HK1007575A1 - Process for chemical vapor deposition of transition metal nitrides - Google Patents

Process for chemical vapor deposition of transition metal nitrides

Info

Publication number
HK1007575A1
HK1007575A1 HK98106786A HK98106786A HK1007575A1 HK 1007575 A1 HK1007575 A1 HK 1007575A1 HK 98106786 A HK98106786 A HK 98106786A HK 98106786 A HK98106786 A HK 98106786A HK 1007575 A1 HK1007575 A1 HK 1007575A1
Authority
HK
Hong Kong
Prior art keywords
transition metal
vapor deposition
chemical vapor
metal nitrides
substrate
Prior art date
Application number
HK98106786A
Other languages
English (en)
Inventor
Roy G Gordon
Renaud Fix
David Prof Hoffman
Original Assignee
Harvard College
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Harvard College filed Critical Harvard College
Publication of HK1007575A1 publication Critical patent/HK1007575A1/xx

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C23C16/34—Nitrides
HK98106786A 1989-11-30 1998-06-25 Process for chemical vapor deposition of transition metal nitrides HK1007575A1 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US07/444,112 US5139825A (en) 1989-11-30 1989-11-30 Process for chemical vapor deposition of transition metal nitrides
PCT/US1990/006942 WO1991008322A1 (en) 1989-11-30 1990-11-28 Process for chemical vapor deposition of transition metal nitrides

Publications (1)

Publication Number Publication Date
HK1007575A1 true HK1007575A1 (en) 1999-04-16

Family

ID=23763554

Family Applications (1)

Application Number Title Priority Date Filing Date
HK98106786A HK1007575A1 (en) 1989-11-30 1998-06-25 Process for chemical vapor deposition of transition metal nitrides

Country Status (7)

Country Link
US (1) US5139825A (ja)
EP (1) EP0503001B1 (ja)
JP (1) JP3168002B2 (ja)
AT (1) ATE112328T1 (ja)
DE (1) DE69013007T2 (ja)
HK (1) HK1007575A1 (ja)
WO (1) WO1991008322A1 (ja)

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Also Published As

Publication number Publication date
JPH05502695A (ja) 1993-05-13
WO1991008322A1 (en) 1991-06-13
US5139825A (en) 1992-08-18
JP3168002B2 (ja) 2001-05-21
EP0503001A1 (en) 1992-09-16
DE69013007D1 (de) 1994-11-03
DE69013007T2 (de) 1995-05-18
EP0503001A4 (en) 1993-06-23
EP0503001B1 (en) 1994-09-28
ATE112328T1 (de) 1994-10-15

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