GB9821310D0 - Method of manufacturing optical waveguide device using inductively coupled plasma system - Google Patents
Method of manufacturing optical waveguide device using inductively coupled plasma systemInfo
- Publication number
- GB9821310D0 GB9821310D0 GBGB9821310.1A GB9821310A GB9821310D0 GB 9821310 D0 GB9821310 D0 GB 9821310D0 GB 9821310 A GB9821310 A GB 9821310A GB 9821310 D0 GB9821310 D0 GB 9821310D0
- Authority
- GB
- United Kingdom
- Prior art keywords
- optical waveguide
- inductively coupled
- coupled plasma
- waveguide device
- plasma system
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
- H01J37/32082—Radio frequency generated discharge
- H01J37/321—Radio frequency generated discharge the radio frequency energy being inductively coupled to the plasma
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
- G02B6/10—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
- G02B6/12—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
- G02B6/13—Integrated optical circuits characterised by the manufacturing method
- G02B6/136—Integrated optical circuits characterised by the manufacturing method by etching
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
- G02B6/10—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
- G02B6/12—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
- G02B2006/12166—Manufacturing methods
- G02B2006/12173—Masking
Landscapes
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Microelectronics & Electronic Packaging (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Optical Integrated Circuits (AREA)
- Arc Welding In General (AREA)
Applications Claiming Priority (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1019970050966A KR19990030655A (en) | 1997-10-02 | 1997-10-02 | Optical waveguide manufacturing method |
KR1019970050964A KR19990030653A (en) | 1997-10-02 | 1997-10-02 | Optical waveguide manufacturing method |
KR1019970050965A KR100429850B1 (en) | 1997-10-02 | 1997-10-02 | Method for fabricating optical waveguide, especially increasing resolution of the waveguide |
KR1019970050967A KR19990030656A (en) | 1997-10-02 | 1997-10-02 | Optical waveguide manufacturing method |
Publications (3)
Publication Number | Publication Date |
---|---|
GB9821310D0 true GB9821310D0 (en) | 1998-11-25 |
GB2329873A GB2329873A (en) | 1999-04-07 |
GB2329873B GB2329873B (en) | 1999-11-10 |
Family
ID=27483234
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
GB9821310A Expired - Fee Related GB2329873B (en) | 1997-10-02 | 1998-10-02 | Method of manufacturing optical waveguide device using inductively coupled plasma system |
Country Status (5)
Country | Link |
---|---|
JP (1) | JPH11167037A (en) |
CN (1) | CN1213782A (en) |
CA (1) | CA2249094A1 (en) |
FR (1) | FR2769376A1 (en) |
GB (1) | GB2329873B (en) |
Families Citing this family (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100361097B1 (en) * | 2000-12-13 | 2002-11-21 | 우리로광통신주식회사 | Fabricating method of optical waveguide using inductively coupled plasma etcher |
US20020158047A1 (en) * | 2001-04-27 | 2002-10-31 | Yiqiong Wang | Formation of an optical component having smooth sidewalls |
JP2005148468A (en) * | 2003-11-17 | 2005-06-09 | Sony Corp | Optical waveguide, light source module and optical information processing device |
KR101235834B1 (en) * | 2010-12-08 | 2013-02-21 | 한국기계연구원 | Method of forming protruding patterns using a polymer layer as a etching protection layer |
WO2023056086A1 (en) * | 2021-10-01 | 2023-04-06 | PsiQuantum Corp. | Patterning methods for photonic devices |
Family Cites Families (17)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6032844B2 (en) * | 1977-06-16 | 1985-07-30 | 住友電気工業株式会社 | Method of manufacturing optical waveguide |
JPS592008A (en) * | 1982-06-28 | 1984-01-07 | Nippon Telegr & Teleph Corp <Ntt> | Production of embedding type quartz optical waveguide |
JPS63194206A (en) * | 1987-02-09 | 1988-08-11 | Nippon Telegr & Teleph Corp <Ntt> | Manufacture of quartz optical waveguide |
WO1991010341A1 (en) * | 1990-01-04 | 1991-07-11 | Savas Stephen E | A low frequency inductive rf plasma reactor |
JPH03291605A (en) * | 1990-04-10 | 1991-12-20 | Furukawa Electric Co Ltd:The | Forming of optical waveguide |
JPH04147201A (en) * | 1990-10-11 | 1992-05-20 | Sumitomo Electric Ind Ltd | Quartz-based optical waveguide and its manufacture |
JPH05215929A (en) * | 1992-02-03 | 1993-08-27 | Hitachi Cable Ltd | Manufacture of glass waveguide |
JPH05307125A (en) * | 1992-04-28 | 1993-11-19 | Japan Energy Corp | Production of optical waveguide |
EP0680072B1 (en) * | 1994-04-28 | 2003-10-08 | Applied Materials, Inc. | A method of operating a high density plasma CVD reactor with combined inductive and capacitive coupling |
US5607542A (en) * | 1994-11-01 | 1997-03-04 | Applied Materials Inc. | Inductively enhanced reactive ion etching |
KR100322695B1 (en) * | 1995-03-20 | 2002-05-13 | 윤종용 | Method for manufacturing ferroelectric capacitor |
JPH08262250A (en) * | 1995-03-22 | 1996-10-11 | Toshiba Mach Co Ltd | Production of optical waveguide and device therefor |
JP3951003B2 (en) * | 1995-11-17 | 2007-08-01 | 俊夫 後藤 | Plasma processing apparatus and method |
JP3492833B2 (en) * | 1995-11-28 | 2004-02-03 | リコー光学株式会社 | Manufacturing method of metal mask for dry etching, metal mask for dry etching, and deep etching method |
JPH09167696A (en) * | 1995-12-15 | 1997-06-24 | Sony Corp | Inductive coupling plasma processing device |
US5667631A (en) * | 1996-06-28 | 1997-09-16 | Lam Research Corporation | Dry etching of transparent electrodes in a low pressure plasma reactor |
TW373268B (en) * | 1997-02-21 | 1999-11-01 | Applied Materials Inc | Low temperature etch process utilizing power splitting between electrodes in AN RF plasma reactor |
-
1998
- 1998-09-30 CN CN 98120207 patent/CN1213782A/en active Pending
- 1998-09-30 JP JP10277548A patent/JPH11167037A/en active Pending
- 1998-09-30 CA CA002249094A patent/CA2249094A1/en not_active Abandoned
- 1998-10-01 FR FR9812305A patent/FR2769376A1/en not_active Withdrawn
- 1998-10-02 GB GB9821310A patent/GB2329873B/en not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
CA2249094A1 (en) | 1999-04-02 |
GB2329873B (en) | 1999-11-10 |
FR2769376A1 (en) | 1999-04-09 |
CN1213782A (en) | 1999-04-14 |
JPH11167037A (en) | 1999-06-22 |
GB2329873A (en) | 1999-04-07 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
PCNP | Patent ceased through non-payment of renewal fee |
Effective date: 20071002 |