JPS57181549A - Converting method for image - Google Patents
Converting method for imageInfo
- Publication number
- JPS57181549A JPS57181549A JP56065899A JP6589981A JPS57181549A JP S57181549 A JPS57181549 A JP S57181549A JP 56065899 A JP56065899 A JP 56065899A JP 6589981 A JP6589981 A JP 6589981A JP S57181549 A JPS57181549 A JP S57181549A
- Authority
- JP
- Japan
- Prior art keywords
- original image
- image
- sheetlike body
- contact
- sheet
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F5/00—Screening processes; Screens therefor
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Facsimile Image Signal Circuits (AREA)
Abstract
PURPOSE:To convert the continuous gradation of an original image into an image of large and small dots without requiring special materials by bringing an entirely transparent sheetlike body having a plurality of three-dimensionally arranged fine resolving elements into contact with the original image. CONSTITUTION:A photograph of an original image 2 contacting with a sheetlike body 3 is taken with a camera 51. The sheet 3 has a plurality of fine resolving elements arranged three-dimensionally in the form of a sheet as a whole, and the whole sheetlike body is formed with transparent materials independently of the colored or colorless parts. For example, the sheetlike body 3 is obtd. by adhering glass spheres 15 to a polyethylene sheet 14 at regular intervals or arranging glass spheres 25 between 2 polyester sheets 23, 24 in contact with each other. By bringing the sheetlike body 3 into contact with the original image, the continuout gradation of the original image can be converted into an image of large and small dots without requiring special materials.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP56065899A JPS57181549A (en) | 1981-04-30 | 1981-04-30 | Converting method for image |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP56065899A JPS57181549A (en) | 1981-04-30 | 1981-04-30 | Converting method for image |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS57181549A true JPS57181549A (en) | 1982-11-09 |
Family
ID=13300265
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP56065899A Pending JPS57181549A (en) | 1981-04-30 | 1981-04-30 | Converting method for image |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS57181549A (en) |
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
FR2725558A1 (en) * | 1994-10-10 | 1996-04-12 | Commissariat Energie Atomique | METHOD FOR FORMING HOLES IN A PHOTOSENSITIVE RESIN LAYER APPLICATION TO THE MANUFACTURE OF ELECTRON SOURCES WITH EMISSIVE CATHODES WITH MICROPOINTES AND DISPLAY FLAT SCREENS |
FR2726098A1 (en) * | 1994-10-24 | 1996-04-26 | Commissariat Energie Atomique | PROCESS FOR PHOTOLITHOGRAVING DENSITY CIRCULAR PATTERNS |
FR2737928A1 (en) * | 1995-08-17 | 1997-02-21 | Commissariat Energie Atomique | DEVICE FOR INSOLATING MICROMETRIC AND / OR SUBMITROMETRIC AREAS IN A PHOTOSENSITIVE LAYER AND METHOD OF MAKING PATTERNS IN SUCH A LAYER |
WO1998012603A1 (en) * | 1996-09-23 | 1998-03-26 | Hugle Lithography Inc. | Photolithography masking arrangements |
US6897941B2 (en) | 2001-11-07 | 2005-05-24 | Applied Materials, Inc. | Optical spot grid array printer |
-
1981
- 1981-04-30 JP JP56065899A patent/JPS57181549A/en active Pending
Cited By (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
FR2725558A1 (en) * | 1994-10-10 | 1996-04-12 | Commissariat Energie Atomique | METHOD FOR FORMING HOLES IN A PHOTOSENSITIVE RESIN LAYER APPLICATION TO THE MANUFACTURE OF ELECTRON SOURCES WITH EMISSIVE CATHODES WITH MICROPOINTES AND DISPLAY FLAT SCREENS |
EP0707237A1 (en) * | 1994-10-10 | 1996-04-17 | Commissariat A L'energie Atomique | Process for the fabrication of holes in photoresist layers, use for the fabrication of electron sources comprising emissive cathodes with microtips and flat display screens |
FR2726098A1 (en) * | 1994-10-24 | 1996-04-26 | Commissariat Energie Atomique | PROCESS FOR PHOTOLITHOGRAVING DENSITY CIRCULAR PATTERNS |
EP0709741A1 (en) * | 1994-10-24 | 1996-05-01 | Commissariat A L'energie Atomique | Photolithographic process for circular dense patterns |
US5776644A (en) * | 1994-10-24 | 1998-07-07 | Commissariat A L'energie Atomique | Photolithographic method for high resolution circle patterning utilizing calibrated opaque microspheres |
FR2737928A1 (en) * | 1995-08-17 | 1997-02-21 | Commissariat Energie Atomique | DEVICE FOR INSOLATING MICROMETRIC AND / OR SUBMITROMETRIC AREAS IN A PHOTOSENSITIVE LAYER AND METHOD OF MAKING PATTERNS IN SUCH A LAYER |
EP0759578A1 (en) * | 1995-08-17 | 1997-02-26 | Commissariat A L'energie Atomique | Apparatus for the exposure of micropattern in a photosensitive layer and process for creating a pattern therein |
WO1998012603A1 (en) * | 1996-09-23 | 1998-03-26 | Hugle Lithography Inc. | Photolithography masking arrangements |
US6897941B2 (en) | 2001-11-07 | 2005-05-24 | Applied Materials, Inc. | Optical spot grid array printer |
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