HK1220172A1 - 附接至駐極體襯底的膠質納米顆粒的微觀/納米結構和製造這種微觀/納米結構的方法 - Google Patents

附接至駐極體襯底的膠質納米顆粒的微觀/納米結構和製造這種微觀/納米結構的方法

Info

Publication number
HK1220172A1
HK1220172A1 HK16108194.9A HK16108194A HK1220172A1 HK 1220172 A1 HK1220172 A1 HK 1220172A1 HK 16108194 A HK16108194 A HK 16108194A HK 1220172 A1 HK1220172 A1 HK 1220172A1
Authority
HK
Hong Kong
Prior art keywords
micro
nano structures
producing
colloidal nanoparticles
nanoparticles attached
Prior art date
Application number
HK16108194.9A
Other languages
English (en)
Inventor
Laurence Ressier
Munikrishnaiah Sangeetha Neralagatta
Pierre Moutet
Original Assignee
Inst Nat Des Sciences Appl De Toulou
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Inst Nat Des Sciences Appl De Toulou filed Critical Inst Nat Des Sciences Appl De Toulou
Publication of HK1220172A1 publication Critical patent/HK1220172A1/zh

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B81—MICROSTRUCTURAL TECHNOLOGY
    • B81C—PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
    • B81C1/00—Manufacture or treatment of devices or systems in or on a substrate
    • B81C1/00349—Creating layers of material on a substrate
    • B81C1/00373—Selective deposition, e.g. printing or microcontact printing
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D3/00—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials
    • B05D3/14—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials by electrical means
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03G—ELECTROGRAPHY; ELECTROPHOTOGRAPHY; MAGNETOGRAPHY
    • G03G5/00—Recording members for original recording by exposure, e.g. to light, to heat, to electrons; Manufacture thereof; Selection of materials therefor
    • G03G5/02—Charge-receiving layers
    • G03G5/024—Photoelectret layers
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01G—CAPACITORS; CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES, LIGHT-SENSITIVE OR TEMPERATURE-SENSITIVE DEVICES OF THE ELECTROLYTIC TYPE
    • H01G7/00—Capacitors in which the capacitance is varied by non-mechanical means; Processes of their manufacture
    • H01G7/02—Electrets, i.e. having a permanently-polarised dielectric
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y30/00—Nanotechnology for materials or surface science, e.g. nanocomposites
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y40/00—Manufacture or treatment of nanostructures

Landscapes

  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Manufacturing & Machinery (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Electrochromic Elements, Electrophoresis, Or Variable Reflection Or Absorption Elements (AREA)
  • Laminated Bodies (AREA)
  • Electrostatic, Electromagnetic, Magneto- Strictive, And Variable-Resistance Transducers (AREA)
HK16108194.9A 2013-03-08 2016-07-13 附接至駐極體襯底的膠質納米顆粒的微觀/納米結構和製造這種微觀/納米結構的方法 HK1220172A1 (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
FR1352092A FR3002864B1 (fr) 2013-03-08 2013-03-08 Micro/nano structures de nanoparticules colloidales fixees sur un substrat electret et procede de fabrication de telles micro/nano structures.
PCT/IB2014/059308 WO2014136023A1 (fr) 2013-03-08 2014-02-27 Micro/nano structures de nanoparticules colloïdales fixées sur un substrat électret et procédé de fabrication de telles micro/nano structures

Publications (1)

Publication Number Publication Date
HK1220172A1 true HK1220172A1 (zh) 2017-04-28

Family

ID=48979859

Family Applications (1)

Application Number Title Priority Date Filing Date
HK16108194.9A HK1220172A1 (zh) 2013-03-08 2016-07-13 附接至駐極體襯底的膠質納米顆粒的微觀/納米結構和製造這種微觀/納米結構的方法

Country Status (7)

Country Link
US (1) US9975764B2 (zh)
EP (1) EP2964564B1 (zh)
CN (1) CN105209371A (zh)
ES (1) ES2718332T3 (zh)
FR (1) FR3002864B1 (zh)
HK (1) HK1220172A1 (zh)
WO (1) WO2014136023A1 (zh)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9646854B2 (en) * 2014-03-28 2017-05-09 Intel Corporation Embedded circuit patterning feature selective electroless copper plating
US20160136992A1 (en) * 2014-11-18 2016-05-19 Ebo Usa Inc. Embedded nanoparticle anti-counterfeit patterning on a substrate and method of making the same
CN107402184B (zh) * 2016-05-20 2020-01-03 清华大学 一种测量纳米结构表面电荷分布的方法
CN107402440B (zh) * 2016-05-20 2020-01-07 清华大学 一种观测纳米结构表面电荷分布的方法
KR102120482B1 (ko) * 2018-10-05 2020-06-08 씨제이제일제당 (주) 생분해성 고분자 나노입자를 포함하는 메모리 소자 및 이의 제조방법
CN110182757A (zh) * 2019-05-31 2019-08-30 南京大学 一种纳米结构的制造方法
WO2021023654A1 (en) 2019-08-05 2021-02-11 Nexdot Electro-luminescent material and electro-luminescent device
EP4010449A1 (en) 2019-08-05 2022-06-15 Nexdot Fluorescent film and conversion layer
EP4010447A1 (en) * 2019-08-05 2022-06-15 Nexdot Light sensitive device
CN111277052A (zh) * 2019-11-13 2020-06-12 北京纳杰科技有限公司 一种发电方法

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8093144B2 (en) * 2002-05-24 2012-01-10 Massachusetts Institute Of Technology Patterning of nanostructures
US8025952B2 (en) * 2002-09-13 2011-09-27 Jds Uniphase Corporation Printed magnetic ink overt security image
US7232771B2 (en) * 2003-11-04 2007-06-19 Regents Of The University Of Minnesota Method and apparatus for depositing charge and/or nanoparticles

Also Published As

Publication number Publication date
US20160009552A1 (en) 2016-01-14
FR3002864A1 (fr) 2014-09-12
CN105209371A (zh) 2015-12-30
EP2964564B1 (fr) 2019-01-09
WO2014136023A1 (fr) 2014-09-12
FR3002864B1 (fr) 2017-10-27
EP2964564A1 (fr) 2016-01-13
ES2718332T3 (es) 2019-07-01
US9975764B2 (en) 2018-05-22

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