
| CH629637A5 (fr) * | 1979-03-26 | 1982-04-30 | Ebauches Sa | Procede pour preparer un agent masquant resistant a la temperature, agent masquant obtenu par la mise en oeuvre de ce procede et utilisation de cet agent. |
| DE2926235A1 (de) * | 1979-06-29 | 1981-01-08 | Hoechst Ag | Photopolymerisierbares kopiermaterial und verfahren zur herstellung von reliefbildern |
-
1981
- 1981-05-22 BR BR8103183A patent/BR8103183A/pt unknown
- 1981-05-25 IE IE1160/81A patent/IE52478B1/en unknown
- 1981-05-25 AT AT81104014T patent/ATE22357T1/de not_active IP Right Cessation
- 1981-05-25 EP EP81104014A patent/EP0041643B1/en not_active Expired
- 1981-05-25 DE DE8181104014T patent/DE3175332D1/de not_active Expired
- 1981-05-26 PL PL23134181A patent/PL231341A1/xx unknown
- 1981-05-26 CA CA000378283A patent/CA1168915A/en not_active Expired
- 1981-05-27 DD DD81230332A patent/DD159226A5/de unknown
- 1981-05-27 JP JP8181481A patent/JPS5726846A/ja active Pending
- 1981-05-27 ZA ZA00813573A patent/ZA813573B/xx unknown
Also Published As
| Publication number | Publication date |
|---|---|
| CA1168915A (en) | 1984-06-12 |
| PL231341A1 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) | 1982-02-01 |
| EP0041643B1 (en) | 1986-09-17 |
| EP0041643A2 (en) | 1981-12-16 |
| DE3175332D1 (en) | 1986-10-23 |
| DD159226A5 (de) | 1983-02-23 |
| IE811160L (en) | 1981-11-27 |
| ATE22357T1 (de) | 1986-10-15 |
| JPS5726846A (en) | 1982-02-13 |
| ZA813573B (en) | 1983-01-26 |
| BR8103183A (pt) | 1982-02-09 |
| EP0041643A3 (en) | 1982-02-17 |
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