ID24194A - Elipsometer dengan dua laser - Google Patents

Elipsometer dengan dua laser

Info

Publication number
ID24194A
ID24194A IDW991351A ID991351A ID24194A ID 24194 A ID24194 A ID 24194A ID W991351 A IDW991351 A ID W991351A ID 991351 A ID991351 A ID 991351A ID 24194 A ID24194 A ID 24194A
Authority
ID
Indonesia
Prior art keywords
elipsometer
lasers
Prior art date
Application number
IDW991351A
Other languages
English (en)
Inventor
Klaas Hemmes
Karl Richard Koops
Original Assignee
Univ Delft Tech
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Univ Delft Tech filed Critical Univ Delft Tech
Publication of ID24194A publication Critical patent/ID24194A/id

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/21—Polarisation-affecting properties
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/21—Polarisation-affecting properties
    • G01N21/211—Ellipsometry

Landscapes

  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Investigating Or Analysing Materials By Optical Means (AREA)
  • Optical Recording Or Reproduction (AREA)
  • Optical Head (AREA)
IDW991351A 1997-05-09 1998-08-05 Elipsometer dengan dua laser ID24194A (id)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
NL1006016A NL1006016C2 (nl) 1997-05-09 1997-05-09 Ellipsometer met twee lasers.

Publications (1)

Publication Number Publication Date
ID24194A true ID24194A (id) 2000-07-13

Family

ID=19764942

Family Applications (1)

Application Number Title Priority Date Filing Date
IDW991351A ID24194A (id) 1997-05-09 1998-08-05 Elipsometer dengan dua laser

Country Status (11)

Country Link
US (1) US6373871B1 (id)
EP (1) EP0980519B1 (id)
JP (1) JP2001527681A (id)
KR (1) KR100473923B1 (id)
CN (1) CN1111734C (id)
AU (1) AU7553598A (id)
CA (1) CA2288673A1 (id)
DE (1) DE69807683T2 (id)
ID (1) ID24194A (id)
NL (1) NL1006016C2 (id)
WO (1) WO1998052019A1 (id)

Families Citing this family (24)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6930765B2 (en) 2001-03-26 2005-08-16 Kla-Tencor Technologies Multiple spot size optical profilometer, ellipsometer, reflectometer and scatterometer
US6909500B2 (en) 2001-03-26 2005-06-21 Candela Instruments Method of detecting and classifying scratches, particles and pits on thin film disks or wafers
US7123357B2 (en) 1997-09-22 2006-10-17 Candela Instruments Method of detecting and classifying scratches and particles on thin film disks or wafers
US6757056B1 (en) 2001-03-26 2004-06-29 Candela Instruments Combined high speed optical profilometer and ellipsometer
US6031615A (en) 1997-09-22 2000-02-29 Candela Instruments System and method for simultaneously measuring lubricant thickness and degradation, thin film thickness and wear, and surface roughness
US6665078B1 (en) 1997-09-22 2003-12-16 Candela Instruments System and method for simultaneously measuring thin film layer thickness, reflectivity, roughness, surface profile and magnetic pattern in thin film magnetic disks and silicon wafers
US6897957B2 (en) 2001-03-26 2005-05-24 Candela Instruments Material independent optical profilometer
US7061601B2 (en) 1999-07-02 2006-06-13 Kla-Tencor Technologies Corporation System and method for double sided optical inspection of thin film disks or wafers
ATE467810T1 (de) * 2001-03-26 2010-05-15 Candela Instr System zur messung von phasendifferenzen von reflektierten lichtsignalen
WO2002088629A1 (en) * 2001-04-30 2002-11-07 Chromaplex, Inc. Phase-based wavelength measurement apparatus
US6462827B1 (en) * 2001-04-30 2002-10-08 Chromaplex, Inc. Phase-based wavelength measurement apparatus
DE10134677B4 (de) * 2001-07-20 2005-08-18 Schiller, Stephan, Prof. Apparatur für spektrale Messungen mittels Frequenzkämme
US6798512B2 (en) * 2001-08-09 2004-09-28 Therma-Wave, Inc. Multiple beam ellipsometer
US6882437B2 (en) 2002-04-19 2005-04-19 Kla-Tencor Technologies Method of detecting the thickness of thin film disks or wafers
US7620170B2 (en) * 2002-12-31 2009-11-17 At&T Intellectual Property I, L.P. Computer telephony integration (CTI) complete customer contact center
US7573999B2 (en) 2002-12-31 2009-08-11 At&T Intellectual Property I, L.P. Computer telephony integration (CTI) complete healthcare contact center
US7248688B2 (en) 2003-01-27 2007-07-24 Bellsouth Intellectual Property Corporation Virtual physician office systems and methods
US7075741B1 (en) 2004-06-14 2006-07-11 Kla Tencor Technologues Corporation System and method for automatically determining magnetic eccentricity of a disk
US7396022B1 (en) 2004-09-28 2008-07-08 Kla-Tencor Technologies Corp. System and method for optimizing wafer flatness at high rotational speeds
US7201799B1 (en) 2004-11-24 2007-04-10 Kla-Tencor Technologies Corporation System and method for classifying, detecting, and counting micropipes
US7684032B1 (en) 2005-01-06 2010-03-23 Kla-Tencor Corporation Multi-wavelength system and method for detecting epitaxial layer defects
US7466426B2 (en) * 2005-12-14 2008-12-16 General Electric Company Phase shifting imaging module and method of imaging
US8416409B2 (en) 2010-06-04 2013-04-09 Lockheed Martin Corporation Method of ellipsometric reconnaissance
KR20170036979A (ko) 2015-09-25 2017-04-04 주식회사 엔엑스케이 기능성 팬티

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1005928B (zh) * 1987-07-10 1989-11-29 浙江大学 消光-光度兼容的椭圆偏振仪
JPH0239131A (ja) * 1988-07-29 1990-02-08 Hitachi Ltd 周波数間隔安定化方法、光ヘテロダイン又は光ホモダイン通信方法
US5293213A (en) * 1992-08-12 1994-03-08 Klein Uwe K A Utilization of a modulated laser beam in heterodyne interferometry
NL194893C (nl) * 1992-12-31 2003-06-04 Univ Delft Tech Zeeman-ellipsometer.
CN1099128A (zh) * 1994-03-04 1995-02-22 清华大学 用双波长激光进行外差干涉测量绝对距离系统
US6052186A (en) * 1997-11-05 2000-04-18 Excel Precision, Inc. Dual laser system for extended heterodyne interferometry

Also Published As

Publication number Publication date
KR100473923B1 (ko) 2005-03-07
AU7553598A (en) 1998-12-08
NL1006016C2 (nl) 1998-11-10
KR20010012423A (ko) 2001-02-15
WO1998052019A1 (en) 1998-11-19
CN1261958A (zh) 2000-08-02
DE69807683D1 (de) 2002-10-10
DE69807683T2 (de) 2003-05-22
EP0980519A1 (en) 2000-02-23
CN1111734C (zh) 2003-06-18
US6373871B1 (en) 2002-04-16
CA2288673A1 (en) 1998-11-19
EP0980519B1 (en) 2002-09-04
JP2001527681A (ja) 2001-12-25

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