Classifications

• • C—CHEMISTRY; METALLURGY
  • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
  • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
  • C08G73/00—Macromolecular compounds obtained by reactions forming a linkage containing nitrogen with or without oxygen or carbon in the main chain of the macromolecule, not provided for in groups C08G12/00 - C08G71/00
• • G—PHYSICS
  • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
  • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
  • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
  • G03F7/004—Photosensitive materials
  • G03F7/016—Diazonium salts or compounds
  • G03F7/021—Macromolecular diazonium compounds; Macromolecular additives, e.g. binders
• • G—PHYSICS
  • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
  • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
  • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
  • G03F7/12—Production of screen printing forms or similar printing forms, e.g. stencils

Landscapes

• Physics & Mathematics (AREA)
• General Physics & Mathematics (AREA)
• Chemical & Material Sciences (AREA)
• Health & Medical Sciences (AREA)
• Chemical Kinetics & Catalysis (AREA)
• Medicinal Chemistry (AREA)
• Polymers & Plastics (AREA)
• Organic Chemistry (AREA)
• Spectroscopy & Molecular Physics (AREA)
• Photosensitive Polymer And Photoresist Processing (AREA)
• Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)

Applications Claiming Priority (1)

Publications (1)

Family

ID=5780284

Family Applications (1)

Country Status (19)

Families Citing this family (3)

Family Cites Families (1)

• 1970
  • 1970-08-20 DE DE2041395A patent/DE2041395C2/de not_active Expired
• 1971
  • 1971-08-04 AU AU31977/71A patent/AU464160B2/en not_active Expired
  • 1971-08-10 NL NLAANVRAGE7111004,A patent/NL169524C/xx not_active IP Right Cessation
  • 1971-08-13 CS CS5885A patent/CS152403B2/cs unknown
  • 1971-08-17 CA CA120,710A patent/CA964515A/en not_active Expired
  • 1971-08-17 CH CH1206371A patent/CH580288A5/xx not_active IP Right Cessation
  • 1971-08-17 BE BE771429A patent/BE771429A/xx unknown
  • 1971-08-17 AT AT717771A patent/AT308778B/de active
  • 1971-08-17 TR TR18288A patent/TR18288A/xx unknown
  • 1971-08-18 HU HUKA1309A patent/HU166246B/hu unknown
  • 1971-08-18 IL IL37517A patent/IL37517A0/xx unknown
  • 1971-08-19 BR BR5399/71A patent/BR7105399D0/pt unknown
  • 1971-08-19 PL PL1971150100A patent/PL81660B1/pl unknown
  • 1971-08-19 FR FR7130208A patent/FR2107058A5/fr not_active Expired
  • 1971-08-19 YU YU2135/71A patent/YU36313B/xx unknown
  • 1971-08-19 ES ES394368A patent/ES394368A1/es not_active Expired
  • 1971-08-19 SE SE7110568A patent/SE370583B/xx unknown
  • 1971-08-20 JP JP6353971A patent/JPS549521B1/ja active Pending
  • 1971-08-20 ZA ZA715564A patent/ZA715564B/xx unknown

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