HK56586A - 1,3-diaza-9-thia-anthracene-2,4-diones and photopolymerizable mixture containing these compounds - Google Patents
1,3-diaza-9-thia-anthracene-2,4-diones and photopolymerizable mixture containing these compoundsInfo
- Publication number
- HK56586A HK56586A HK565/86A HK56586A HK56586A HK 56586 A HK56586 A HK 56586A HK 565/86 A HK565/86 A HK 565/86A HK 56586 A HK56586 A HK 56586A HK 56586 A HK56586 A HK 56586A
- Authority
- HK
- Hong Kong
- Prior art keywords
- alkoxy
- diones
- thia
- diaza
- anthracene
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D495/00—Heterocyclic compounds containing in the condensed system at least one hetero ring having sulfur atoms as the only ring hetero atoms
- C07D495/02—Heterocyclic compounds containing in the condensed system at least one hetero ring having sulfur atoms as the only ring hetero atoms in which the condensed system contains two hetero rings
- C07D495/04—Ortho-condensed systems
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D239/00—Heterocyclic compounds containing 1,3-diazine or hydrogenated 1,3-diazine rings
- C07D239/02—Heterocyclic compounds containing 1,3-diazine or hydrogenated 1,3-diazine rings not condensed with other rings
- C07D239/24—Heterocyclic compounds containing 1,3-diazine or hydrogenated 1,3-diazine rings not condensed with other rings having three or more double bonds between ring members or between ring members and non-ring members
- C07D239/28—Heterocyclic compounds containing 1,3-diazine or hydrogenated 1,3-diazine rings not condensed with other rings having three or more double bonds between ring members or between ring members and non-ring members with hetero atoms or with carbon atoms having three bonds to hetero atoms with at the most one bond to halogen, directly attached to ring carbon atoms
- C07D239/32—One oxygen, sulfur or nitrogen atom
- C07D239/38—One sulfur atom
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
- G03F7/031—Organic compounds not covered by group G03F7/029
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
- Y10S430/1055—Radiation sensitive composition or product or process of making
- Y10S430/106—Binder containing
- Y10S430/111—Polymer of unsaturated acid or ester
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
- Y10S430/1055—Radiation sensitive composition or product or process of making
- Y10S430/114—Initiator containing
- Y10S430/116—Redox or dye sensitizer
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
- Y10S430/1055—Radiation sensitive composition or product or process of making
- Y10S430/114—Initiator containing
- Y10S430/117—Free radical
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
- Y10S430/1055—Radiation sensitive composition or product or process of making
- Y10S430/114—Initiator containing
- Y10S430/12—Nitrogen compound containing
- Y10S430/121—Nitrogen in heterocyclic ring
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
- Y10S430/1055—Radiation sensitive composition or product or process of making
- Y10S430/114—Initiator containing
- Y10S430/122—Sulfur compound containing
- Y10S430/123—Sulfur in heterocyclic ring
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Polymerisation Methods In General (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Luminescent Compositions (AREA)
- Photoreceptors In Electrophotography (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
- Polymers With Sulfur, Phosphorus Or Metals In The Main Chain (AREA)
- Lubricants (AREA)
- Nitrogen Condensed Heterocyclic Rings (AREA)
- Heterocyclic Carbon Compounds Containing A Hetero Ring Having Oxygen Or Sulfur (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE19823232621 DE3232621A1 (de) | 1982-09-02 | 1982-09-02 | 1,3-diaza-9-thia-anthracen-2,4-dione und diese enthaltendes photopolymerisierbares gemisch |
Publications (1)
Publication Number | Publication Date |
---|---|
HK56586A true HK56586A (en) | 1986-08-08 |
Family
ID=6172295
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
HK565/86A HK56586A (en) | 1982-09-02 | 1986-07-31 | 1,3-diaza-9-thia-anthracene-2,4-diones and photopolymerizable mixture containing these compounds |
Country Status (13)
Country | Link |
---|---|
US (1) | US4465758A (xx) |
EP (1) | EP0102586B1 (xx) |
JP (1) | JPS5959690A (xx) |
AT (1) | ATE16934T1 (xx) |
AU (1) | AU1856883A (xx) |
BR (1) | BR8304780A (xx) |
CA (1) | CA1213274A (xx) |
DE (2) | DE3232621A1 (xx) |
ES (1) | ES525308A0 (xx) |
FI (1) | FI833100A (xx) |
HK (1) | HK56586A (xx) |
SG (1) | SG42686G (xx) |
ZA (1) | ZA836483B (xx) |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE3420425A1 (de) * | 1984-06-01 | 1985-12-05 | Hoechst Ag, 6230 Frankfurt | Photopolymerisierbares gemisch, das als photoinitiator ein 1,3,10-triazaanthracen-4-on- enthaelt |
US10226464B2 (en) | 2015-12-29 | 2019-03-12 | ImmuneTarget, Inc. | Small molecule NF-κB inhibitors |
Family Cites Families (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE2027467C3 (de) * | 1970-06-04 | 1974-08-15 | Kalle Ag, 6202 Wiesbaden-Biebrich | Photopolymerisierbare Kopiermasse |
CH599569A5 (en) * | 1970-08-11 | 1978-05-31 | Hoechst Ag | Photoinitiators |
DE2039861C3 (de) * | 1970-08-11 | 1973-12-13 | Kalle Ag, 6202 Wiesbaden-Biebrich | Photopolymensierbare Kopier masse |
US4296196A (en) * | 1978-05-20 | 1981-10-20 | Hoechst Aktiengesellschaft | Photopolymerizable mixture in a transfer element |
DE2822190A1 (de) * | 1978-05-20 | 1979-11-22 | Hoechst Ag | Photopolymerisierbares gemisch |
US4189366A (en) * | 1979-01-15 | 1980-02-19 | Eastman Kodak Company | Radiation curable compositions containing 5-halo-6-halomethyluracil derivatives as photoinitiators |
-
1982
- 1982-09-02 DE DE19823232621 patent/DE3232621A1/de not_active Withdrawn
-
1983
- 1983-08-24 AT AT83108310T patent/ATE16934T1/de not_active IP Right Cessation
- 1983-08-24 EP EP83108310A patent/EP0102586B1/de not_active Expired
- 1983-08-24 DE DE8383108310T patent/DE3361497D1/de not_active Expired
- 1983-08-29 US US06/527,467 patent/US4465758A/en not_active Expired - Fee Related
- 1983-08-31 AU AU18568/83A patent/AU1856883A/en not_active Abandoned
- 1983-08-31 FI FI833100A patent/FI833100A/fi not_active Application Discontinuation
- 1983-09-01 CA CA000435907A patent/CA1213274A/en not_active Expired
- 1983-09-01 BR BR8304780A patent/BR8304780A/pt unknown
- 1983-09-01 ZA ZA836483A patent/ZA836483B/xx unknown
- 1983-09-01 JP JP58159119A patent/JPS5959690A/ja active Pending
- 1983-09-01 ES ES525308A patent/ES525308A0/es active Granted
-
1986
- 1986-05-12 SG SG426/86A patent/SG42686G/en unknown
- 1986-07-31 HK HK565/86A patent/HK56586A/xx unknown
Also Published As
Publication number | Publication date |
---|---|
AU1856883A (en) | 1984-03-08 |
EP0102586B1 (de) | 1985-12-11 |
DE3232621A1 (de) | 1984-03-08 |
BR8304780A (pt) | 1984-04-10 |
FI833100A0 (fi) | 1983-08-31 |
JPS5959690A (ja) | 1984-04-05 |
FI833100A (fi) | 1984-03-03 |
ATE16934T1 (de) | 1985-12-15 |
US4465758A (en) | 1984-08-14 |
ZA836483B (en) | 1984-04-25 |
ES8500952A1 (es) | 1984-11-01 |
ES525308A0 (es) | 1984-11-01 |
CA1213274A (en) | 1986-10-28 |
SG42686G (en) | 1987-09-18 |
DE3361497D1 (en) | 1986-01-23 |
EP0102586A1 (de) | 1984-03-14 |
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