GB9610969D0 - Thin film forming apparatus - Google Patents
Thin film forming apparatusInfo
- Publication number
- GB9610969D0 GB9610969D0 GBGB9610969.9A GB9610969A GB9610969D0 GB 9610969 D0 GB9610969 D0 GB 9610969D0 GB 9610969 A GB9610969 A GB 9610969A GB 9610969 D0 GB9610969 D0 GB 9610969D0
- Authority
- GB
- United Kingdom
- Prior art keywords
- thin film
- forming apparatus
- film forming
- thin
- forming
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/08—Oxides
- C23C14/087—Oxides of copper or solid solutions thereof
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/0021—Reactive sputtering or evaporation
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/02—Pretreatment of the material to be coated
- C23C14/021—Cleaning or etching treatments
- C23C14/022—Cleaning or etching treatments by means of bombardment with energetic particles or radiation
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/28—Vacuum evaporation by wave energy or particle radiation
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/3471—Introduction of auxiliary energy into the plasma
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/54—Controlling or regulating the coating process
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/54—Controlling or regulating the coating process
- C23C14/541—Heating or cooling of the substrates
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/54—Controlling or regulating the coating process
- C23C14/542—Controlling the film thickness or evaporation rate
- C23C14/545—Controlling the film thickness or evaporation rate using measurement on deposited material
- C23C14/547—Controlling the film thickness or evaporation rate using measurement on deposited material using optical methods
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
- C23C14/564—Means for minimising impurities in the coating chamber such as dust, moisture, residual gases
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP34558492A JP3255469B2 (en) | 1992-11-30 | 1992-11-30 | Laser thin film forming equipment |
GB9324498A GB2272912B (en) | 1992-11-30 | 1993-11-29 | Thin Film forming apparatus using laser |
Publications (2)
Publication Number | Publication Date |
---|---|
GB9610969D0 true GB9610969D0 (en) | 1996-07-31 |
GB2300000A GB2300000A (en) | 1996-10-23 |
Family
ID=26303932
Family Applications (4)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
GB9611008A Expired - Fee Related GB2300001B (en) | 1992-11-30 | 1993-11-29 | Thin film forming apparatus using laser |
GB9610953A Expired - Fee Related GB2303379B (en) | 1992-11-30 | 1993-11-29 | Thin film forming apparatus using laser |
GB9611007A Expired - Fee Related GB2300426B (en) | 1992-11-30 | 1993-11-29 | Thin film forming apparatus using laser |
GB9610969A Withdrawn GB2300000A (en) | 1992-11-30 | 1993-11-29 | Thin film forming using laser and activated oxidising gas |
Family Applications Before (3)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
GB9611008A Expired - Fee Related GB2300001B (en) | 1992-11-30 | 1993-11-29 | Thin film forming apparatus using laser |
GB9610953A Expired - Fee Related GB2303379B (en) | 1992-11-30 | 1993-11-29 | Thin film forming apparatus using laser |
GB9611007A Expired - Fee Related GB2300426B (en) | 1992-11-30 | 1993-11-29 | Thin film forming apparatus using laser |
Country Status (1)
Country | Link |
---|---|
GB (4) | GB2300001B (en) |
Families Citing this family (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP3255469B2 (en) * | 1992-11-30 | 2002-02-12 | 三菱電機株式会社 | Laser thin film forming equipment |
ES2325894B1 (en) * | 2006-02-24 | 2010-10-28 | Universidad De Cadiz | METHOD AND APPARATUS FOR THE MANUFACTURE OF DIFFACTIVE OPTICAL ELEMENTS. |
ES2299335B2 (en) * | 2006-03-09 | 2010-10-13 | Universidad De Cadiz | METHOD FOR THE MANUFACTURE OF OPTICAL STRUCTURES WITH PURELY REFRACTIVE FUNCTIONALITY. |
CN103774097B (en) * | 2014-01-23 | 2015-07-01 | 中国科学院合肥物质科学研究院 | High-intensity magnetic field assisted pulsed laser deposition system |
CN107884918A (en) * | 2017-11-13 | 2018-04-06 | 中国科学院合肥物质科学研究院 | High energy ultraviolet laser gatherer under a kind of high-intensity magnetic field |
Family Cites Families (20)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB1553582A (en) * | 1977-04-14 | 1979-09-26 | Boc Ltd | Laser beam splitting apparatus |
US4664769A (en) * | 1985-10-28 | 1987-05-12 | International Business Machines Corporation | Photoelectric enhanced plasma glow discharge system and method including radiation means |
US4857699A (en) * | 1987-01-30 | 1989-08-15 | Duley Walter W | Means of enhancing laser processing efficiency of metals |
JPH01219155A (en) * | 1988-02-25 | 1989-09-01 | Mitsubishi Electric Corp | Laser vapor deposition apparatus |
EP0431160B1 (en) * | 1988-03-16 | 1995-05-17 | Kabushiki Kaisha Toshiba | Process for producing thin-film oxide superconductor |
US4987007A (en) * | 1988-04-18 | 1991-01-22 | Board Of Regents, The University Of Texas System | Method and apparatus for producing a layer of material from a laser ion source |
DE3816192A1 (en) * | 1988-05-11 | 1989-11-23 | Siemens Ag | METHOD FOR PRODUCING A LAYER FROM A METAL-OXIDIC SUPRAL-CONDUCTOR MATERIAL BY LASER EVAPORATION |
JPH02104660A (en) * | 1988-06-21 | 1990-04-17 | Furukawa Electric Co Ltd:The | Laser-beam sputtering method |
JPH08970B2 (en) * | 1988-10-31 | 1996-01-10 | 日本電信電話株式会社 | Method for forming multi-element compound thin film |
DE3914476C1 (en) * | 1989-05-02 | 1990-06-21 | Forschungszentrum Juelich Gmbh, 5170 Juelich, De | |
DE69032824T2 (en) * | 1989-07-06 | 1999-06-10 | Toyota Motor Co Ltd | Laser vapor deposition process |
JPH0354104A (en) * | 1989-07-21 | 1991-03-08 | Chiyoudendou Hatsuden Kanren Kiki Zairyo Gijutsu Kenkyu Kumiai | Laser type vapor deposition apparatus for production of oxide superconductor |
JPH0375362A (en) * | 1989-08-18 | 1991-03-29 | Furukawa Electric Co Ltd:The | Production of thin oxide superconductor film |
DE4000690A1 (en) * | 1990-01-12 | 1991-07-18 | Philips Patentverwaltung | PROCESS FOR PRODUCING ULTRAFINE PARTICLES AND THEIR USE |
JP2581255B2 (en) * | 1990-04-02 | 1997-02-12 | 富士電機株式会社 | Plasma processing method |
GB2250751B (en) * | 1990-08-24 | 1995-04-12 | Kawasaki Heavy Ind Ltd | Process for the production of dielectric thin films |
JPH04114904A (en) * | 1990-08-31 | 1992-04-15 | Sumitomo Electric Ind Ltd | Preparation of high-quality thin superconducting film of oxide |
JPH05331632A (en) * | 1992-06-01 | 1993-12-14 | Matsushita Electric Ind Co Ltd | Laser abrasion device and formation of thin film |
JPH06272022A (en) * | 1993-03-19 | 1994-09-27 | Chodendo Hatsuden Kanren Kiki Zairyo Gijutsu Kenkyu Kumiai | Laser assisted deposition system and formation of polycrystal thin film using the same |
JPH07331422A (en) * | 1994-06-09 | 1995-12-19 | Toshiba Corp | Laser abrasion device |
-
1993
- 1993-11-29 GB GB9611008A patent/GB2300001B/en not_active Expired - Fee Related
- 1993-11-29 GB GB9610953A patent/GB2303379B/en not_active Expired - Fee Related
- 1993-11-29 GB GB9611007A patent/GB2300426B/en not_active Expired - Fee Related
- 1993-11-29 GB GB9610969A patent/GB2300000A/en not_active Withdrawn
Also Published As
Publication number | Publication date |
---|---|
GB2303379A (en) | 1997-02-19 |
GB2300426A (en) | 1996-11-06 |
GB9611007D0 (en) | 1996-07-31 |
GB2300001A (en) | 1996-10-23 |
GB2300001B (en) | 1997-05-28 |
GB2300426B (en) | 1997-05-28 |
GB2303379B (en) | 1997-05-28 |
GB2300000A (en) | 1996-10-23 |
GB9611008D0 (en) | 1996-07-31 |
GB9610953D0 (en) | 1996-07-31 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
WAP | Application withdrawn, taken to be withdrawn or refused ** after publication under section 16(1) |