HK1071150A1 - Anhydrous, liquid phase process for preparing hydroxyl containg polymers of enhanced purity - Google Patents

Anhydrous, liquid phase process for preparing hydroxyl containg polymers of enhanced purity

Info

Publication number
HK1071150A1
HK1071150A1 HK05103830A HK05103830A HK1071150A1 HK 1071150 A1 HK1071150 A1 HK 1071150A1 HK 05103830 A HK05103830 A HK 05103830A HK 05103830 A HK05103830 A HK 05103830A HK 1071150 A1 HK1071150 A1 HK 1071150A1
Authority
HK
Hong Kong
Prior art keywords
containg
anhydrous
polymers
liquid phase
phase process
Prior art date
Application number
HK05103830A
Other languages
English (en)
Inventor
Michael T Sheehan
James R Sounik
Original Assignee
Dupont Electronic Technologies
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Dupont Electronic Technologies filed Critical Dupont Electronic Technologies
Publication of HK1071150A1 publication Critical patent/HK1071150A1/xx

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F120/00—Homopolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride, ester, amide, imide or nitrile thereof
    • C08F120/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
    • C08F120/10—Esters
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F6/00—Post-polymerisation treatments
    • C08F6/04—Fractionation
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F6/00—Post-polymerisation treatments
    • C08F6/02—Neutralisation of the polymerisation mass, e.g. killing the catalyst also removal of catalyst residues
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F6/00—Post-polymerisation treatments
    • C08F6/14—Treatment of polymer emulsions
    • C08F6/16—Purification
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F8/00—Chemical modification by after-treatment
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F8/00—Chemical modification by after-treatment
    • C08F8/12—Hydrolysis
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J3/00—Processes of treating or compounding macromolecular substances
    • C08J3/02—Making solutions, dispersions, lattices or gels by other methods than by solution, emulsion or suspension polymerisation techniques
    • C08J3/09—Making solutions, dispersions, lattices or gels by other methods than by solution, emulsion or suspension polymerisation techniques in organic liquids
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2800/00—Copolymer characterised by the proportions of the comonomers expressed
    • C08F2800/20—Copolymer characterised by the proportions of the comonomers expressed as weight or mass percentages

Landscapes

  • Chemical & Material Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Dispersion Chemistry (AREA)
  • Materials For Photolithography (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
HK05103830A 2002-04-19 2005-05-06 Anhydrous, liquid phase process for preparing hydroxyl containg polymers of enhanced purity HK1071150A1 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US10/126,563 US6864324B2 (en) 2002-04-19 2002-04-19 Anhydrous, liquid phase process for preparing hydroxyl containing polymers of enhanced purity
PCT/US2003/011261 WO2003089480A1 (en) 2002-04-19 2003-04-10 Anhydrous, liquid phase process for preparing hydroxyl containing polymers of enhanced purity

Publications (1)

Publication Number Publication Date
HK1071150A1 true HK1071150A1 (en) 2005-07-08

Family

ID=29215054

Family Applications (1)

Application Number Title Priority Date Filing Date
HK05103830A HK1071150A1 (en) 2002-04-19 2005-05-06 Anhydrous, liquid phase process for preparing hydroxyl containg polymers of enhanced purity

Country Status (13)

Country Link
US (1) US6864324B2 (hu)
EP (1) EP1497339B1 (hu)
JP (1) JP4261372B2 (hu)
KR (1) KR100965990B1 (hu)
CN (1) CN100564401C (hu)
AR (1) AR039433A1 (hu)
AT (1) ATE402962T1 (hu)
AU (1) AU2003221902A1 (hu)
CA (1) CA2482899A1 (hu)
DE (1) DE60322526D1 (hu)
HK (1) HK1071150A1 (hu)
TW (1) TWI250998B (hu)
WO (1) WO2003089480A1 (hu)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3841399B2 (ja) * 2002-02-21 2006-11-01 富士写真フイルム株式会社 ポジ型レジスト組成物
US7312281B2 (en) * 2002-04-19 2007-12-25 Dupont Electronic Polymers L.P. Anhydrous, liquid phase process for preparing hydroxyl containing polymers of enhanced purity
TWI284783B (en) * 2003-05-08 2007-08-01 Du Pont Photoresist compositions and processes for preparing the same
JP2005350609A (ja) * 2004-06-11 2005-12-22 Daicel Chem Ind Ltd 側鎖にアセタール構造を有する高分子化合物及びその製造法
US7741429B2 (en) * 2005-12-22 2010-06-22 Dupont Electronic Polymers L.P. Process for preparing stable photoresist compositions
JP4976229B2 (ja) * 2007-08-03 2012-07-18 株式会社ダイセル フォトレジスト用樹脂溶液の製造方法、フォトレジスト組成物およびパターン形成方法
JP5416774B2 (ja) 2008-08-25 2014-02-12 デュポン・エレクトロニック・ポリマーズ・エル・ピー 新規プロパノエート及びその製造法
KR101111491B1 (ko) * 2009-08-04 2012-03-14 금호석유화학 주식회사 신규 공중합체 및 이를 포함하는 포토레지스트 조성물
FR2972193B1 (fr) 2011-03-04 2014-07-04 Setup Performance Polyolefines modifiees, reticulables apres transformation, et procede de fabrication desdites polyolefines

Family Cites Families (27)

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Publication number Priority date Publication date Assignee Title
US4491628A (en) 1982-08-23 1985-01-01 International Business Machines Corporation Positive- and negative-working resist compositions with acid generating photoinitiator and polymer with acid labile groups pendant from polymer backbone
US4636540A (en) 1985-07-08 1987-01-13 Atlantic Richfield Company Purification of polymer solutions
US4689371A (en) 1986-07-07 1987-08-25 Celanese Corporation Process for the preparation of poly (vinylphenol) from poly (acetoxystyrene)
US4939070A (en) 1986-07-28 1990-07-03 Brunsvold William R Thermally stable photoresists with high sensitivity
EP0260104A3 (en) 1986-09-09 1989-03-15 Celanese Corporation Process for the preparation of poly (vinylphenol) by simultaneous methanolysis and polymerization of 4-acetoxystryene
US4678843A (en) 1986-09-29 1987-07-07 Celanese Corporation Process for the ammonium hydroxide hydrolysis of polymers of acetoxystyrene to polymers of vinylphenol
US4931379A (en) 1986-10-23 1990-06-05 International Business Machines Corporation High sensitivity resists having autodecomposition temperatures greater than about 160° C.
EP0277721A3 (en) 1987-01-28 1989-03-15 Hoechst Celanese Corporation Emulsion polymerization of 4-acetoxystyrene and hydrolysis to poly(p-vinylphenol)
US4822862A (en) 1987-01-28 1989-04-18 Hoechst Celanese Corporation Emulsion polymerization of 4-acetoxystyrene and hydrolysis to poly(p-vinylphenol
US4898916A (en) 1987-03-05 1990-02-06 Hoechst Celanese Corporation Process for the preparation of poly(vinylphenol) from poly(acetoxystyrene) by acid catalyzed transesterification
US4877843A (en) 1987-09-11 1989-10-31 Hoechst Celanese Corporation Selective hydrolysis of copolymers of para-acetoxy styrene and allyl esters of ethylenically unsaturated acids
US4912173A (en) 1987-10-30 1990-03-27 Hoechst Celanese Corporation Hydrolysis of poly(acetoxystyrene) in aqueous suspension
US4962147A (en) 1988-05-26 1990-10-09 Hoechst Celanese Corporation Process for the suspension polymerization of 4-acetoxystyrene and hydrolysis to 4-hydroxystyrene polymers
US5239015A (en) * 1990-06-29 1993-08-24 Hoechst Celanese Corporation Process for making low optical density polymers and copolymers for photoresists and optical applications
US5087772A (en) 1990-11-16 1992-02-11 Hoechst Celanese Corporation Method for preparing 4-hydroxystyrene
JPH0768296B2 (ja) 1991-11-28 1995-07-26 丸善石油化学株式会社 ビニルフェノール系重合体の金属除去方法
DE69322946T2 (de) 1992-11-03 1999-08-12 International Business Machines Corp., Armonk, N.Y. Photolackzusammensetzung
WO1994014858A1 (en) 1992-12-29 1994-07-07 Hoechst Celanese Corporation Metal ion reduction in polyhydroxystyrene and photoresists
US5304610A (en) 1993-01-12 1994-04-19 Hoechst Celanese Corporation Amphoteric copolymer derived from vinylpyridine and acetoxystyrene
US5861231A (en) 1996-06-11 1999-01-19 Shipley Company, L.L.C. Copolymers and photoresist compositions comprising copolymer resin binder component
US5789522A (en) 1996-09-06 1998-08-04 Shipley Company, L.L.C. Resin purification process
US5888751A (en) * 1997-07-15 1999-03-30 Ludwig Institute For Cancer Research Method for diagnosis and treating cancers, and methods for identifying pathogenic markers in a sample of normal cells
US5919597A (en) 1997-10-30 1999-07-06 Ibm Corporation Of Armonk Methods for preparing photoresist compositions
AU3005899A (en) * 1998-05-05 1999-11-23 Triquest, Lp Preparation of co- and terpolymers of p-hydroxystyrene and alkyl acrylates
JP2002514664A (ja) * 1998-05-08 2002-05-21 アーチ・スペシャルティ・ケミカルズ・インコーポレイテッド 遮断（ｂｌｏｃｋｅｄ）ポリヒドロキシスチレン樹脂の精製溶液を製造する方法
US6414110B1 (en) 1999-11-12 2002-07-02 Triquest Lp Purification means
KR100574132B1 (ko) 2000-06-27 2006-04-25 트리퀘스트 엘피 정제 방법

Also Published As

Publication number Publication date
KR100965990B1 (ko) 2010-06-24
JP2005535737A (ja) 2005-11-24
TWI250998B (en) 2006-03-11
DE60322526D1 (de) 2008-09-11
TW200408653A (en) 2004-06-01
JP4261372B2 (ja) 2009-04-30
CN1578794A (zh) 2005-02-09
AU2003221902A1 (en) 2003-11-03
CN100564401C (zh) 2009-12-02
US20030199641A1 (en) 2003-10-23
US6864324B2 (en) 2005-03-08
WO2003089480A1 (en) 2003-10-30
AR039433A1 (es) 2005-02-16
ATE402962T1 (de) 2008-08-15
EP1497339B1 (en) 2008-07-30
KR20050007315A (ko) 2005-01-17
EP1497339A1 (en) 2005-01-19
CA2482899A1 (en) 2003-10-30

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Legal Events

Date Code Title Description
PC Patent ceased (i.e. patent has lapsed due to the failure to pay the renewal fee)

Effective date: 20120410