ID17727A - EQUIPMENT AND METHODS FOR HANDLING DOWN LAYERS IN LIQUID TANK - Google Patents

EQUIPMENT AND METHODS FOR HANDLING DOWN LAYERS IN LIQUID TANK

Info

Publication number
ID17727A
ID17727A IDP971343A ID971343A ID17727A ID 17727 A ID17727 A ID 17727A ID P971343 A IDP971343 A ID P971343A ID 971343 A ID971343 A ID 971343A ID 17727 A ID17727 A ID 17727A
Authority
ID
Indonesia
Prior art keywords
equipment
methods
liquid tank
down layers
handling down
Prior art date
Application number
IDP971343A
Other languages
Indonesian (id)
Inventor
Dietmar Schonleber
Original Assignee
Steag Micro Tech Gmbh
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Steag Micro Tech Gmbh filed Critical Steag Micro Tech Gmbh
Publication of ID17727A publication Critical patent/ID17727A/en

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005Apparatus not specifically provided for elsewhere
    • H01L21/67011Apparatus for manufacture or treatment
    • H01L21/67017Apparatus for fluid treatment
    • H01L21/67028Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
    • H01L21/6704Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing
    • H01L21/67057Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing with the semiconductor substrates being dipped in baths or vessels

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
IDP971343A 1996-04-22 1997-04-22 EQUIPMENT AND METHODS FOR HANDLING DOWN LAYERS IN LIQUID TANK ID17727A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE19615970 1996-04-22

Publications (1)

Publication Number Publication Date
ID17727A true ID17727A (en) 1998-01-22

Family

ID=7792063

Family Applications (1)

Application Number Title Priority Date Filing Date
IDP971343A ID17727A (en) 1996-04-22 1997-04-22 EQUIPMENT AND METHODS FOR HANDLING DOWN LAYERS IN LIQUID TANK

Country Status (2)

Country Link
DE (1) DE19703646C2 (en)
ID (1) ID17727A (en)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE19655219C2 (en) * 1996-04-24 2003-11-06 Steag Micro Tech Gmbh Device for treating substrates in a fluid container
DE19859468C2 (en) * 1998-12-22 2002-01-17 Steag Micro Tech Gmbh Device for treating and handling substrates
DE10127042A1 (en) * 2001-06-02 2002-12-12 Astec Halbleitertechnologie Gm Method for treating or handling substrates e.g. for wafers or silicon discs, involves supporting substrate in lower edge region on supporting elements

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL8900480A (en) * 1989-02-27 1990-09-17 Philips Nv METHOD AND APPARATUS FOR DRYING SUBSTRATES AFTER TREATMENT IN A LIQUID
US5265184A (en) * 1992-05-28 1993-11-23 Motorola, Inc. Molded waveguide and method for making same
DE4413077C2 (en) * 1994-04-15 1997-02-06 Steag Micro Tech Gmbh Method and device for chemical treatment of substrates

Also Published As

Publication number Publication date
DE19703646A1 (en) 1997-10-23
DE19703646C2 (en) 1998-04-09

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