HK1176461A1 - Continuous tunable lc resonator using a fet as a varactor - Google Patents

Continuous tunable lc resonator using a fet as a varactor

Info

Publication number
HK1176461A1
HK1176461A1 HK13103770.5A HK13103770A HK1176461A1 HK 1176461 A1 HK1176461 A1 HK 1176461A1 HK 13103770 A HK13103770 A HK 13103770A HK 1176461 A1 HK1176461 A1 HK 1176461A1
Authority
HK
Hong Kong
Prior art keywords
varactor
fet
resonator
continuous tunable
tunable
Prior art date
Application number
HK13103770.5A
Other languages
Chinese (zh)
Inventor
Bin Li
Peter J Zampardi
Andre G Metzger
Original Assignee
天工方案公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 天工方案公司 filed Critical 天工方案公司
Publication of HK1176461A1 publication Critical patent/HK1176461A1/en

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00Semiconductor devices adapted for rectifying, amplifying, oscillating or switching, or capacitors or resistors with at least one potential-jump barrier or surface barrier, e.g. PN junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof  ; Multistep manufacturing processes therefor
    • H01L29/66Types of semiconductor device ; Multistep manufacturing processes therefor
    • H01L29/86Types of semiconductor device ; Multistep manufacturing processes therefor controllable only by variation of the electric current supplied, or only the electric potential applied, to one or more of the electrodes carrying the current to be rectified, amplified, oscillated or switched
    • H01L29/92Capacitors with potential-jump barrier or surface barrier
    • H01L29/93Variable capacitance diodes, e.g. varactors
    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11CSTATIC STORES
    • G11C5/00Details of stores covered by group G11C11/00
    • G11C5/02Disposition of storage elements, e.g. in the form of a matrix array
    • GPHYSICS
    • G16INFORMATION AND COMMUNICATION TECHNOLOGY [ICT] SPECIALLY ADAPTED FOR SPECIFIC APPLICATION FIELDS
    • G16ZINFORMATION AND COMMUNICATION TECHNOLOGY [ICT] SPECIALLY ADAPTED FOR SPECIFIC APPLICATION FIELDS, NOT OTHERWISE PROVIDED FOR
    • G16Z99/00Subject matter not provided for in other main groups of this subclass
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00Semiconductor devices adapted for rectifying, amplifying, oscillating or switching, or capacitors or resistors with at least one potential-jump barrier or surface barrier, e.g. PN junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof  ; Multistep manufacturing processes therefor
    • H01L29/02Semiconductor bodies ; Multistep manufacturing processes therefor
    • H01L29/06Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions
    • H01L29/10Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions with semiconductor regions connected to an electrode not carrying current to be rectified, amplified or switched and such electrode being part of a semiconductor device which comprises three or more electrodes
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00Semiconductor devices adapted for rectifying, amplifying, oscillating or switching, or capacitors or resistors with at least one potential-jump barrier or surface barrier, e.g. PN junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof  ; Multistep manufacturing processes therefor
    • H01L29/02Semiconductor bodies ; Multistep manufacturing processes therefor
    • H01L29/06Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions
    • H01L29/10Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions with semiconductor regions connected to an electrode not carrying current to be rectified, amplified or switched and such electrode being part of a semiconductor device which comprises three or more electrodes
    • H01L29/107Substrate region of field-effect devices

Landscapes

  • Engineering & Computer Science (AREA)
  • Power Engineering (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Physics & Mathematics (AREA)
  • Ceramic Engineering (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Junction Field-Effect Transistors (AREA)
  • Semiconductor Integrated Circuits (AREA)
HK13103770.5A 2009-10-02 2013-03-26 Continuous tunable lc resonator using a fet as a varactor HK1176461A1 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
PCT/US2009/059305 WO2011040927A1 (en) 2009-10-02 2009-10-02 Continuous tunable lc resonator using a fet as a varactor

Publications (1)

Publication Number Publication Date
HK1176461A1 true HK1176461A1 (en) 2013-07-26

Family

ID=43826560

Family Applications (1)

Application Number Title Priority Date Filing Date
HK13103770.5A HK1176461A1 (en) 2009-10-02 2013-03-26 Continuous tunable lc resonator using a fet as a varactor

Country Status (4)

Country Link
KR (1) KR101598655B1 (en)
CN (1) CN102742016B (en)
HK (1) HK1176461A1 (en)
WO (1) WO2011040927A1 (en)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9059332B2 (en) 2009-10-02 2015-06-16 Skyworks Solutions, Inc. Continuous tunable LC resonator using a FET as a varactor
EP2886524A1 (en) * 2013-12-18 2015-06-24 Skyworks Solutions, Inc. Tunable resonators using high dielectric constant ferrite rods
US20190109243A1 (en) * 2017-10-06 2019-04-11 Globalfoundries Inc. Back-gate controlled varactor
US10615294B2 (en) 2018-06-13 2020-04-07 Qualcomm Incorporated Variable capacitor

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5250826A (en) * 1992-09-23 1993-10-05 Rockwell International Corporation Planar HBT-FET Device
US6764891B2 (en) * 2002-02-26 2004-07-20 Intel Corporation Physically defined varactor in a CMOS process
JP4046634B2 (en) * 2003-04-08 2008-02-13 Necエレクトロニクス株式会社 Voltage-controlled capacitance element and semiconductor integrated circuit
JP2004311858A (en) * 2003-04-10 2004-11-04 Nec Electronics Corp Semiconductor integrated circuit device
JP2005175003A (en) * 2003-12-08 2005-06-30 Matsushita Electric Ind Co Ltd Decoupling capacitor and semiconductor integrated circuit
US7132901B2 (en) * 2004-10-22 2006-11-07 Skyworks Solutions, Inc. Voltage controlled oscillator with varactor-less tuning
WO2008097604A2 (en) * 2007-02-07 2008-08-14 Microlink Devices, Inc. Hbt and field effect transistor integration
JP5175482B2 (en) * 2007-03-29 2013-04-03 ルネサスエレクトロニクス株式会社 Semiconductor device
US9654108B2 (en) * 2008-01-11 2017-05-16 Intel Mobile Communications GmbH Apparatus and method having reduced flicker noise
JP2009239202A (en) * 2008-03-28 2009-10-15 Sanyo Electric Co Ltd Amplifying element and manufacturing method thereof

Also Published As

Publication number Publication date
WO2011040927A1 (en) 2011-04-07
KR101598655B1 (en) 2016-02-29
CN102742016B (en) 2016-03-02
KR20120082012A (en) 2012-07-20
CN102742016A (en) 2012-10-17

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