GB924047A - Abrasive polishing compositions and process of forming same - Google Patents

Abrasive polishing compositions and process of forming same

Info

Publication number
GB924047A
GB924047A GB23134/60A GB2313460A GB924047A GB 924047 A GB924047 A GB 924047A GB 23134/60 A GB23134/60 A GB 23134/60A GB 2313460 A GB2313460 A GB 2313460A GB 924047 A GB924047 A GB 924047A
Authority
GB
United Kingdom
Prior art keywords
ceric
abrasive material
composition
reactant
sulphate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB23134/60A
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
American Potash and Chemical Corp
Original Assignee
American Potash and Chemical Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by American Potash and Chemical Corp filed Critical American Potash and Chemical Corp
Publication of GB924047A publication Critical patent/GB924047A/en
Expired legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K3/00—Materials not provided for elsewhere
    • C09K3/14—Anti-slip materials; Abrasives
    • C09K3/1454—Abrasive powders, suspensions and pastes for polishing
    • C09K3/1481—Pastes, optionally in the form of blocks or sticks
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K3/00—Materials not provided for elsewhere
    • C09K3/14—Anti-slip materials; Abrasives
    • C09K3/1454—Abrasive powders, suspensions and pastes for polishing
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K3/00—Materials not provided for elsewhere
    • C09K3/14—Anti-slip materials; Abrasives
    • C09K3/1454—Abrasive powders, suspensions and pastes for polishing
    • C09K3/1463—Aqueous liquid suspensions

Abstract

An abrasive polishing composition, suitably an aqueous dispersion, comprises (a) a particulate abrasive material, e.g. zirconium oxide, rouge, a mixture of rare earth metal oxides, but preferably ceric oxide, and (b) gelatinous ceric hydroxide which may or may not contain cerous hydroxide as well. The composition is conveniently produced as a dry mix consisting of the particulate abrasive material, a cerium salt such as ceric ammonium sulphate or nitrate, ceric sulphate, cerous sulphate or cerous nitrate, and a reactant which generates hydroxyl ions in aqueous solution such as sodium, potassium or ammonium hydroxide, sodium carbonate, trisodium phosphate, or sodium meta- or tetraborate, from which the composition of the invention is formed on adding to water. In other embodiments the particulate abrasive material and the cerium salt are dispersed in a solution of the reactant, or the abrasive material is dispersed in the reactant solution and the cerium salt then added. In general, in the final composition the weight ratio of (b) to (a) is 1:10 to 1:3 ((b) being calculated as ceric oxide).
GB23134/60A 1959-07-02 1960-07-01 Abrasive polishing compositions and process of forming same Expired GB924047A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US824479A US3097083A (en) 1959-07-02 1959-07-02 Polishing composition and process of forming same

Publications (1)

Publication Number Publication Date
GB924047A true GB924047A (en) 1963-04-18

Family

ID=25241504

Family Applications (1)

Application Number Title Priority Date Filing Date
GB23134/60A Expired GB924047A (en) 1959-07-02 1960-07-01 Abrasive polishing compositions and process of forming same

Country Status (4)

Country Link
US (1) US3097083A (en)
BE (1) BE592540A (en)
DE (1) DE1292287B (en)
GB (1) GB924047A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2472601A1 (en) * 1979-12-27 1981-07-03 Rhone Poulenc Ind PROCESS FOR PRODUCING CERIUM POLISHING COMPOSITIONS
EP0146223A2 (en) * 1983-10-28 1985-06-26 Ampex Corporation Metal polishing composition and process

Families Citing this family (27)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3240580A (en) * 1961-04-03 1966-03-15 Libbey Owens Ford Glass Co Glass polishing compositions of rare earth nitrates
JPS396945B1 (en) * 1961-09-09 1964-05-09
US3317293A (en) * 1964-04-20 1967-05-02 Libbey Owens Ford Glass Co Rare earth chlorides in a glass polishing composition
US3317294A (en) * 1964-07-16 1967-05-02 Libbey Owens Ford Glass Co Glass polishing composition comprising a water-soluble zinc salt
US3388980A (en) * 1965-12-21 1968-06-18 Pittsburgh Plate Glass Co Method of making glass polishing composition
US3328141A (en) * 1966-02-28 1967-06-27 Tizon Chemical Corp Process for polishing crystalline silicon
US3388981A (en) * 1966-09-30 1968-06-18 Pittsburgh Plate Glass Co Method of making glass polishing composition
US3388508A (en) * 1967-08-23 1968-06-18 Pittsburgh Plate Glass Co Glass polishing composition containing dissolved zirconium and zirconium oxide
US3388982A (en) * 1967-08-23 1968-06-18 Pittsburgh Plate Glass Co Glass polishing composition containing an inorganic barium salt
FR2414071A1 (en) * 1978-01-05 1979-08-03 Essilor Int POLISHING MATERIAL, ESPECIALLY FOR OPHTHALMIC LENSES IN ORGANIC MATTER
SU1135625A1 (en) * 1978-05-04 1985-01-23 Всесоюзный научно-исследовательский и конструкторско-технологический институт природных алмазов и инструмента Composition for making abrasive tools
FR2545830B1 (en) * 1983-05-13 1986-01-03 Rhone Poulenc Spec Chim NOVEL CERIUM-BASED POLISHING COMPOSITION AND MANUFACTURING METHOD THEREOF
FR2604443A1 (en) * 1986-09-26 1988-04-01 Rhone Poulenc Chimie CERIUM POLISHING COMPOSITION FOR POLISHING ORGANIC GLASSES
FR2624519A1 (en) * 1987-12-09 1989-06-16 Rhone Poulenc Chimie CERIUM-IMPROVED POLISHING COMPOSITION AND PROCESS FOR PREPARING THE SAME
US6419554B2 (en) * 1999-06-24 2002-07-16 Micron Technology, Inc. Fixed abrasive chemical-mechanical planarization of titanium nitride
EP1369906B1 (en) * 2001-02-20 2012-06-27 Hitachi Chemical Company, Ltd. Polishing compound and method for polishing substrate
KR101376057B1 (en) * 2009-04-15 2014-03-19 솔베이 (차이나) 컴퍼니, 리미티드 A cerium-based particle composition and the preparation thereof
CN102666014B (en) 2010-03-12 2017-10-31 日立化成株式会社 Suspension, lapping liquid set agent, lapping liquid and the Ginding process using their substrate
CN103450847A (en) * 2010-11-22 2013-12-18 日立化成株式会社 Method for producing abrasive grains, method for producing slurry, and method for producing polishing liquid
KR101886895B1 (en) 2010-11-22 2018-08-08 히타치가세이가부시끼가이샤 Slurry, polishing liquid set, polishing liquid, method for polishing substrate, and substrate
US9881801B2 (en) 2010-11-22 2018-01-30 Hitachi Chemical Company, Ltd. Slurry, polishing liquid set, polishing liquid, method for polishing substrate, and substrate
JP6044630B2 (en) 2012-02-21 2016-12-14 日立化成株式会社 Abrasive, abrasive set, and substrate polishing method
JP6044629B2 (en) 2012-02-21 2016-12-14 日立化成株式会社 Abrasive, abrasive set, and substrate polishing method
CN104334675B (en) 2012-05-22 2016-10-26 日立化成株式会社 The set agent of suspension, lapping liquid, lapping liquid, the Ginding process of matrix and matrix
CN104321854B (en) 2012-05-22 2017-06-20 日立化成株式会社 Suspension, lapping liquid set agent, lapping liquid, the Ginding process and matrix of matrix
WO2013175859A1 (en) 2012-05-22 2013-11-28 日立化成株式会社 Slurry, polishing-solution set, polishing solution, substrate polishing method, and substrate
DE202014005543U1 (en) 2014-07-08 2015-02-20 Clearopag Gmbh Polish arrangement

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2383500A (en) * 1944-02-04 1945-08-28 Albert S Polan Polishing compound
US2554070A (en) * 1946-06-05 1951-05-22 Shuron Optical Co Inc Method of finishing lenses
FR945664A (en) * 1947-04-25 1949-05-11 Cleaning product
US2744001A (en) * 1950-09-08 1956-05-01 Rare Earths Inc Polishing material and method of making same
US2816824A (en) * 1953-12-28 1957-12-17 Corning Glass Works Cerium oxide polishing composition
US2865725A (en) * 1956-06-18 1958-12-23 Econ O Cloth Polishing article

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2472601A1 (en) * 1979-12-27 1981-07-03 Rhone Poulenc Ind PROCESS FOR PRODUCING CERIUM POLISHING COMPOSITIONS
EP0146223A2 (en) * 1983-10-28 1985-06-26 Ampex Corporation Metal polishing composition and process
EP0146223A3 (en) * 1983-10-28 1986-02-12 Ampex Corporation Metal polishing composition and process

Also Published As

Publication number Publication date
BE592540A (en) 1960-10-02
US3097083A (en) 1963-07-09
DE1292287B (en) 1969-04-10

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