HK1208269A1 - Liquid deposition photolithography - Google Patents

Liquid deposition photolithography

Info

Publication number
HK1208269A1
HK1208269A1 HK15108928.3A HK15108928A HK1208269A1 HK 1208269 A1 HK1208269 A1 HK 1208269A1 HK 15108928 A HK15108928 A HK 15108928A HK 1208269 A1 HK1208269 A1 HK 1208269A1
Authority
HK
Hong Kong
Prior art keywords
liquid deposition
deposition photolithography
photolithography
liquid
deposition
Prior art date
Application number
HK15108928.3A
Other languages
English (en)
Chinese (zh)
Inventor
羅伯特‧
‧麥克利奧德
亞當‧厄尼斯
邁克爾‧科爾
埃裏克‧摩爾
Original Assignee
Univ Colorado A Body C
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Univ Colorado A Body C filed Critical Univ Colorado A Body C
Publication of HK1208269A1 publication Critical patent/HK1208269A1/xx

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2041—Exposure; Apparatus therefor in the presence of a fluid, e.g. immersion; using fluid cooling means
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0035—Multiple processes, e.g. applying a further resist layer on an already in a previously step, processed pattern or textured surface
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2022—Multi-step exposure, e.g. hybrid; backside exposure; blanket exposure, e.g. for image reversal; edge exposure, e.g. for edge bead removal; corrective exposure
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70341—Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
HK15108928.3A 2012-03-22 2015-09-11 Liquid deposition photolithography HK1208269A1 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US201261614356P 2012-03-22 2012-03-22
PCT/US2013/033581 WO2013142830A1 (en) 2012-03-22 2013-03-22 Liquid deposition photolithography

Publications (1)

Publication Number Publication Date
HK1208269A1 true HK1208269A1 (en) 2016-02-26

Family

ID=49212157

Family Applications (1)

Application Number Title Priority Date Filing Date
HK15108928.3A HK1208269A1 (en) 2012-03-22 2015-09-11 Liquid deposition photolithography

Country Status (8)

Country Link
US (2) US9034568B2 (xx)
EP (1) EP2828709A4 (xx)
JP (1) JP2015514318A (xx)
CN (1) CN104471483A (xx)
CA (1) CA2867861A1 (xx)
HK (1) HK1208269A1 (xx)
SG (1) SG11201405876YA (xx)
WO (1) WO2013142830A1 (xx)

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MX350841B (es) * 2013-02-12 2017-09-18 Carbon3D Inc Método y aparato para fabricación tridimensional.
US9360757B2 (en) 2013-08-14 2016-06-07 Carbon3D, Inc. Continuous liquid interphase printing
US11260208B2 (en) 2018-06-08 2022-03-01 Acclarent, Inc. Dilation catheter with removable bulb tip
US10073424B2 (en) 2014-05-13 2018-09-11 Autodesk, Inc. Intelligent 3D printing through optimization of 3D print parameters
US9841750B2 (en) 2014-05-13 2017-12-12 Autodesk, Inc. Dynamic real-time slice engine for 3D printing
US9782934B2 (en) 2014-05-13 2017-10-10 Autodesk, Inc. 3D print adhesion reduction during cure process
SG11201609656UA (en) 2014-06-20 2017-01-27 Carbon Inc Three-dimensional printing with reciprocal feeding of polymerizable liquid
KR20170023977A (ko) 2014-06-23 2017-03-06 카본, 인크. 3차원 물체의 제조에 사용하기 위한, 다중 경화 메커니즘을 갖는 폴리우레탄 수지
US10166725B2 (en) 2014-09-08 2019-01-01 Holo, Inc. Three dimensional printing adhesion reduction using photoinhibition
US11141919B2 (en) 2015-12-09 2021-10-12 Holo, Inc. Multi-material stereolithographic three dimensional printing
US10935891B2 (en) 2017-03-13 2021-03-02 Holo, Inc. Multi wavelength stereolithography hardware configurations
US10316213B1 (en) 2017-05-01 2019-06-11 Formlabs, Inc. Dual-cure resins and related methods
GB2564956B (en) 2017-05-15 2020-04-29 Holo Inc Viscous film three-dimensional printing systems and methods
US10245785B2 (en) 2017-06-16 2019-04-02 Holo, Inc. Methods for stereolithography three-dimensional printing
DE102017210384B3 (de) 2017-06-21 2018-08-30 Sirona Dental Systems Gmbh Behälter zum Einsatz in Stereolithographie-Anlagen und Stereolithographie-Anlage
US11084222B2 (en) 2017-06-30 2021-08-10 Autodesk, Inc. Systems and methods for determining dynamic forces in a liquefier system in additive manufacturing
US11104075B2 (en) 2018-11-01 2021-08-31 Stratasys, Inc. System for window separation in an additive manufacturing process
CN216941832U (zh) 2018-11-01 2022-07-12 斯特塔西公司 增材制造系统
EP3902659A4 (en) 2018-12-26 2022-09-07 Holo, Inc. SENSORS FOR THREE-DIMENSIONAL PRESSURE SYSTEMS AND PROCESSES
CN112238611A (zh) * 2019-07-19 2021-01-19 三纬国际立体列印科技股份有限公司 可快速打印并保持液面平整的光固化3d打印机
CN115485310A (zh) 2020-03-13 2022-12-16 阿莱恩技术有限公司 热固性材料中用于提高韧性的弱共价交联
US11661468B2 (en) 2020-08-27 2023-05-30 Align Technology, Inc. Additive manufacturing using variable temperature-controlled resins
US20240051246A1 (en) 2022-08-15 2024-02-15 Align Technology, Inc. Methods for selective post-curing of additively manufactured objects
WO2024059749A2 (en) 2022-09-15 2024-03-21 Align Technology, Inc. Systems and methods for modifying surfaces of additively manufactured objects
US20240100775A1 (en) 2022-09-22 2024-03-28 Cubicure Gmbh Modular build platforms for additive manufacturing
WO2024086752A1 (en) 2022-10-20 2024-04-25 Align Technology, Inc. Systems and methods for generating directly manufacturable dental appliances
WO2024092007A1 (en) 2022-10-26 2024-05-02 Align Technology, Inc. Materials and additively manufactured objects with mechanically interlocking elements
WO2024092097A1 (en) 2022-10-26 2024-05-02 Align Technology, Inc. Additive manufacturing systems with fixed substrates
WO2024097181A1 (en) 2022-11-01 2024-05-10 Align Technology, Inc. Prefabricated support structures and/or overlays for additive manufacturing

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US4752498A (en) 1987-03-02 1988-06-21 Fudim Efrem V Method and apparatus for production of three-dimensional objects by photosolidification
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US7049049B2 (en) * 2001-06-27 2006-05-23 University Of South Florida Maskless photolithography for using photoreactive agents
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Also Published As

Publication number Publication date
CA2867861A1 (en) 2013-09-26
US9034568B2 (en) 2015-05-19
US20150261091A1 (en) 2015-09-17
WO2013142830A1 (en) 2013-09-26
US10162264B2 (en) 2018-12-25
EP2828709A4 (en) 2015-11-04
JP2015514318A (ja) 2015-05-18
SG11201405876YA (en) 2014-10-30
EP2828709A1 (en) 2015-01-28
CN104471483A (zh) 2015-03-25
US20130252178A1 (en) 2013-09-26

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