GR1003420B - Microlithographic materials and processes based on poly (hydroxyalkyl acrylates) - Google Patents

Microlithographic materials and processes based on poly (hydroxyalkyl acrylates)

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Publication number
GR1003420B
GR1003420B GR990100172A GR990100172A GR1003420B GR 1003420 B GR1003420 B GR 1003420B GR 990100172 A GR990100172 A GR 990100172A GR 990100172 A GR990100172 A GR 990100172A GR 1003420 B GR1003420 B GR 1003420B
Authority
GR
Greece
Prior art keywords
poly
hydroxyalkyl acrylates
tone image
materials
resists
Prior art date
Application number
GR990100172A
Other languages
Greek (el)
Inventor
Original Assignee
-
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by , - filed Critical
Publication of GR1003420B publication Critical patent/GR1003420B/en

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Abstract

In the present invention novel radiation sensitive lithographic resists including a polymer from the broader group of poly (hydroxyalkyl acrylates) as a necessary component for the imaging and relevant lithographic processes are described. These materials behave as positive tone resists when exposed to radiation absorbed by the poly (hydroxyalkyl acrylate) and developoed with an aqueous base solution. On theother hand when in the compostion of the material a photosensitive compound producing acid upon exposure is comprised an insoluble gel is formed through a chemical amplification mechanism and then a negative tone image is obtained upon wet development with a suitable solvent. Alternatively, positive tone image can be obtained if instead of wet development selective silylation of the non exposed areas takes place followed by dry development with a suitable gas composition plasma.
GR990100172A 1999-05-26 1999-05-26 Microlithographic materials and processes based on poly (hydroxyalkyl acrylates) GR1003420B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
GR99100172 1999-05-26

Publications (1)

Publication Number Publication Date
GR1003420B true GR1003420B (en) 2000-09-01

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Family Applications (1)

Application Number Title Priority Date Filing Date
GR990100172A GR1003420B (en) 1999-05-26 1999-05-26 Microlithographic materials and processes based on poly (hydroxyalkyl acrylates)

Country Status (1)

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GR (1) GR1003420B (en)

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01244447A (en) * 1988-03-25 1989-09-28 Toshiba Corp Pattern forming method and resist material used therefor
EP0469584A1 (en) * 1990-07-31 1992-02-05 Nippon Paint Co., Ltd. Resist composition
EP0783136A2 (en) * 1995-12-05 1997-07-09 Shipley Company LLC Chemically amplified positive photoresists

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01244447A (en) * 1988-03-25 1989-09-28 Toshiba Corp Pattern forming method and resist material used therefor
EP0469584A1 (en) * 1990-07-31 1992-02-05 Nippon Paint Co., Ltd. Resist composition
EP0783136A2 (en) * 1995-12-05 1997-07-09 Shipley Company LLC Chemically amplified positive photoresists

Non-Patent Citations (3)

* Cited by examiner, † Cited by third party
Title
AVIRAM A ET AL: "A New Family of Non-Chemically Amplified Resists", PROCEEDINGS OF SPIE, vol. 3331, 1998, pages 349 - 358, XP000870211 *
KI-HO BAIK ET AL: "SURFACE IMAGING AND DRY DEVELOPMENT FOR E-BEAM LITHOGRAPHY", MICROELECTRONIC ENGINEERING,NL,ELSEVIER PUBLISHERS BV., AMSTERDAM, vol. 17, no. 1 / 04, pages 269-273, XP000291764, ISSN: 0167-9317 *
PATENT ABSTRACTS OF JAPAN vol. 13, no. 580 (P - 980) 21 December 1989 (1989-12-21) *

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