GB9208673D0 - Ionised vapour source - Google Patents
Ionised vapour sourceInfo
- Publication number
- GB9208673D0 GB9208673D0 GB929208673A GB9208673A GB9208673D0 GB 9208673 D0 GB9208673 D0 GB 9208673D0 GB 929208673 A GB929208673 A GB 929208673A GB 9208673 A GB9208673 A GB 9208673A GB 9208673 D0 GB9208673 D0 GB 9208673D0
- Authority
- GB
- United Kingdom
- Prior art keywords
- vapour source
- ionised vapour
- ionised
- source
- vapour
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/32—Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating
- C23C14/325—Electric arc evaporation
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
- H01J37/3402—Gas-filled discharge tubes operating with cathodic sputtering using supplementary magnetic fields
- H01J37/3405—Magnetron sputtering
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- Plasma & Fusion (AREA)
- Analytical Chemistry (AREA)
- Physical Vapour Deposition (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
GB919108553A GB9108553D0 (en) | 1991-04-22 | 1991-04-22 | Ionised vapour source |
Publications (3)
Publication Number | Publication Date |
---|---|
GB9208673D0 true GB9208673D0 (en) | 1992-06-10 |
GB2255105A GB2255105A (en) | 1992-10-28 |
GB2255105B GB2255105B (en) | 1994-09-21 |
Family
ID=10693697
Family Applications (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
GB919108553A Pending GB9108553D0 (en) | 1991-04-22 | 1991-04-22 | Ionised vapour source |
GB9208673A Expired - Lifetime GB2255105B (en) | 1991-04-22 | 1992-04-22 | Ionised vapour source |
Family Applications Before (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
GB919108553A Pending GB9108553D0 (en) | 1991-04-22 | 1991-04-22 | Ionised vapour source |
Country Status (1)
Country | Link |
---|---|
GB (2) | GB9108553D0 (en) |
Families Citing this family (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
AU7381594A (en) * | 1993-07-29 | 1995-02-28 | Institute Of Physics Academy Of Sciences Of The Czech Republic | Method and device for magnetron sputtering |
JP3804974B2 (en) * | 1995-01-25 | 2006-08-02 | アプライド コマツ テクノロジー株式会社 | Autoclave bonding of sputtering target assemblies |
DE19702928C2 (en) * | 1997-01-28 | 2001-06-07 | Eitec Ges Fuer Metallisches Ha | Arc evaporator |
DE19731025C2 (en) * | 1997-07-18 | 1999-10-14 | Ardenne Anlagentech Gmbh | Target cathode arrangement |
AU9410498A (en) * | 1997-11-26 | 1999-06-17 | Vapor Technologies, Inc. | Apparatus for sputtering or arc evaporation |
DE10127012A1 (en) * | 2001-06-05 | 2002-12-12 | Gabriel Herbert M | Electric arc vaporizing device used in production of hard material layers on substrates comprises anode, target, voltage, and magnet arrangement formed as one unit |
WO2006093953A1 (en) * | 2005-02-28 | 2006-09-08 | Tosoh Smd, Inc. | Sputtering target with an insulating ring and a gap between the ring and the target |
CN106086805A (en) * | 2016-08-05 | 2016-11-09 | 湖南玉丰真空科学技术有限公司 | A kind of compound scan magnetic field coater |
CA3111730C (en) | 2020-03-16 | 2023-09-26 | Vapor Technologies, Inc. | Convertible magnetics for rotary cathode |
Family Cites Families (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB2140040B (en) * | 1983-05-09 | 1986-09-17 | Vac Tec Syst | Evaporation arc stabilization |
DE3738845A1 (en) * | 1987-11-16 | 1989-05-24 | Leybold Ag | SPRAYING CATODE ACCORDING TO THE MAGNETRON PRINCIPLE |
ATE115647T1 (en) * | 1988-08-25 | 1994-12-15 | Hauzer Ind Bv | PHYSICAL VAPOR DEPOSITION DOUBLE COATING APPARATUS AND PROCESS. |
-
1991
- 1991-04-22 GB GB919108553A patent/GB9108553D0/en active Pending
-
1992
- 1992-04-22 GB GB9208673A patent/GB2255105B/en not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
GB2255105B (en) | 1994-09-21 |
GB2255105A (en) | 1992-10-28 |
GB9108553D0 (en) | 1991-06-05 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
PE20 | Patent expired after termination of 20 years |
Expiry date: 20120421 |