HUE047258T2 - Eljárás porózus réteget tartalmazó üvegezés elõállítására - Google Patents

Eljárás porózus réteget tartalmazó üvegezés elõállítására

Info

Publication number
HUE047258T2
HUE047258T2 HUE12738500A HUE12738500A HUE047258T2 HU E047258 T2 HUE047258 T2 HU E047258T2 HU E12738500 A HUE12738500 A HU E12738500A HU E12738500 A HUE12738500 A HU E12738500A HU E047258 T2 HUE047258 T2 HU E047258T2
Authority
HU
Hungary
Prior art keywords
porous layer
manufacturing glazing
glazing
manufacturing
porous
Prior art date
Application number
HUE12738500A
Other languages
English (en)
Inventor
Andriy Kharchenko
Jean-Paul Rousseau
Antje Jung
Christian Bernhard Petersen
Original Assignee
Saint Gobain
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Saint Gobain filed Critical Saint Gobain
Publication of HUE047258T2 publication Critical patent/HUE047258T2/hu

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/08—Oxides
    • C23C14/083—Oxides of refractory metals or yttrium
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/001—General methods for coating; Devices therefor
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/006—Surface treatment of glass, not in the form of fibres or filaments, by coating with materials of composite character
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/0021—Reactive sputtering or evaporation
    • C23C14/0036—Reactive sputtering
    • C23C14/0057—Reactive sputtering using reactive gases other than O2, H2O, N2, NH3 or CH4
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/0605—Carbon
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/10—Glass or silica
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2217/00—Coatings on glass
    • C03C2217/40—Coatings comprising at least one inhomogeneous layer
    • C03C2217/425—Coatings comprising at least one inhomogeneous layer consisting of a porous layer
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/249921—Web or sheet containing structurally defined element or component
    • Y10T428/249953—Composite having voids in a component [e.g., porous, cellular, etc.]
    • Y10T428/249967—Inorganic matrix in void-containing component
    • Y10T428/249969—Of silicon-containing material [e.g., glass, etc.]
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/249921—Web or sheet containing structurally defined element or component
    • Y10T428/249953—Composite having voids in a component [e.g., porous, cellular, etc.]
    • Y10T428/249967—Inorganic matrix in void-containing component
    • Y10T428/24997—Of metal-containing material
HUE12738500A 2011-06-17 2012-06-15 Eljárás porózus réteget tartalmazó üvegezés elõállítására HUE047258T2 (hu)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FR1155329A FR2976577B1 (fr) 2011-06-17 2011-06-17 Procede de fabrication d'un vitrage comprenant une couche poreuse

Publications (1)

Publication Number Publication Date
HUE047258T2 true HUE047258T2 (hu) 2020-04-28

Family

ID=46579161

Family Applications (1)

Application Number Title Priority Date Filing Date
HUE12738500A HUE047258T2 (hu) 2011-06-17 2012-06-15 Eljárás porózus réteget tartalmazó üvegezés elõállítására

Country Status (11)

Country Link
US (1) US9394602B2 (hu)
EP (1) EP2720986B1 (hu)
JP (1) JP6073301B2 (hu)
KR (1) KR20140041734A (hu)
CN (1) CN103619772B (hu)
EA (1) EA026182B1 (hu)
ES (1) ES2767300T3 (hu)
FR (1) FR2976577B1 (hu)
HU (1) HUE047258T2 (hu)
PL (1) PL2720986T3 (hu)
WO (1) WO2012172266A1 (hu)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6036803B2 (ja) * 2012-02-28 2016-11-30 旭硝子株式会社 積層体の製造方法、および積層体
FR3021967B1 (fr) 2014-06-06 2021-04-23 Saint Gobain Procede d'obtention d'un substrat revetu d'une couche fonctionnelle
WO2017056405A1 (ja) * 2015-10-01 2017-04-06 日本板硝子株式会社 コーティング膜付きガラス板及びその製造方法
EP3197022A1 (en) * 2016-01-20 2017-07-26 Siemens Aktiengesellschaft Method for producing a can for an electric motor
FR3051804B1 (fr) * 2016-05-24 2018-06-29 Saint-Gobain Glass France Procede de depot de couches minces
WO2019074901A1 (en) * 2017-10-10 2019-04-18 Carlex Glass America, Llc SUSTAINABLE FUNCTIONAL COATINGS
FR3078409B1 (fr) * 2018-02-26 2021-07-09 Valeo Vision Element optique pour vehicule automobile
WO2021025849A1 (en) 2019-08-05 2021-02-11 Applied Materials, Inc. Coating for chamber particle reduction
CN110922054A (zh) * 2019-11-21 2020-03-27 新福兴玻璃工业集团有限公司 一种防尘增透光伏玻璃的生产工艺

Family Cites Families (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6483529A (en) * 1987-09-28 1989-03-29 Hoya Corp Production of glass forming mold
FR2631346B1 (fr) * 1988-05-11 1994-05-20 Air Liquide Revetement protecteur multicouche pour substrat, procede de protection de substrat par depot par plasma d'un tel revetement, revetements obtenus et leurs applications
FR2699164B1 (fr) * 1992-12-11 1995-02-24 Saint Gobain Vitrage Int Procédé de traitement de couches minces à base d'oxyde ou de nitrure métallique.
FR2738813B1 (fr) 1995-09-15 1997-10-17 Saint Gobain Vitrage Substrat a revetement photo-catalytique
WO1997039476A1 (fr) * 1996-04-18 1997-10-23 Matsushita Electric Industrial Co., Ltd. ELEMENT EN SiC ET SON PROCEDE DE PRODUCTION
US6054206A (en) * 1998-06-22 2000-04-25 Novellus Systems, Inc. Chemical vapor deposition of low density silicon dioxide films
WO2000006794A1 (en) * 1998-07-27 2000-02-10 N.V. Bekaert S.A. Hardcoats for flat panel display substrates
DE19918811A1 (de) 1999-04-26 2000-11-02 Fraunhofer Ges Forschung Vorgespanntes, mit einer wischfesten, porösen SiO¶2¶-Antireflex-Schicht versehenes Sicherheitsglas u. Verfahren z. d. Herstellung
FR2800998B1 (fr) 1999-11-17 2002-04-26 Saint Gobain Vitrage Substrat transparent comportant un revetement antireflet
US6541367B1 (en) * 2000-01-18 2003-04-01 Applied Materials, Inc. Very low dielectric constant plasma-enhanced CVD films
US6632478B2 (en) * 2001-02-22 2003-10-14 Applied Materials, Inc. Process for forming a low dielectric constant carbon-containing film
FR2838735B1 (fr) * 2002-04-17 2005-04-15 Saint Gobain Substrat a revetement auto-nettoyant
US6825130B2 (en) * 2002-12-12 2004-11-30 Asm Japan K.K. CVD of porous dielectric materials
DE10322182A1 (de) * 2003-05-16 2004-12-02 Blue Membranes Gmbh Verfahren zur Herstellung von porösem, kohlenstoffbasiertem Material
DK1626749T3 (da) * 2003-05-28 2009-02-09 Cinv Ag Implantater med funktionaliserede carbonoverflader
WO2005043115A2 (en) 2003-10-20 2005-05-12 Ionwerks, Inc. Ion mobility tof/maldi/ms using drift cell alternating high and low electrical field regions
DE102005007825B4 (de) * 2005-01-10 2015-09-17 Interpane Entwicklungs-Und Beratungsgesellschaft Mbh Verfahren zur Herstellung einer reflexionsmindernden Beschichtung, reflexionsmindernde Schicht auf einem transparenten Substrat sowie Verwendung einer derartigen Schicht
FR2911130B1 (fr) 2007-01-05 2009-11-27 Saint Gobain Procede de depot de couche mince et produit obtenu

Also Published As

Publication number Publication date
US9394602B2 (en) 2016-07-19
ES2767300T3 (es) 2020-06-17
EA201490034A1 (ru) 2014-04-30
EP2720986A1 (fr) 2014-04-23
FR2976577A1 (fr) 2012-12-21
WO2012172266A1 (fr) 2012-12-20
US20140120341A1 (en) 2014-05-01
EP2720986B1 (fr) 2019-11-27
EA026182B1 (ru) 2017-03-31
KR20140041734A (ko) 2014-04-04
CN103619772B (zh) 2017-08-15
PL2720986T3 (pl) 2020-05-18
JP2014522906A (ja) 2014-09-08
CN103619772A (zh) 2014-03-05
JP6073301B2 (ja) 2017-02-01
FR2976577B1 (fr) 2014-03-28

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