GB9619839D0 - Photolithography masking arrangements - Google Patents

Photolithography masking arrangements

Info

Publication number
GB9619839D0
GB9619839D0 GBGB9619839.5A GB9619839A GB9619839D0 GB 9619839 D0 GB9619839 D0 GB 9619839D0 GB 9619839 A GB9619839 A GB 9619839A GB 9619839 D0 GB9619839 D0 GB 9619839D0
Authority
GB
United Kingdom
Prior art keywords
light
photolithography masking
masking arrangements
arrangements
maximising
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
GBGB9619839.5A
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
HUGLE LITHOGRAPHY Inc
Original Assignee
HUGLE LITHOGRAPHY Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by HUGLE LITHOGRAPHY Inc filed Critical HUGLE LITHOGRAPHY Inc
Priority to GBGB9619839.5A priority Critical patent/GB9619839D0/en
Publication of GB9619839D0 publication Critical patent/GB9619839D0/en
Priority to PCT/IB1997/001277 priority patent/WO1998012603A1/en
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/7035—Proximity or contact printers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70275—Multiple projection paths, e.g. array of projection systems, microlens projection systems or tandem projection systems

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Solid State Image Pick-Up Elements (AREA)

Abstract

A photomask arrangement comprises an array of optical elements (30) (e.g. microlenses) arranged to receive a uniform beam of light and to concentrate light onto respective points, lines or other areas of a photoresist layer (20). In this way, the light passing through each optical element is converged or concentrated onto a smaller area, thus maximising the use of the available light.
GBGB9619839.5A 1996-09-23 1996-09-23 Photolithography masking arrangements Pending GB9619839D0 (en)

Priority Applications (2)

Application Number Priority Date Filing Date Title
GBGB9619839.5A GB9619839D0 (en) 1996-09-23 1996-09-23 Photolithography masking arrangements
PCT/IB1997/001277 WO1998012603A1 (en) 1996-09-23 1997-09-22 Photolithography masking arrangements

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
GBGB9619839.5A GB9619839D0 (en) 1996-09-23 1996-09-23 Photolithography masking arrangements

Publications (1)

Publication Number Publication Date
GB9619839D0 true GB9619839D0 (en) 1996-11-06

Family

ID=10800371

Family Applications (1)

Application Number Title Priority Date Filing Date
GBGB9619839.5A Pending GB9619839D0 (en) 1996-09-23 1996-09-23 Photolithography masking arrangements

Country Status (2)

Country Link
GB (1) GB9619839D0 (en)
WO (1) WO1998012603A1 (en)

Families Citing this family (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE59811244D1 (en) * 1997-07-04 2004-05-27 Infineon Technologies Ag ARRANGEMENT FOR TRANSFERRING STRUCTURES
EP1001311A1 (en) * 1998-11-16 2000-05-17 International Business Machines Corporation Patterning device
US6424404B1 (en) 1999-01-11 2002-07-23 Kenneth C. Johnson Multi-stage microlens array
US6498685B1 (en) 1999-01-11 2002-12-24 Kenneth C. Johnson Maskless, microlens EUV lithography system
DE19915666A1 (en) * 1999-04-07 2000-10-19 Fraunhofer Ges Forschung Method and device for selective contacting of solar cells
DE10015010C2 (en) 2000-03-22 2002-08-29 Eppendorf Ag Locking a lock with a housing
US6852471B2 (en) 2001-06-08 2005-02-08 Numerical Technologies, Inc. Exposure control for phase shifting photolithographic masks
CN1791839A (en) 2001-11-07 2006-06-21 应用材料有限公司 Optical spot grid array printer
DE10206687B4 (en) * 2002-02-18 2004-02-19 Infineon Technologies Ag Device and method for light-induced chemical treatment of a workpiece
FR2837937B1 (en) * 2002-03-28 2004-08-27 Pascal Joffre OPTICAL SURFACE TREATMENT SYSTEM
EP1593002B1 (en) 2003-02-14 2014-07-16 Eulitha AG Method for generating a circular periodic structure on a basic support material
EP1447714A3 (en) * 2003-02-14 2005-02-16 Paul Scherrer Institut Method for generating a circular periodic structure on a basic support material
KR101820558B1 (en) * 2010-12-23 2018-02-28 유리타 아. 게. System and method for production of nanostructures over large areas
CN103245991B (en) * 2013-04-02 2015-08-12 厦门大学 A kind of method of frequency multiplication grating spatial frequency
CN105259739B (en) * 2015-11-12 2017-06-30 中国科学院光电技术研究所 Photoetching method and device for preparing two-dimensional periodic array based on ultraviolet wide-spectrum self-imaging

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57181549A (en) * 1981-04-30 1982-11-09 Masatake Sato Converting method for image
EP0368482A1 (en) * 1988-10-14 1990-05-16 Secretary Of State For Trade And Industry In Her Britannic Majesty's Gov. Of The U.K. Of Great Britain And Northern Ireland Method of making a product with a feature having a multiplicity of fine lines
US5148322A (en) * 1989-11-09 1992-09-15 Omron Tateisi Electronics Co. Micro aspherical lens and fabricating method therefor and optical device
EP0486316B1 (en) * 1990-11-15 2000-04-19 Nikon Corporation Projection exposure method and apparatus
JP3321194B2 (en) * 1992-02-10 2002-09-03 株式会社クラレ Photo mask
FR2725558B1 (en) * 1994-10-10 1996-10-31 Commissariat Energie Atomique METHOD FOR FORMING HOLES IN A PHOTOSENSITIVE RESIN LAYER APPLICATION TO THE MANUFACTURE OF MICROPOINT EMISSIVE CATHODE ELECTRON SOURCES AND FLAT DISPLAY SCREENS
FR2737928B1 (en) * 1995-08-17 1997-09-12 Commissariat Energie Atomique DEVICE FOR INSOLATING MICROMETRIC AND / OR SUBMICROMETRIC ZONES IN A PHOTOSENSITIVE LAYER AND METHOD FOR PRODUCING PATTERNS IN SUCH A LAYER

Also Published As

Publication number Publication date
WO1998012603A1 (en) 1998-03-26

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