GB9714116D0 - Organic material etching method - Google Patents

Organic material etching method

Info

Publication number
GB9714116D0
GB9714116D0 GBGB9714116.2A GB9714116A GB9714116D0 GB 9714116 D0 GB9714116 D0 GB 9714116D0 GB 9714116 A GB9714116 A GB 9714116A GB 9714116 D0 GB9714116 D0 GB 9714116D0
Authority
GB
United Kingdom
Prior art keywords
organic material
etching method
material etching
organic
etching
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
GBGB9714116.2A
Other versions
GB2315245A (en
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
LG Electronics Inc
Original Assignee
LG Electronics Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from KR1019960028525A external-priority patent/KR100237005B1/en
Priority claimed from KR1019960028527A external-priority patent/KR100237003B1/en
Application filed by LG Electronics Inc filed Critical LG Electronics Inc
Publication of GB9714116D0 publication Critical patent/GB9714116D0/en
Publication of GB2315245A publication Critical patent/GB2315245A/en
Withdrawn legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
    • H01L21/31—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to form insulating layers thereon, e.g. for masking or by using photolithographic techniques; After treatment of these layers; Selection of materials for these layers
    • H01L21/3105—After-treatment
    • H01L21/311—Etching the insulating layers by chemical or physical means
    • H01L21/31144—Etching the insulating layers by chemical or physical means using masks
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/133345—Insulating layers

Landscapes

  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Physics & Mathematics (AREA)
  • Power Engineering (AREA)
  • Drying Of Semiconductors (AREA)
  • Liquid Crystal (AREA)
  • Thin Film Transistor (AREA)
  • Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
  • Devices For Indicating Variable Information By Combining Individual Elements (AREA)
GB9714116A 1996-07-15 1997-07-03 Etching a hole in an organic passivation layer for an LCD Withdrawn GB2315245A (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
KR1019960028525A KR100237005B1 (en) 1996-07-15 1996-07-15 Etching method of insulating film in liquid crystal display device
KR1019960028527A KR100237003B1 (en) 1996-07-15 1996-07-15 Etching method of structure in liquid crystal display device

Publications (2)

Publication Number Publication Date
GB9714116D0 true GB9714116D0 (en) 1997-09-10
GB2315245A GB2315245A (en) 1998-01-28

Family

ID=26632019

Family Applications (1)

Application Number Title Priority Date Filing Date
GB9714116A Withdrawn GB2315245A (en) 1996-07-15 1997-07-03 Etching a hole in an organic passivation layer for an LCD

Country Status (4)

Country Link
JP (1) JPH1096960A (en)
DE (1) DE19730322A1 (en)
FR (1) FR2751468A1 (en)
GB (1) GB2315245A (en)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100255592B1 (en) * 1997-03-19 2000-05-01 구본준 The structure and manufacturing method of lcd
DE19956904C2 (en) * 1999-11-26 2003-08-07 United Monolithic Semiconduct Integrated amplitude limiter or limiter and method for producing an integrated limiter
JP4677654B2 (en) * 2000-04-19 2011-04-27 日本電気株式会社 Transmission type liquid crystal display device and manufacturing method thereof
KR100586240B1 (en) * 2000-05-18 2006-06-02 엘지.필립스 엘시디 주식회사 Method for fabricating the array substrate for LCD and the same
JP2004172389A (en) 2002-11-20 2004-06-17 Renesas Technology Corp Semiconductor device and method for manufacturing the same
JP3879751B2 (en) 2004-07-27 2007-02-14 セイコーエプソン株式会社 Contact hole forming method, circuit board manufacturing method, and electro-optical device manufacturing method
JP2006126255A (en) * 2004-10-26 2006-05-18 Mitsubishi Electric Corp Electrooptical device, liquid crystal display device, and method for manufacturing them
DE102004063036A1 (en) * 2004-12-28 2006-07-06 Advanced Micro Devices, Inc., Sunnyvale Method for forming contact spots
KR102282866B1 (en) 2012-07-20 2021-07-27 가부시키가이샤 한도오따이 에네루기 켄큐쇼 Display device and electronic device including the display device

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4507331A (en) * 1983-12-12 1985-03-26 International Business Machines Corporation Dry process for forming positive tone micro patterns
US4661204A (en) * 1985-10-25 1987-04-28 Tandem Computers Inc. Method for forming vertical interconnects in polyimide insulating layers
US4687543A (en) * 1986-02-21 1987-08-18 Tegal Corporation Selective plasma etching during formation of integrated circuitry
US5453157A (en) * 1994-05-16 1995-09-26 Texas Instruments Incorporated Low temperature anisotropic ashing of resist for semiconductor fabrication

Also Published As

Publication number Publication date
DE19730322A1 (en) 1998-01-29
GB2315245A (en) 1998-01-28
JPH1096960A (en) 1998-04-14
FR2751468A1 (en) 1998-01-23

Similar Documents

Publication Publication Date Title
AU8103998A (en) Remediation method
GB9606371D0 (en) An encapsulation process
GB9600464D0 (en) Novel method
SG72964A1 (en) Etching method
GB2345063B (en) Method
GB9809414D0 (en) Method
GB9706282D0 (en) Method
EP1041613A4 (en) Etching process
GB2323334B (en) Etching apparatus
AU7914898A (en) Remediation method
GB9700320D0 (en) Method
GB9714116D0 (en) Organic material etching method
EP0964438A4 (en) Dry etching method
IL118322A (en) Material incineration method
GB9619758D0 (en) Method
GB9605709D0 (en) Method
GB2339554B (en) Etching method
GB9624822D0 (en) Method
GB9601696D0 (en) Organic chemicals
GB9802475D0 (en) Method
GB9809780D0 (en) Method
GB9620407D0 (en) Organic material
GB9708705D0 (en) Manufacturing method
GB9804355D0 (en) Method
GB9713362D0 (en) Etching method

Legal Events

Date Code Title Description
WAP Application withdrawn, taken to be withdrawn or refused ** after publication under section 16(1)