GB9626977D0 - Exposure equipment - Google Patents

Exposure equipment

Info

Publication number
GB9626977D0
GB9626977D0 GBGB9626977.4A GB9626977A GB9626977D0 GB 9626977 D0 GB9626977 D0 GB 9626977D0 GB 9626977 A GB9626977 A GB 9626977A GB 9626977 D0 GB9626977 D0 GB 9626977D0
Authority
GB
United Kingdom
Prior art keywords
exposure equipment
exposure
equipment
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
GBGB9626977.4A
Other versions
GB2308667A (en
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
SK Hynix Inc
Original Assignee
Hyundai Electronics Industries Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from KR1019950066067A external-priority patent/KR100220941B1/en
Application filed by Hyundai Electronics Industries Co Ltd filed Critical Hyundai Electronics Industries Co Ltd
Publication of GB9626977D0 publication Critical patent/GB9626977D0/en
Publication of GB2308667A publication Critical patent/GB2308667A/en
Withdrawn legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70091—Illumination settings, i.e. intensity distribution in the pupil plane or angular distribution in the field plane; On-axis or off-axis settings, e.g. annular, dipole or quadrupole settings; Partial coherence control, i.e. sigma or numerical aperture [NA]
    • G03F7/701—Off-axis setting using an aperture

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
GB9626977A 1995-12-29 1996-12-27 Exposure equipment for a semiconductor device Withdrawn GB2308667A (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
KR1019950066067A KR100220941B1 (en) 1995-12-29 1995-12-29 Semiconductor apparatus
DE19700049A DE19700049A1 (en) 1995-12-29 1997-01-02 Exposure equipment for semiconductor device

Publications (2)

Publication Number Publication Date
GB9626977D0 true GB9626977D0 (en) 1997-02-12
GB2308667A GB2308667A (en) 1997-07-02

Family

ID=26032938

Family Applications (1)

Application Number Title Priority Date Filing Date
GB9626977A Withdrawn GB2308667A (en) 1995-12-29 1996-12-27 Exposure equipment for a semiconductor device

Country Status (3)

Country Link
JP (1) JPH1022222A (en)
DE (1) DE19700049A1 (en)
GB (1) GB2308667A (en)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4497949B2 (en) 2004-02-12 2010-07-07 キヤノン株式会社 Exposure equipment
JP5569556B2 (en) * 2006-01-27 2014-08-13 富士通セミコンダクター株式会社 Manufacturing method of semiconductor device

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2116713B2 (en) * 1971-04-06 1974-03-28 Ibm Deutschland Gmbh, 7000 Stuttgart Exposure method for imaging very finely structured light patterns on photoresist layers and a suitable exposure device
DE2411926A1 (en) * 1974-03-13 1975-09-25 Ibm Deutschland DEVICE FOR EXPOSING LIGHT-SENSITIVE COATINGS THROUGH MASKS
FR2356975A1 (en) * 1976-06-30 1978-01-27 Ibm CONTACT TYPE PHOTOLITHOGRAPHIC PRINTING PROCESS FOR OBTAINING HIGH RESOLUTION PROFILES AND APPARATUS USING SUCH A PROCESS
JPS54127284A (en) * 1978-03-27 1979-10-03 Cho Lsi Gijutsu Kenkyu Kumiai Method of forming reflective pattern
GB2041639B (en) * 1979-02-02 1983-09-07 Smith K Electron beam lithography
US4389115A (en) * 1981-08-06 1983-06-21 Richter Thomas A Optical system
GB2163561B (en) * 1984-08-22 1988-06-15 Gen Electric Plc Modifying masters for printed circuit boards
US4758863A (en) * 1987-02-17 1988-07-19 Hewlett-Packard Company Multi-image reticle

Also Published As

Publication number Publication date
GB2308667A (en) 1997-07-02
JPH1022222A (en) 1998-01-23
DE19700049A1 (en) 1998-07-09

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Legal Events

Date Code Title Description
WAP Application withdrawn, taken to be withdrawn or refused ** after publication under section 16(1)