HK1021070A1 - Plasma processing apparatus and method - Google Patents
Plasma processing apparatus and methodInfo
- Publication number
- HK1021070A1 HK1021070A1 HK00100026A HK00100026A HK1021070A1 HK 1021070 A1 HK1021070 A1 HK 1021070A1 HK 00100026 A HK00100026 A HK 00100026A HK 00100026 A HK00100026 A HK 00100026A HK 1021070 A1 HK1021070 A1 HK 1021070A1
- Authority
- HK
- Hong Kong
- Prior art keywords
- processing apparatus
- plasma processing
- plasma
- processing
- Prior art date
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
- H01J37/32366—Localised processing
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H1/00—Generating plasma; Handling plasma
- H05H1/24—Generating plasma
- H05H1/26—Plasma torches
- H05H1/28—Cooling arrangements
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H1/00—Generating plasma; Handling plasma
- H05H1/24—Generating plasma
- H05H1/2406—Generating plasma using dielectric barrier discharges, i.e. with a dielectric interposed between the electrodes
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H1/00—Generating plasma; Handling plasma
- H05H1/24—Generating plasma
- H05H1/2406—Generating plasma using dielectric barrier discharges, i.e. with a dielectric interposed between the electrodes
- H05H1/2443—Generating plasma using dielectric barrier discharges, i.e. with a dielectric interposed between the electrodes the plasma fluid flowing through a dielectric tube
- H05H1/245—Generating plasma using dielectric barrier discharges, i.e. with a dielectric interposed between the electrodes the plasma fluid flowing through a dielectric tube the plasma being activated using internal electrodes
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H1/00—Generating plasma; Handling plasma
- H05H1/24—Generating plasma
- H05H1/4697—Generating plasma using glow discharges
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H2245/00—Applications of plasma devices
- H05H2245/40—Surface treatments
Landscapes
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Fluid Mechanics (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Plasma Technology (AREA)
- Physical Or Chemical Processes And Apparatus (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP33332597 | 1997-12-03 |
Publications (1)
Publication Number | Publication Date |
---|---|
HK1021070A1 true HK1021070A1 (en) | 2000-05-26 |
Family
ID=18264857
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
HK00100026A HK1021070A1 (en) | 1997-12-03 | 2000-01-04 | Plasma processing apparatus and method |
Country Status (5)
Country | Link |
---|---|
EP (1) | EP0921713A3 (ko) |
KR (1) | KR100365898B1 (ko) |
CN (1) | CN1121810C (ko) |
HK (1) | HK1021070A1 (ko) |
TW (1) | TW503263B (ko) |
Families Citing this family (18)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP1073091A3 (en) * | 1999-07-27 | 2004-10-06 | Matsushita Electric Works, Ltd. | Electrode for plasma generation, plasma treatment apparatus using the electrode, and plasma treatment with the apparatus |
GB0309932D0 (en) * | 2003-04-30 | 2003-06-04 | Boc Group Plc | Apparatus and method for forming a plasma |
EA010367B1 (ru) * | 2004-11-05 | 2008-08-29 | Дау Корнинг Айэлэнд Лимитед | Плазменная система |
EP1689216A1 (en) * | 2005-02-04 | 2006-08-09 | Vlaamse Instelling Voor Technologisch Onderzoek (Vito) | Atmospheric-pressure plasma jet |
US7162317B2 (en) * | 2005-02-25 | 2007-01-09 | Lam Research Corporation | Methods and apparatus for configuring plasma cluster tools |
CN100482031C (zh) * | 2006-03-14 | 2009-04-22 | 中国科学院物理研究所 | 一种大气压介质阻挡辉光放电等离子体发生方法及装置 |
JP4682917B2 (ja) * | 2006-05-30 | 2011-05-11 | パナソニック株式会社 | 大気圧プラズマ発生方法及び装置 |
TW200816880A (en) | 2006-05-30 | 2008-04-01 | Matsushita Electric Ind Co Ltd | Atmospheric pressure plasma generating method, plasma processing method and component mounting method using same, and device using these methods |
CN100405879C (zh) * | 2006-06-07 | 2008-07-23 | 清华大学 | 基于双气体源的大气压放电冷等离子体发生器 |
US8367227B2 (en) * | 2007-08-02 | 2013-02-05 | Applied Materials, Inc. | Plasma-resistant ceramics with controlled electrical resistivity |
US9475710B2 (en) | 2013-03-14 | 2016-10-25 | North Carolina State University | Very high frequency (VHF) driven atmospheric plasma sources and point of use fertigation of irrigation water utilizing plasma production of nitrogen bearing species |
KR101603787B1 (ko) * | 2013-09-10 | 2016-03-18 | 가천대학교 산학협력단 | 표면 처리 장치 및 표면 처리 방법 |
GB201413236D0 (en) | 2014-07-25 | 2014-09-10 | Smiths Detection Watford Ltd | Method and apparatus |
CN104607438A (zh) * | 2014-12-12 | 2015-05-13 | 中山大学 | 一种非热电弧等离子体裂解废电路板装置 |
CN105755452B (zh) * | 2016-04-18 | 2019-01-15 | 北京大学 | 一种用于在管腔内壁喷涂TiO2纳米涂层的装置 |
CN107509298B (zh) * | 2017-09-28 | 2024-04-05 | 博奥生物集团有限公司 | 一种阵列式大面积冷等离子体发生器 |
CN107979907B (zh) * | 2017-12-26 | 2024-04-05 | 中国科学院西安光学精密机械研究所 | 大气压介质阻挡放电增强型直流交替电极低温等离子体射流阵列 |
KR102245712B1 (ko) * | 2019-06-24 | 2021-04-28 | 성균관대학교산학협력단 | 나노입자 코팅 장치 |
Family Cites Families (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2657850B2 (ja) * | 1990-10-23 | 1997-09-30 | 株式会社半導体エネルギー研究所 | プラズマ発生装置およびそれを用いたエッチング方法 |
JP3104047B2 (ja) * | 1992-08-07 | 2000-10-30 | イーシー化学株式会社 | 大気圧グロ−放電プラズマ用電極 |
JPH0729892A (ja) * | 1993-07-14 | 1995-01-31 | Nissin Electric Co Ltd | 電極温調機構 |
JPH09213685A (ja) * | 1996-01-30 | 1997-08-15 | Hitachi Electron Eng Co Ltd | 半導体装置用プラズマ装置のプラズマ電極 |
-
1998
- 1998-12-02 TW TW087119986A patent/TW503263B/zh not_active IP Right Cessation
- 1998-12-02 EP EP98122873A patent/EP0921713A3/en not_active Withdrawn
- 1998-12-03 CN CN98122788A patent/CN1121810C/zh not_active Expired - Fee Related
- 1998-12-03 KR KR10-1998-0052912A patent/KR100365898B1/ko not_active IP Right Cessation
-
2000
- 2000-01-04 HK HK00100026A patent/HK1021070A1/xx not_active IP Right Cessation
Also Published As
Publication number | Publication date |
---|---|
CN1221967A (zh) | 1999-07-07 |
EP0921713A3 (en) | 1999-08-11 |
KR100365898B1 (ko) | 2003-02-19 |
EP0921713A2 (en) | 1999-06-09 |
KR19990062781A (ko) | 1999-07-26 |
TW503263B (en) | 2002-09-21 |
CN1121810C (zh) | 2003-09-17 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
PF | Patent in force | ||
PC | Patent ceased (i.e. patent has lapsed due to the failure to pay the renewal fee) |
Effective date: 20101203 |