HU174296B - Sposob khimicheskogo travlenija kremnistoj poverkhnosti - Google Patents
Sposob khimicheskogo travlenija kremnistoj poverkhnostiInfo
- Publication number
- HU174296B HU174296B HU77EE2503A HUEE002503A HU174296B HU 174296 B HU174296 B HU 174296B HU 77EE2503 A HU77EE2503 A HU 77EE2503A HU EE002503 A HUEE002503 A HU EE002503A HU 174296 B HU174296 B HU 174296B
- Authority
- HU
- Hungary
- Prior art keywords
- silicium
- chemical etching
- etching
- chemical
- silicium surfaces
- Prior art date
Links
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 title 1
- 238000003486 chemical etching Methods 0.000 title 1
- 238000000034 method Methods 0.000 title 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
- H01L21/306—Chemical or electrical treatment, e.g. electrolytic etching
- H01L21/30604—Chemical etching
Landscapes
- Engineering & Computer Science (AREA)
- General Physics & Mathematics (AREA)
- General Chemical & Material Sciences (AREA)
- Physics & Mathematics (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Chemical & Material Sciences (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Weting (AREA)
- Mechanical Treatment Of Semiconductor (AREA)
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
HU77EE2503A HU174296B (hu) | 1977-05-18 | 1977-05-18 | Sposob khimicheskogo travlenija kremnistoj poverkhnosti |
AT662077A AT377868B (de) | 1977-05-18 | 1977-09-14 | Verfahren zum verringern der dicke von siliziumscheiben durch chemisches aetzen |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
HU77EE2503A HU174296B (hu) | 1977-05-18 | 1977-05-18 | Sposob khimicheskogo travlenija kremnistoj poverkhnosti |
Publications (1)
Publication Number | Publication Date |
---|---|
HU174296B true HU174296B (hu) | 1979-12-28 |
Family
ID=10995727
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
HU77EE2503A HU174296B (hu) | 1977-05-18 | 1977-05-18 | Sposob khimicheskogo travlenija kremnistoj poverkhnosti |
Country Status (2)
Country | Link |
---|---|
AT (1) | AT377868B (hu) |
HU (1) | HU174296B (hu) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE3728693A1 (de) * | 1987-08-27 | 1989-03-09 | Wacker Chemitronic | Verfahren und vorrichtung zum aetzen von halbleiteroberflaechen |
-
1977
- 1977-05-18 HU HU77EE2503A patent/HU174296B/hu not_active IP Right Cessation
- 1977-09-14 AT AT662077A patent/AT377868B/de not_active IP Right Cessation
Also Published As
Publication number | Publication date |
---|---|
ATA662077A (de) | 1984-09-15 |
AT377868B (de) | 1985-05-10 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
GB1541521A (en) | Process for the treatment of the surface of polyvinylidenefluoride | |
GB2003176B (en) | Chemical process | |
JPS55148771A (en) | Chemical etching method of worked article surface | |
DE2862403D1 (en) | Process for the preparation of poly(phenylene-oxy-phenylene-sulfone) | |
GB2002381B (en) | Process for the manufacture of sulphobetaines | |
DE3063956D1 (en) | Process for the chemical etching of silicon substrates | |
GB1544142A (en) | Process for the manufacture of water-repellancy agents | |
GB2006212B (en) | Process for the preparation of d(-)-a-phenylglycine | |
GB2003152B (en) | Chemical process | |
GB2002380A (en) | Process for the manufacture of furanones | |
GB2003863B (en) | Chemical process | |
ZA794233B (en) | Chemical etching of polymers for metallizing | |
YU244578A (en) | Process for the manufacturing of muti-layer haemodialyzers | |
GB2009151B (en) | Process for the manufacture of substituted dihydrocinnamaldehydes | |
HU174296B (hu) | Sposob khimicheskogo travlenija kremnistoj poverkhnosti | |
EG14176A (en) | Process for the preparation of antiviral compound | |
YU133778A (en) | Process for obtaining chemical compositions on the base of titanium-trihalogenide | |
GB1521436A (en) | Process for the preparation of halogeno-acetals from enoxysilanes | |
ZA773011B (en) | Process for the preparation of 2-aryliminothiazoline solutions | |
GR64160B (en) | Chemical process for the preparation of ethers | |
HU175254B (hu) | Sposob poluchenija di-n-propil-acetamida | |
GB1550327A (en) | Process for the manufacture of chromenoindole compounds | |
EP0002719A3 (en) | Process for the preparation of 3-pyridazinones | |
PT68882A (en) | Process for the preparation of imino-bridged benzocycloheptapyridines | |
GB1540308A (en) | Process for the treatment of metal surfaces |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
HU90 | Patent valid on 900628 | ||
HMM4 | Cancellation of final prot. due to non-payment of fee |