HK117596A - Substituted 1,2-naphthoquinone-(2)-diazide-4-sulfonic acids process for their production and their use - Google Patents

Substituted 1,2-naphthoquinone-(2)-diazide-4-sulfonic acids process for their production and their use

Info

Publication number
HK117596A
HK117596A HK117596A HK117596A HK117596A HK 117596 A HK117596 A HK 117596A HK 117596 A HK117596 A HK 117596A HK 117596 A HK117596 A HK 117596A HK 117596 A HK117596 A HK 117596A
Authority
HK
Hong Kong
Prior art keywords
diazide
naphthoquinone
substituted
production
sulfonic acids
Prior art date
Application number
HK117596A
Other languages
English (en)
Inventor
Siegfried Dr Dipl Chem Scheler
Gerhard Dr Dipl Chem Buhr
Klaus Bergmann
Original Assignee
Hoechst Ag
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hoechst Ag filed Critical Hoechst Ag
Publication of HK117596A publication Critical patent/HK117596A/xx

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C309/00—Sulfonic acids; Halides, esters, or anhydrides thereof
    • C07C309/01—Sulfonic acids
    • C07C309/28—Sulfonic acids having sulfo groups bound to carbon atoms of six-membered aromatic rings of a carbon skeleton
    • C07C309/45—Sulfonic acids having sulfo groups bound to carbon atoms of six-membered aromatic rings of a carbon skeleton containing nitrogen atoms, not being part of nitro or nitroso groups, bound to the carbon skeleton
    • C07C309/52—Sulfonic acids having sulfo groups bound to carbon atoms of six-membered aromatic rings of a carbon skeleton containing nitrogen atoms, not being part of nitro or nitroso groups, bound to the carbon skeleton the carbon skeleton being further substituted by doubly-bound oxygen atoms
    • C07C309/53—Sulfonic acids having sulfo groups bound to carbon atoms of six-membered aromatic rings of a carbon skeleton containing nitrogen atoms, not being part of nitro or nitroso groups, bound to the carbon skeleton the carbon skeleton being further substituted by doubly-bound oxygen atoms the carbon skeleton containing carbon atoms of quinone rings
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C309/00—Sulfonic acids; Halides, esters, or anhydrides thereof
    • C07C309/01—Sulfonic acids
    • C07C309/25—Sulfonic acids having sulfo groups bound to carbon atoms of rings other than six-membered aromatic rings of a carbon skeleton
    • C07C309/26—Sulfonic acids having sulfo groups bound to carbon atoms of rings other than six-membered aromatic rings of a carbon skeleton containing nitrogen atoms, not being part of nitro or nitroso groups, bound to the carbon skeleton
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Epoxy Compounds (AREA)
HK117596A 1989-08-12 1996-07-04 Substituted 1,2-naphthoquinone-(2)-diazide-4-sulfonic acids process for their production and their use HK117596A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE3926776A DE3926776A1 (de) 1989-08-12 1989-08-12 Substituierte 1,2-naphthochinon-(2)-diazid-4-sulfonsaeuren, verfahren zu ihrer herstellung und ihre verwendung

Publications (1)

Publication Number Publication Date
HK117596A true HK117596A (en) 1996-07-12

Family

ID=6387057

Family Applications (1)

Application Number Title Priority Date Filing Date
HK117596A HK117596A (en) 1989-08-12 1996-07-04 Substituted 1,2-naphthoquinone-(2)-diazide-4-sulfonic acids process for their production and their use

Country Status (8)

Country Link
US (1) US5077395A (xx)
EP (1) EP0413200B1 (xx)
JP (1) JPH03101653A (xx)
KR (1) KR910004554A (xx)
AU (1) AU6089790A (xx)
CA (1) CA2023067A1 (xx)
DE (2) DE3926776A1 (xx)
HK (1) HK117596A (xx)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3926774A1 (de) * 1989-08-12 1991-02-14 Hoechst Ag 7-hydroxy-1,2-naphthochinon -(2)-diazid-4-sulfonsaeure oder ihre salze, verfahren zu ihrer herstellung und ihre verwendung
KR19980020317A (ko) * 1996-09-06 1998-06-25 손욱 감광성 수지 조성물 및 이를 이용한 패턴의 형성방법

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US793743A (en) * 1904-09-30 1905-07-04 Aniline Color And Extract Works Formerly John R Geigy Process of making diazo compounds.
GB237594A (en) * 1924-07-28 1926-04-01 Anilin Fabrikation Ag Manufacture of ortho-oxyazo-dyestuffs and intermediate products thereof
DE1126541B (de) * 1958-01-31 1962-03-29 Bayer Ag Verfahren zur Herstellung von Azofarbstoffen
US2987513A (en) * 1958-01-31 1961-06-06 Bayer Ag Azo dyestuffs and process for their manufacture
DE2359950A1 (de) * 1973-12-01 1975-06-05 Bayer Ag Verfahren zur herstellung von 5- nitro-naphthochinon-(1,4)
DE2529054C2 (de) * 1975-06-30 1982-04-29 Ibm Deutschland Gmbh, 7000 Stuttgart Verfahren zur Herstellung eines zur Vorlage negativen Resistbildes
DE3325023A1 (de) * 1983-07-11 1985-01-24 Hoechst Ag, 6230 Frankfurt Verfahren zur herstellung negativer kopien mittels eines materials auf basis von 1,2-chinondiaziden
CH663418A5 (de) * 1985-04-17 1987-12-15 Ciba Geigy Ag Verfahren zur herstellung von 1-diazo-2-naphthol-4-sulfonsaeure.
ATE42419T1 (de) * 1985-08-12 1989-05-15 Hoechst Celanese Corp Verfahren zur herstellung negativer bilder aus einem positiv arbeitenden photoresist.
US4931549A (en) * 1987-03-24 1990-06-05 Hoechst Celanese Corporation Process for aryl-quinone and aryl-naphthoquinone diazide sulfonic acids
DD263982A1 (de) * 1987-08-21 1989-01-18 Akad Wissenschaften Ddr Verfahren zur herstellung von 2-diazo-1-oxo-1,2-dihydro-naphthalenderivaten
DE3837500A1 (de) * 1988-11-04 1990-05-23 Hoechst Ag Neue, strahlungsempfindliche verbindungen, hiermit hergestelltes strahlungsempfindliches gemisch und aufzeichnungsmaterial
DE3837499A1 (de) * 1988-11-04 1990-05-23 Hoechst Ag Verfahren zur herstellung von substituierten 1,2-naphthochinon-(2)-diazid-4-sulfonsaeureestern und deren verwendung in einem strahlungsempfindlichen gemisch

Also Published As

Publication number Publication date
EP0413200A1 (de) 1991-02-20
CA2023067A1 (en) 1991-02-13
JPH03101653A (ja) 1991-04-26
AU6089790A (en) 1991-02-14
DE3926776A1 (de) 1991-02-14
EP0413200B1 (de) 1994-10-05
KR910004554A (ko) 1991-03-28
US5077395A (en) 1991-12-31
DE59007376D1 (de) 1994-11-10

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Legal Events

Date Code Title Description
PC Patent ceased (i.e. patent has lapsed due to the failure to pay the renewal fee)