HK1020983A1 - Chemical mechanical abrasive composition for use in semiconductor processing - Google Patents

Chemical mechanical abrasive composition for use in semiconductor processing

Info

Publication number
HK1020983A1
HK1020983A1 HK99106207A HK99106207A HK1020983A1 HK 1020983 A1 HK1020983 A1 HK 1020983A1 HK 99106207 A HK99106207 A HK 99106207A HK 99106207 A HK99106207 A HK 99106207A HK 1020983 A1 HK1020983 A1 HK 1020983A1
Authority
HK
Hong Kong
Prior art keywords
chemical mechanical
semiconductor processing
abrasive composition
mechanical abrasive
composition
Prior art date
Application number
HK99106207A
Inventor
Tsung-Ho Lee
Original Assignee
Eternal Chemical Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Eternal Chemical Co Ltd filed Critical Eternal Chemical Co Ltd
Publication of HK1020983A1 publication Critical patent/HK1020983A1/en

Links

HK99106207A 1998-02-20 1999-12-30 Chemical mechanical abrasive composition for use in semiconductor processing HK1020983A1 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN 98100843 CN1092697C (en) 1998-02-20 1998-02-20 Chemically mechanical grinding composition for treating semiconductor

Publications (1)

Publication Number Publication Date
HK1020983A1 true HK1020983A1 (en) 2000-05-26

Family

ID=5216283

Family Applications (1)

Application Number Title Priority Date Filing Date
HK99106207A HK1020983A1 (en) 1998-02-20 1999-12-30 Chemical mechanical abrasive composition for use in semiconductor processing

Country Status (2)

Country Link
CN (1) CN1092697C (en)
HK (1) HK1020983A1 (en)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1731277B (en) * 2005-08-09 2011-07-27 广东光华化学厂有限公司 Preparation method of high concentration ferric ammonium ethylene diamine tetraacetate solution
WO2007095322A1 (en) * 2006-02-14 2007-08-23 Cabot Microelectronics Corporation Compositions and methods for cmp of indium tin oxide surfaces

Also Published As

Publication number Publication date
CN1226591A (en) 1999-08-25
CN1092697C (en) 2002-10-16

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Legal Events

Date Code Title Description
PF Patent in force
PC Patent ceased (i.e. patent has lapsed due to the failure to pay the renewal fee)

Effective date: 20070220