HRP20180022T1 - Metalni materijali s uklopljenim luminiscentnim česticama - Google Patents

Metalni materijali s uklopljenim luminiscentnim česticama Download PDF

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Publication number
HRP20180022T1
HRP20180022T1 HRP20180022TT HRP20180022T HRP20180022T1 HR P20180022 T1 HRP20180022 T1 HR P20180022T1 HR P20180022T T HRP20180022T T HR P20180022TT HR P20180022 T HRP20180022 T HR P20180022T HR P20180022 T1 HRP20180022 T1 HR P20180022T1
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Croatia
Prior art keywords
luminescent particles
metal substrate
metal layer
metal
galvanized
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HRP20180022TT
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English (en)
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Jeffrey L. Conroy
Philip B Forshee
James A. Shearer
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The Royal Mint Limited
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Publication of HRP20180022T1 publication Critical patent/HRP20180022T1/hr

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    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D7/00Electroplating characterised by the article coated
    • C25D7/005Jewels; Clockworks; Coins
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B15/00Layered products comprising a layer of metal
    • B32B15/01Layered products comprising a layer of metal all layers being exclusively metallic
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/16Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
    • C23C18/1601Process or apparatus
    • C23C18/1633Process of electroless plating
    • C23C18/1635Composition of the substrate
    • C23C18/1637Composition of the substrate metallic substrate
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/16Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
    • C23C18/1601Process or apparatus
    • C23C18/1633Process of electroless plating
    • C23C18/1646Characteristics of the product obtained
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/16Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
    • C23C18/1601Process or apparatus
    • C23C18/1633Process of electroless plating
    • C23C18/1646Characteristics of the product obtained
    • C23C18/165Multilayered product
    • C23C18/1653Two or more layers with at least one layer obtained by electroless plating and one layer obtained by electroplating
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/16Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
    • C23C18/1601Process or apparatus
    • C23C18/1633Process of electroless plating
    • C23C18/1655Process features
    • C23C18/1662Use of incorporated material in the solution or dispersion, e.g. particles, whiskers, wires
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D15/00Electrolytic or electrophoretic production of coatings containing embedded materials, e.g. particles, whiskers, wires
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D17/00Constructional parts, or assemblies thereof, of cells for electrolytic coating
    • C25D17/16Apparatus for electrolytic coating of small objects in bulk
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/02Electroplating of selected surface areas
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/10Electroplating with more than one layer of the same or of different metals
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D7/00Electroplating characterised by the article coated
    • GPHYSICS
    • G07CHECKING-DEVICES
    • G07DHANDLING OF COINS OR VALUABLE PAPERS, e.g. TESTING, SORTING BY DENOMINATIONS, COUNTING, DISPENSING, CHANGING OR DEPOSITING
    • G07D5/00Testing specially adapted to determine the identity or genuineness of coins, e.g. for segregating coins which are unacceptable or alien to a currency
    • GPHYSICS
    • G07CHECKING-DEVICES
    • G07DHANDLING OF COINS OR VALUABLE PAPERS, e.g. TESTING, SORTING BY DENOMINATIONS, COUNTING, DISPENSING, CHANGING OR DEPOSITING
    • G07D7/00Testing specially adapted to determine the identity or genuineness of valuable papers or for segregating those which are unacceptable, e.g. banknotes that are alien to a currency
    • G07D7/06Testing specially adapted to determine the identity or genuineness of valuable papers or for segregating those which are unacceptable, e.g. banknotes that are alien to a currency using wave or particle radiation
    • G07D7/12Visible light, infrared or ultraviolet radiation
    • GPHYSICS
    • G07CHECKING-DEVICES
    • G07FCOIN-FREED OR LIKE APPARATUS
    • G07F7/00Mechanisms actuated by objects other than coins to free or to actuate vending, hiring, coin or paper currency dispensing or refunding apparatus
    • G07F7/08Mechanisms actuated by objects other than coins to free or to actuate vending, hiring, coin or paper currency dispensing or refunding apparatus by coded identity card or credit card or other personal identification means
    • G07F7/0806Details of the card
    • G07F7/0813Specific details related to card security
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/16Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
    • C23C18/31Coating with metals
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/16Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
    • C23C18/31Coating with metals
    • C23C18/32Coating with nickel, cobalt or mixtures thereof with phosphorus or boron
    • C23C18/34Coating with nickel, cobalt or mixtures thereof with phosphorus or boron using reducing agents
    • C23C18/36Coating with nickel, cobalt or mixtures thereof with phosphorus or boron using reducing agents using hypophosphites
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    • C25D3/00Electroplating: Baths therefor
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    • C25D3/12Electroplating: Baths therefor from solutions of nickel or cobalt
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    • C25D3/00Electroplating: Baths therefor
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    • C25D3/22Electroplating: Baths therefor from solutions of zinc
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    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00Electroplating: Baths therefor
    • C25D3/02Electroplating: Baths therefor from solutions
    • C25D3/38Electroplating: Baths therefor from solutions of copper
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    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00Electroplating: Baths therefor
    • C25D3/02Electroplating: Baths therefor from solutions
    • C25D3/56Electroplating: Baths therefor from solutions of alloys
    • C25D3/58Electroplating: Baths therefor from solutions of alloys containing more than 50% by weight of copper
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00Stock material or miscellaneous articles
    • Y10T428/12All metal or with adjacent metals
    • Y10T428/12493Composite; i.e., plural, adjacent, spatially distinct metal components [e.g., layers, joint, etc.]

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
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  • Computer Security & Cryptography (AREA)
  • Electroplating Methods And Accessories (AREA)
  • Luminescent Compositions (AREA)
  • Chemically Coating (AREA)
  • Other Surface Treatments For Metallic Materials (AREA)

Claims (12)

1. Postupak deponiranje metalnog sloja s uklopljenim luminiscentnim česticama na metalnu podlogu, koji se sastoji u: miješanju luminiscentnih čestica s metalnim materijalom kako bi se dobilo otopinu za galvaniziranje; stavljanju metalne podloge u otopinu za galvaniziranje; i provođenju postupka oblaganja kako bi se obložilo metalnu podlogu metalnim slojem, gdje metalni sloj sadrži uklopljene luminiscentne čestice, gdje je postupak oblaganja postupak galvaniziranja i naznačen time što postupak galvaniziranja uključuje rotiranje bubnja u kojem se nalazi metalna podloga kada se stavi u otopinu za galvaniziranje; gdje se luminiscentne čestice dispergirane u otopini za galvaniziranje fizički raspodijele po cijelom metalnom matriksu prilikom formiranja galvaniziranog sloja.
2. Postupak u skladu s patentnim zahtjevom 1, naznačen time što postupak galvaniziranja sastoji uključuje povremeno rotiranje bubnja dok se metalni sloj galvanizira na metalnu podlogu.
3. Postupak u skladu s patentnim zahtjevom 2, naznačen time što se bubanj povremeno vrti u jednom ili više vremenskih perioda kraćih od vremenskih perioda u kojima se bubanj ne vrti.
4. Postupak u skladu s patentnim zahtjevom 3, naznačen time što je svaki od jednog ili više vremenskih perioda otprilike 25% od svakog od vremenskih perioda u kojima se bubanj ne vrti.
5. Postupak u skladu s patentnim zahtjevom 1, naznačen time što se luminiscentne čestice bira između fosfora na bazi itrijevog oksida dopiranih rijetkom zemljom s gustoćom iznad 5,0 g/cm3 i fosfora na bazi oksida rijetke zemlje gadolinija s gustoćama iznad 7,4 g/cm3.
6. Postupak u skladu s patentnim zahtjevom 1, naznačen time što se uklopljene luminiscentne čestice deponira na svim stranama metalne podloge.
7. Metalna podloga koja ima galvanizirani metalni sloj na metalnoj podlozi, gdje galvanizirani metalni sloj sadrži uklopljene luminiscentne čestice, gdje galvanizirani metalni sloj sadrži luminiscentne čestice deponirane na metalnoj podlozi postupkom u skladu s patentnim zahtjevom 1, naznačena time što galvanizirani metalni sloj ima sastav u kojem su uklopljene luminiscentne čestice raspodijeljene po cijelom galvaniziranom metalnom sloju.
8. Metalna podloga u skladu s patentnim zahtjevom 7, naznačen time što uklopljene luminiscentne čestice imaju sastav podešen za emitiranje energije druge valne duljine kada ih se pobudi energijom prve valne duljine.
9. Metalna podloga u skladu s patentnim zahtjevom 8, naznačen time što se galvanizirani metalni sloj bira iz skupine koju čine nikal, niklo-fosfor, bakar, mjed, zlato, srebro, te platina.
10. Metalna podloga u skladu s patentnim zahtjevom 9, naznačena time što se metalnu podlogu bira iz skupine koju čine bakar, mjed, bronca, niskougljični čelik, nehrđajući čelik, te titanij.
11. Metalna podloga u skladu s patentnim zahtjevom 9, naznačena time što je metalna podloga prenosiva kovanica.
12. Metalna podloga u skladu s patentnim zahtjevom 7, naznačena time što ima drugi galvanizirani metalni sloj, koji sadrži uklopljene luminiscentne čestice drugačijeg sastava nego ranije uklopljene luminiscentne čestice.
HRP20180022TT 2010-06-10 2018-01-08 Metalni materijali s uklopljenim luminiscentnim česticama HRP20180022T1 (hr)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
US35333310P 2010-06-10 2010-06-10
US13/156,794 US20110305919A1 (en) 2010-06-10 2011-06-09 Metallic materials with embedded luminescent particles
EP11728732.6A EP2580374B1 (en) 2010-06-10 2011-06-10 Metallic materials with embedded luminescent particles
PCT/US2011/039918 WO2011156676A2 (en) 2010-06-10 2011-06-10 Metallic materials with embedded luminescent particles

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HRP20180022T1 true HRP20180022T1 (hr) 2018-02-09

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US (5) US20110305919A1 (hr)
EP (2) EP2580374B1 (hr)
JP (1) JP2013533924A (hr)
KR (1) KR20140004056A (hr)
CN (1) CN103080376A (hr)
AU (1) AU2011264736B2 (hr)
BR (1) BR112012031134A2 (hr)
CA (1) CA2801418A1 (hr)
CL (1) CL2012003442A1 (hr)
DK (1) DK2580374T3 (hr)
ES (1) ES2655612T3 (hr)
HR (1) HRP20180022T1 (hr)
HU (1) HUE036260T2 (hr)
MX (1) MX337379B (hr)
NO (1) NO2580374T3 (hr)
PH (1) PH12016501949B1 (hr)
PL (1) PL2580374T3 (hr)
PT (1) PT2580374T (hr)
RS (1) RS56730B1 (hr)
RU (1) RU2013100159A (hr)
SG (1) SG186188A1 (hr)
WO (1) WO2011156676A2 (hr)
ZA (3) ZA201209181B (hr)

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