GB9405612D0 - Semiconductor device capacitor and method for manufacturing the same - Google Patents

Semiconductor device capacitor and method for manufacturing the same

Info

Publication number
GB9405612D0
GB9405612D0 GB9405612A GB9405612A GB9405612D0 GB 9405612 D0 GB9405612 D0 GB 9405612D0 GB 9405612 A GB9405612 A GB 9405612A GB 9405612 A GB9405612 A GB 9405612A GB 9405612 D0 GB9405612 D0 GB 9405612D0
Authority
GB
United Kingdom
Prior art keywords
manufacturing
same
semiconductor device
device capacitor
capacitor
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
GB9405612A
Other versions
GB2276980A (en
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Samsung Electronics Co Ltd
Original Assignee
Samsung Electronics Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Samsung Electronics Co Ltd filed Critical Samsung Electronics Co Ltd
Publication of GB9405612D0 publication Critical patent/GB9405612D0/en
Publication of GB2276980A publication Critical patent/GB2276980A/en
Withdrawn legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10BELECTRONIC MEMORY DEVICES
    • H10B12/00Dynamic random access memory [DRAM] devices
    • H10B12/01Manufacture or treatment
    • H10B12/02Manufacture or treatment for one transistor one-capacitor [1T-1C] memory cells
    • H10B12/03Making the capacitor or connections thereto
    • H10B12/033Making the capacitor or connections thereto the capacitor extending over the transistor
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07DHETEROCYCLIC COMPOUNDS
    • C07D417/00Heterocyclic compounds containing two or more hetero rings, at least one ring having nitrogen and sulfur atoms as the only ring hetero atoms, not provided for by group C07D415/00
    • C07D417/02Heterocyclic compounds containing two or more hetero rings, at least one ring having nitrogen and sulfur atoms as the only ring hetero atoms, not provided for by group C07D415/00 containing two hetero rings
    • C07D417/12Heterocyclic compounds containing two or more hetero rings, at least one ring having nitrogen and sulfur atoms as the only ring hetero atoms, not provided for by group C07D415/00 containing two hetero rings linked by a chain containing hetero atoms as chain links
GB9405612A 1993-03-22 1994-03-22 Semiconductor device stacked capacitor and method of manufacture Withdrawn GB2276980A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR1019930004396A KR940022841A (en) 1993-03-22 1993-03-22 Capacitor of Semiconductor Device and Manufacturing Method Thereof

Publications (2)

Publication Number Publication Date
GB9405612D0 true GB9405612D0 (en) 1994-05-11
GB2276980A GB2276980A (en) 1994-10-12

Family

ID=19352552

Family Applications (1)

Application Number Title Priority Date Filing Date
GB9405612A Withdrawn GB2276980A (en) 1993-03-22 1994-03-22 Semiconductor device stacked capacitor and method of manufacture

Country Status (5)

Country Link
JP (1) JPH077088A (en)
KR (1) KR940022841A (en)
CA (1) CA2119547A1 (en)
DE (1) DE4409718A1 (en)
GB (1) GB2276980A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN113725165A (en) * 2021-08-30 2021-11-30 长鑫存储技术有限公司 Semiconductor structure and preparation method thereof

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1044948C (en) * 1994-06-22 1999-09-01 现代电子产业株式会社 Method for fabricating stack capacitor of semiconductor device
KR0180779B1 (en) * 1995-02-27 1999-03-20 김주용 Method for manufacturing semiconductor capacitor
GB2321779A (en) * 1996-08-16 1998-08-05 United Microelectronics Corp Semiconductor memory device having a capacitor
JPH11186524A (en) 1997-12-24 1999-07-09 Mitsubishi Electric Corp Semiconductor device and its manufacture
KR100537195B1 (en) * 1998-06-29 2006-05-12 주식회사 하이닉스반도체 Capacitor Manufacturing Method of Semiconductor Memory Device
GB2386471B (en) 2001-12-11 2004-04-07 Samsung Electronics Co Ltd A method for fabricating a one-cylinder stack capacitor
KR100434496B1 (en) 2001-12-11 2004-06-05 삼성전자주식회사 One cylinder stack capacitor and fabrication method thereof using double mold

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2504606B2 (en) * 1990-05-18 1996-06-05 株式会社東芝 Semiconductor memory device and manufacturing method thereof
KR920001760A (en) * 1990-06-29 1992-01-30 김광호 Manufacturing method of stacked capacitor of DRAM cell

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN113725165A (en) * 2021-08-30 2021-11-30 长鑫存储技术有限公司 Semiconductor structure and preparation method thereof
CN113725165B (en) * 2021-08-30 2023-07-11 长鑫存储技术有限公司 Semiconductor structure and preparation method thereof

Also Published As

Publication number Publication date
DE4409718A1 (en) 1994-09-29
KR940022841A (en) 1994-10-21
GB2276980A (en) 1994-10-12
CA2119547A1 (en) 1994-09-23
JPH077088A (en) 1995-01-10

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Legal Events

Date Code Title Description
WAP Application withdrawn, taken to be withdrawn or refused ** after publication under section 16(1)