HK1048394A1 - 具快速上升時間及低漏電的高脈沖率脈沖電系統 - Google Patents

具快速上升時間及低漏電的高脈沖率脈沖電系統

Info

Publication number
HK1048394A1
HK1048394A1 HK03100408.3A HK03100408A HK1048394A1 HK 1048394 A1 HK1048394 A1 HK 1048394A1 HK 03100408 A HK03100408 A HK 03100408A HK 1048394 A1 HK1048394 A1 HK 1048394A1
Authority
HK
Hong Kong
Prior art keywords
pulse
charging
power system
leakage current
rise time
Prior art date
Application number
HK03100408.3A
Other languages
English (en)
Inventor
L Birx Daniel
N Partlo William
M Ness Richard
A Rothweil Daniel
C Melcher Paul
D Smith Brett
Original Assignee
Cymer Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Cymer Inc filed Critical Cymer Inc
Publication of HK1048394A1 publication Critical patent/HK1048394A1/zh

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/09—Processes or apparatus for excitation, e.g. pumping
    • H01S3/091—Processes or apparatus for excitation, e.g. pumping using optical pumping
    • H01S3/094—Processes or apparatus for excitation, e.g. pumping using optical pumping by coherent light
    • H01S3/094076—Pulsed or modulated pumping
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70008—Production of exposure light, i.e. light sources
    • G03F7/70025—Production of exposure light, i.e. light sources by lasers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70008—Production of exposure light, i.e. light sources
    • G03F7/70041—Production of exposure light, i.e. light sources by pulsed sources, e.g. multiplexing, pulse duration, interval control or intensity control
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/7055—Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
    • G03F7/70575—Wavelength control, e.g. control of bandwidth, multiple wavelength, selection of wavelength or matching of optical components to wavelength
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
    • H01L27/02—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers
    • H01L27/0203—Particular design considerations for integrated circuits
    • H01L27/0248—Particular design considerations for integrated circuits for electrical or thermal protection, e.g. electrostatic discharge [ESD] protection
    • H01L27/0251—Particular design considerations for integrated circuits for electrical or thermal protection, e.g. electrostatic discharge [ESD] protection for MOS devices
    • H01L27/0259—Particular design considerations for integrated circuits for electrical or thermal protection, e.g. electrostatic discharge [ESD] protection for MOS devices using bipolar transistors as protective elements
    • H01L27/0262—Particular design considerations for integrated circuits for electrical or thermal protection, e.g. electrostatic discharge [ESD] protection for MOS devices using bipolar transistors as protective elements including a PNP transistor and a NPN transistor, wherein each of said transistors has its base coupled to the collector of the other transistor, e.g. silicon controlled rectifier [SCR] devices
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/09—Processes or apparatus for excitation, e.g. pumping
    • H01S3/097—Processes or apparatus for excitation, e.g. pumping by gas discharge of a gas laser
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/09—Processes or apparatus for excitation, e.g. pumping
    • H01S3/097—Processes or apparatus for excitation, e.g. pumping by gas discharge of a gas laser
    • H01S3/0975—Processes or apparatus for excitation, e.g. pumping by gas discharge of a gas laser using inductive or capacitive excitation
    • H—ELECTRICITY
    • H03—ELECTRONIC CIRCUITRY
    • H03K—PULSE TECHNIQUE
    • H03K17/00—Electronic switching or gating, i.e. not by contact-making and –breaking
    • H03K17/51—Electronic switching or gating, i.e. not by contact-making and –breaking characterised by the components used
    • H03K17/80—Electronic switching or gating, i.e. not by contact-making and –breaking characterised by the components used using non-linear magnetic devices; using non-linear dielectric devices
    • H—ELECTRICITY
    • H03—ELECTRONIC CIRCUITRY
    • H03K—PULSE TECHNIQUE
    • H03K3/00—Circuits for generating electric pulses; Monostable, bistable or multistable circuits
    • H03K3/02—Generators characterised by the type of circuit or by the means used for producing pulses
    • H03K3/53—Generators characterised by the type of circuit or by the means used for producing pulses by the use of an energy-accumulating element discharged through the load by a switching device controlled by an external signal and not incorporating positive feedback
    • H03K3/57—Generators characterised by the type of circuit or by the means used for producing pulses by the use of an energy-accumulating element discharged through the load by a switching device controlled by an external signal and not incorporating positive feedback the switching device being a semiconductor device
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/14—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range characterised by the material used as the active medium
    • H01S3/22—Gases
    • H01S3/223—Gases the active gas being polyatomic, i.e. containing two or more atoms
    • H01S3/225—Gases the active gas being polyatomic, i.e. containing two or more atoms comprising an excimer or exciplex

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • General Physics & Mathematics (AREA)
  • Electromagnetism (AREA)
  • Plasma & Fusion (AREA)
  • Optics & Photonics (AREA)
  • Power Engineering (AREA)
  • Nonlinear Science (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Lasers (AREA)
  • Generation Of Surge Voltage And Current (AREA)
  • Amplifiers (AREA)
  • Electronic Switches (AREA)
  • Dc-Dc Converters (AREA)
  • Electrical Discharge Machining, Electrochemical Machining, And Combined Machining (AREA)
HK03100408.3A 1999-08-09 2003-01-16 具快速上升時間及低漏電的高脈沖率脈沖電系統 HK1048394A1 (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US09/370,739 US6151346A (en) 1997-12-15 1999-08-09 High pulse rate pulse power system with fast rise time and low current
PCT/US2000/020266 WO2001011733A1 (en) 1999-08-09 2000-07-25 High pulse rate pulse power system with fast rise time and low leakage current

Publications (1)

Publication Number Publication Date
HK1048394A1 true HK1048394A1 (zh) 2003-03-28

Family

ID=23460960

Family Applications (1)

Application Number Title Priority Date Filing Date
HK03100408.3A HK1048394A1 (zh) 1999-08-09 2003-01-16 具快速上升時間及低漏電的高脈沖率脈沖電系統

Country Status (10)

Country Link
US (1) US6151346A (zh)
EP (1) EP1224717B1 (zh)
JP (1) JP3971095B2 (zh)
KR (1) KR100573499B1 (zh)
AT (1) ATE295010T1 (zh)
AU (1) AU6608400A (zh)
DE (1) DE60019953T2 (zh)
HK (1) HK1048394A1 (zh)
TW (1) TW463427B (zh)
WO (1) WO2001011733A1 (zh)

Families Citing this family (61)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6490307B1 (en) 1999-03-17 2002-12-03 Lambda Physik Ag Method and procedure to automatically stabilize excimer laser output parameters
US6477193B2 (en) * 1998-07-18 2002-11-05 Cymer, Inc. Extreme repetition rate gas discharge laser with improved blower motor
US6442181B1 (en) * 1998-07-18 2002-08-27 Cymer, Inc. Extreme repetition rate gas discharge laser
US6389052B2 (en) 1999-03-17 2002-05-14 Lambda Physik Ag Laser gas replenishment method
US6727731B1 (en) 1999-03-12 2004-04-27 Lambda Physik Ag Energy control for an excimer or molecular fluorine laser
US6700915B2 (en) 1999-03-12 2004-03-02 Lambda Physik Ag Narrow band excimer laser with a resonator containing an optical element for making wavefront corrections
US6801560B2 (en) * 1999-05-10 2004-10-05 Cymer, Inc. Line selected F2 two chamber laser system
US6549551B2 (en) * 1999-09-27 2003-04-15 Cymer, Inc. Injection seeded laser with precise timing control
US6865210B2 (en) * 2001-05-03 2005-03-08 Cymer, Inc. Timing control for two-chamber gas discharge laser system
US6590922B2 (en) 1999-09-27 2003-07-08 Cymer, Inc. Injection seeded F2 laser with line selection and discrimination
US6556600B2 (en) 1999-09-27 2003-04-29 Cymer, Inc. Injection seeded F2 laser with centerline wavelength control
US6785316B1 (en) 1999-08-17 2004-08-31 Lambda Physik Ag Excimer or molecular laser with optimized spectral purity
US6907058B2 (en) 2000-01-25 2005-06-14 Lambda Physik Ag Energy monitor for molecular fluorine laser
US6522679B1 (en) * 2000-02-22 2003-02-18 Tuilaser Gas laser discharge unit
US6493375B1 (en) 2000-02-22 2002-12-10 Tuilaser Ag Adjustable mounting unit for an optical element of a gas laser
US6782029B1 (en) 2000-02-22 2004-08-24 Tuilaser Ag Dedusting unit for a laser optical element of a gas laser and method for assembling
US6804284B1 (en) 2000-02-22 2004-10-12 Tuilaser Ag Optical element holding and extraction device
US6859482B1 (en) 2000-02-22 2005-02-22 Tuilaser Ag Modular gas laser discharge unit
US6603790B1 (en) 2000-02-22 2003-08-05 Hans Kodeda Gas laser and a dedusting unit thereof
US6480517B1 (en) 2000-02-22 2002-11-12 Tuilaser Ag Shadow device for a gas laser
US6941259B2 (en) * 2000-03-01 2005-09-06 Lamda Physik Ag Laser software control system
US20010049618A1 (en) * 2000-03-23 2001-12-06 Rainer Patzel Method for allocating predictable costs for consumable items
US6834066B2 (en) 2000-04-18 2004-12-21 Lambda Physik Ag Stabilization technique for high repetition rate gas discharge lasers
US6603789B1 (en) 2000-07-05 2003-08-05 Lambda Physik Ag Narrow band excimer or molecular fluorine laser with improved beam parameters
US6721345B2 (en) 2000-07-14 2004-04-13 Lambda Physik Ag Electrostatic precipitator corona discharge ignition voltage probe for gas status detection and control system for gas discharge lasers
US6807205B1 (en) 2000-07-14 2004-10-19 Lambda Physik Ag Precise monitor etalon calibration technique
US6801561B2 (en) 2000-09-25 2004-10-05 Lambda Physik Ag Laser system and method for spectral narrowing through wavefront correction
US6747741B1 (en) 2000-10-12 2004-06-08 Lambda Physik Ag Multiple-pass interferometric device
US7439530B2 (en) 2005-06-29 2008-10-21 Cymer, Inc. LPP EUV light source drive laser system
US7465946B2 (en) 2004-03-10 2008-12-16 Cymer, Inc. Alternative fuels for EUV light source
US20050259709A1 (en) 2002-05-07 2005-11-24 Cymer, Inc. Systems and methods for implementing an interaction between a laser shaped as a line beam and a film deposited on a substrate
US7598509B2 (en) 2004-11-01 2009-10-06 Cymer, Inc. Laser produced plasma EUV light source
US7372056B2 (en) 2005-06-29 2008-05-13 Cymer, Inc. LPP EUV plasma source material target delivery system
US7378673B2 (en) 2005-02-25 2008-05-27 Cymer, Inc. Source material dispenser for EUV light source
US6711190B2 (en) * 2001-06-29 2004-03-23 Koninklijke Philips Electronics N.V. Laser transmitter bias circuit
US20050100072A1 (en) * 2001-11-14 2005-05-12 Rao Rajasekhar M. High power laser output beam energy density reduction
AU2003243515A1 (en) * 2002-06-13 2003-12-31 Pei Electronics, Inc. Improved pulse forming converter
GB0226394D0 (en) * 2002-11-13 2007-03-28 Bae Systems Plc Radio frequency and microwave signals
DE602004027429D1 (de) * 2003-02-12 2010-07-15 Coherent Gmbh Elementensatz zur chirurgischen Ablation von Augengewebe
US7217941B2 (en) 2003-04-08 2007-05-15 Cymer, Inc. Systems and methods for deflecting plasma-generated ions to prevent the ions from reaching an internal component of an EUV light source
US7277188B2 (en) 2003-04-29 2007-10-02 Cymer, Inc. Systems and methods for implementing an interaction between a laser shaped as a line beam and a film deposited on a substrate
US7002443B2 (en) * 2003-06-25 2006-02-21 Cymer, Inc. Method and apparatus for cooling magnetic circuit elements
US7196342B2 (en) 2004-03-10 2007-03-27 Cymer, Inc. Systems and methods for reducing the influence of plasma-generated debris on the internal components of an EUV light source
US7355191B2 (en) 2004-11-01 2008-04-08 Cymer, Inc. Systems and methods for cleaning a chamber window of an EUV light source
US7482609B2 (en) 2005-02-28 2009-01-27 Cymer, Inc. LPP EUV light source drive laser system
US20060222034A1 (en) 2005-03-31 2006-10-05 Cymer, Inc. 6 Khz and above gas discharge laser system
US7141806B1 (en) 2005-06-27 2006-11-28 Cymer, Inc. EUV light source collector erosion mitigation
US7365349B2 (en) 2005-06-27 2008-04-29 Cymer, Inc. EUV light source collector lifetime improvements
US7180083B2 (en) 2005-06-27 2007-02-20 Cymer, Inc. EUV light source collector erosion mitigation
US7394083B2 (en) 2005-07-08 2008-07-01 Cymer, Inc. Systems and methods for EUV light source metrology
US20070071047A1 (en) * 2005-09-29 2007-03-29 Cymer, Inc. 6K pulse repetition rate and above gas discharge laser system solid state pulse power system improvements
US7706424B2 (en) * 2005-09-29 2010-04-27 Cymer, Inc. Gas discharge laser system electrodes and power supply for delivering electrical energy to same
US7679029B2 (en) 2005-10-28 2010-03-16 Cymer, Inc. Systems and methods to shape laser light as a line beam for interaction with a substrate having surface variations
US7317179B2 (en) 2005-10-28 2008-01-08 Cymer, Inc. Systems and methods to shape laser light as a homogeneous line beam for interaction with a film deposited on a substrate
US8659335B2 (en) * 2009-06-25 2014-02-25 Mks Instruments, Inc. Method and system for controlling radio frequency power
FR2998108B1 (fr) * 2012-11-12 2014-12-19 Accumulateurs Fixes Systeme de pre-charge d'une capacite par une batterie
CN103036146B (zh) * 2012-11-28 2014-10-29 华中科技大学 一种准分子激光器脉冲电源
US9933821B2 (en) 2016-02-17 2018-04-03 Quanta Computer Inc. Chassis with lock mechanism
US11777271B2 (en) * 2017-10-24 2023-10-03 Cymer, Llc Method of and apparatus for extending electrode life in a laser chamber
CN110445480B (zh) * 2019-08-05 2023-03-28 西安热工研究院有限公司 一种多级快前沿高压脉冲触发器及其同步方法
WO2023069206A1 (en) * 2021-10-21 2023-04-27 Cymer, Llc Apparatus for and method of conditioning laser electrodes

Family Cites Families (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3849670A (en) * 1973-04-13 1974-11-19 Webster Electric Co Inc Scr commutation circuit for current pulse generators
US4549091A (en) * 1983-08-08 1985-10-22 Standard Oil Company (Indiana) Electrical excitation circuit for gas lasers
GB2170667B (en) * 1985-01-31 1988-09-07 Marconi Co Ltd A pulse generator
US5177754A (en) * 1986-09-25 1993-01-05 The United States Of America As Represented By The United States Department Of Energy Magnetic compression laser driving circuit
US5315611A (en) * 1986-09-25 1994-05-24 The United States Of America As Represented By The United States Department Of Energy High average power magnetic modulator for metal vapor lasers
JPH03504429A (ja) * 1988-04-20 1991-09-26 シーメンス　アクチェンゲゼルシヤフト 特にｔｅガスレーザー用の高出力の高電圧パルス発生装置および方法
FR2654876B1 (fr) * 1989-11-23 1993-11-12 Commissariat A Energie Atomique Dispositif de charge de moyens d'accumulation d'energie electrique, muni de moyens permettant de maitriser cette charge.
US5124629A (en) * 1991-04-23 1992-06-23 The United States Of America As Represented By The United States Department Of Energy Post regulation circuit with energy storage
US5142166A (en) * 1991-10-16 1992-08-25 Science Research Laboratory, Inc. High voltage pulsed power source
JP3318981B2 (ja) * 1992-10-09 2002-08-26 株式会社明電舎 パルス電源
US5319665A (en) * 1992-11-06 1994-06-07 Science Research Laboratory High power electromagnetic pulse driver using an electromagnetic shock line
US5309462A (en) * 1993-02-17 1994-05-03 National Research Council Of Canada Magnetic spiker gas laser excitation circuit
US5313481A (en) * 1993-09-29 1994-05-17 The United States Of America As Represented By The United States Department Of Energy Copper laser modulator driving assembly including a magnetic compression laser
US5448580A (en) * 1994-07-05 1995-09-05 The United States Of America As Represented By The United States Department Of Energy Air and water cooled modulator
DE69628514T2 (de) * 1995-02-17 2004-04-29 Cymer, Inc., San Diego Leistungspulsgenerator mit energierückgewinnung
US5982800A (en) * 1997-04-23 1999-11-09 Cymer, Inc. Narrow band excimer laser
US5936988A (en) * 1997-12-15 1999-08-10 Cymer, Inc. High pulse rate pulse power system
US6028872A (en) * 1997-12-15 2000-02-22 Cymer, Inc. High pulse rate pulse power system with resonant power supply

Also Published As

Publication number Publication date
WO2001011733A1 (en) 2001-02-15
US6151346A (en) 2000-11-21
JP2001168430A (ja) 2001-06-22
EP1224717B1 (en) 2005-05-04
KR20020021168A (ko) 2002-03-18
DE60019953D1 (de) 2005-06-09
KR100573499B1 (ko) 2006-04-26
JP3971095B2 (ja) 2007-09-05
AU6608400A (en) 2001-03-05
EP1224717A4 (en) 2004-03-17
TW463427B (en) 2001-11-11
EP1224717A1 (en) 2002-07-24
WO2001011733A9 (en) 2002-09-06
ATE295010T1 (de) 2005-05-15
DE60019953T2 (de) 2006-02-23

Similar Documents

Publication Publication Date Title
HK1048394A1 (zh) 具快速上升時間及低漏電的高脈沖率脈沖電系統
AU1326301A (en) High pulse rate pulse power system with liquid cooling
EP1109595A4 (en) METHOD AND DEVICE FOR REGULATED LOW POWER OUTPUT IN BATTERY-OPERATED ELECTROTHERAPY DEVICES
MX9709365A (es) Dispositivo de liberacion por electrotransporte con circuito de elevacion de voltaje.
TW344148B (en) A cell device and intermittent operation apparatus using thereof
EP1013792A4 (en) SUPPLY BLOCK FOR CATHODIC SPRAY DEVICE
TW200518432A (en) Power circuit
GB9703088D0 (en) Power supply circuit for a control circuit
TW359771B (en) Electrical apparatus supplied by a photovoltaic power source, in particular a timepiece
DK0534950T3 (da) Reguleringsfremgangsmåde til strømforsyningsindretningen i et elektrofilter
DE69833274D1 (en) High energy defibrillator employing current control circuitry
GB2385472A (en) A method of generating a voltage ramp at the terminals of a capacitor
KR20000031327A (en) Electronic clock
WO1997023008A3 (en) High performance battery pack
TW430802B (en) Boosting circuit with high voltage generated at high speed
DE60041743D1 (de) Gerät mit einem motor dessen geschwindigkeit veränderbar ist
ES8703054A1 (es) Dispositivo de mando susceptible de garantizar una fuerte cresta de corriente de llamada
JPS57191671A (en) Flash fixing device
WO2005006466A3 (en) Rapid charger for ultracapacitors
JPS5791023A (en) Pulse current generator
GB9613733D0 (en) Irradiating device
HK97396A (en) Switched electronic supply unit
MX9505223A (es) Regulador de energia de modalidad de corriente y de voltaje.
AU6089498A (en) Modulator for plasma-immersion ion implantation
WO2003005544A3 (en) A control circuit for an inductive device