GB9822667D0 - Method of fabricating resistors in integrated circuits - Google Patents

Method of fabricating resistors in integrated circuits

Info

Publication number
GB9822667D0
GB9822667D0 GBGB9822667.3A GB9822667A GB9822667D0 GB 9822667 D0 GB9822667 D0 GB 9822667D0 GB 9822667 A GB9822667 A GB 9822667A GB 9822667 D0 GB9822667 D0 GB 9822667D0
Authority
GB
United Kingdom
Prior art keywords
integrated circuits
fabricating resistors
fabricating
resistors
circuits
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
GBGB9822667.3A
Other versions
GB2342776A (en
GB2342776B (en
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
United Microelectronics Corp
Original Assignee
United Microelectronics Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from TW087110877A external-priority patent/TW409419B/en
Application filed by United Microelectronics Corp filed Critical United Microelectronics Corp
Priority to GB9822667A priority Critical patent/GB2342776B/en
Priority to JP10304329A priority patent/JP2000031389A/en
Priority to FR9813430A priority patent/FR2780810B1/en
Priority to DE19849746A priority patent/DE19849746A1/en
Priority to NL1010430A priority patent/NL1010430C2/en
Publication of GB9822667D0 publication Critical patent/GB9822667D0/en
Publication of GB2342776A publication Critical patent/GB2342776A/en
Publication of GB2342776B publication Critical patent/GB2342776B/en
Application granted granted Critical
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L28/00—Passive two-terminal components without a potential-jump or surface barrier for integrated circuits; Details thereof; Multistep manufacturing processes therefor
    • H01L28/20—Resistors
    • H01L28/24—Resistors with an active material comprising a refractory, transition or noble metal, metal compound or metal alloy, e.g. silicides, oxides, nitrides
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
    • H01L27/02—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers
    • H01L27/04—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body
    • H01L27/08—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body including only semiconductor components of a single kind
    • H01L27/0802—Resistors only

Landscapes

  • Engineering & Computer Science (AREA)
  • Power Engineering (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Semiconductor Integrated Circuits (AREA)
  • Manufacture And Refinement Of Metals (AREA)
GB9822667A 1998-07-06 1998-10-16 Method of fabricating resistors in integrated circuits Expired - Fee Related GB2342776B (en)

Priority Applications (5)

Application Number Priority Date Filing Date Title
GB9822667A GB2342776B (en) 1998-07-06 1998-10-16 Method of fabricating resistors in integrated circuits
JP10304329A JP2000031389A (en) 1998-07-06 1998-10-26 Manufacture of resistor for integrated circuit
FR9813430A FR2780810B1 (en) 1998-07-06 1998-10-27 METHOD FOR MANUFACTURING RESISTORS IN INTEGRATED CIRCUITS
DE19849746A DE19849746A1 (en) 1998-07-06 1998-10-28 Resistors are produced in ICs e.g. memory and logic circuits
NL1010430A NL1010430C2 (en) 1998-07-06 1998-10-29 Method for fabricating resistors in integrated circuits.

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
TW087110877A TW409419B (en) 1998-07-06 1998-07-06 Manufacture method of integrated circuit resistor
GB9822667A GB2342776B (en) 1998-07-06 1998-10-16 Method of fabricating resistors in integrated circuits
NL1010430A NL1010430C2 (en) 1998-07-06 1998-10-29 Method for fabricating resistors in integrated circuits.

Publications (3)

Publication Number Publication Date
GB9822667D0 true GB9822667D0 (en) 1998-12-09
GB2342776A GB2342776A (en) 2000-04-19
GB2342776B GB2342776B (en) 2000-12-20

Family

ID=27269519

Family Applications (1)

Application Number Title Priority Date Filing Date
GB9822667A Expired - Fee Related GB2342776B (en) 1998-07-06 1998-10-16 Method of fabricating resistors in integrated circuits

Country Status (5)

Country Link
JP (1) JP2000031389A (en)
DE (1) DE19849746A1 (en)
FR (1) FR2780810B1 (en)
GB (1) GB2342776B (en)
NL (1) NL1010430C2 (en)

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3488767A (en) * 1965-05-17 1970-01-06 Air Reduction Film resistor
DE1960886A1 (en) * 1969-12-04 1971-06-09 Siemens Ag Metal oxide film resistor on insulated - substrate
US4039698A (en) * 1976-01-23 1977-08-02 Bell Telephone Laboratories, Incorporated Method for making patterned platinum metallization
DE3138960A1 (en) * 1981-09-30 1983-04-14 Siemens AG, 1000 Berlin und 8000 München METHOD FOR PRODUCING ELECTRICALLY CONDUCTING LAYERS
EP0105639B1 (en) * 1982-09-08 1988-01-07 Kabushiki Kaisha Toshiba Production of resistor from insulating material by local heating
JPS59117255A (en) * 1982-12-24 1984-07-06 Toshiba Corp Trimming method of resistor body
US4785157A (en) * 1986-01-09 1988-11-15 Mitsubishi Denki Kabushiki Kaisha Method for controlling electric resistance of a compound-type resistors
JPS6374033A (en) * 1986-09-18 1988-04-04 Canon Inc Formation of pattern
JP3082923B2 (en) * 1989-12-26 2000-09-04 ソニー株式会社 Semiconductor device manufacturing method
EP0641144A1 (en) * 1993-08-09 1995-03-01 Matsushita Electric Industrial Co., Ltd. Metal oxide film resistor and method for producing the same
JP3232937B2 (en) * 1995-02-16 2001-11-26 松下電器産業株式会社 Method for manufacturing semiconductor device

Also Published As

Publication number Publication date
NL1010430C2 (en) 2000-05-04
FR2780810B1 (en) 2001-05-25
GB2342776A (en) 2000-04-19
GB2342776B (en) 2000-12-20
FR2780810A1 (en) 2000-01-07
DE19849746A1 (en) 2000-01-13
JP2000031389A (en) 2000-01-28

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Legal Events

Date Code Title Description
PCNP Patent ceased through non-payment of renewal fee

Effective date: 20031016