GB9006881D0 - Use of a propanol as resist-remover - Google Patents

Use of a propanol as resist-remover

Info

Publication number
GB9006881D0
GB9006881D0 GB909006881A GB9006881A GB9006881D0 GB 9006881 D0 GB9006881 D0 GB 9006881D0 GB 909006881 A GB909006881 A GB 909006881A GB 9006881 A GB9006881 A GB 9006881A GB 9006881 D0 GB9006881 D0 GB 9006881D0
Authority
GB
United Kingdom
Prior art keywords
remover
propanol
resist
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
GB909006881A
Other versions
GB2229827A (en
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Zeon Corp
Original Assignee
Nippon Zeon Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Zeon Co Ltd filed Critical Nippon Zeon Co Ltd
Publication of GB9006881D0 publication Critical patent/GB9006881D0/en
Publication of GB2229827A publication Critical patent/GB2229827A/en
Withdrawn legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/42—Stripping or agents therefor
    • G03F7/422—Stripping or agents therefor using liquids only

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
GB9006881A 1989-03-28 1990-03-28 "Use of a propanol as resist-remover". Withdrawn GB2229827A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP7602689A JPH02253265A (en) 1989-03-28 1989-03-28 Resist peeling agent

Publications (2)

Publication Number Publication Date
GB9006881D0 true GB9006881D0 (en) 1990-05-23
GB2229827A GB2229827A (en) 1990-10-03

Family

ID=13593314

Family Applications (1)

Application Number Title Priority Date Filing Date
GB9006881A Withdrawn GB2229827A (en) 1989-03-28 1990-03-28 "Use of a propanol as resist-remover".

Country Status (2)

Country Link
JP (1) JPH02253265A (en)
GB (1) GB2229827A (en)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5759973A (en) * 1996-09-06 1998-06-02 Olin Microelectronic Chemicals, Inc. Photoresist stripping and cleaning compositions
US5780406A (en) * 1996-09-06 1998-07-14 Honda; Kenji Non-corrosive cleaning composition for removing plasma etching residues
US6030932A (en) * 1996-09-06 2000-02-29 Olin Microelectronic Chemicals Cleaning composition and method for removing residues
US5817610A (en) * 1996-09-06 1998-10-06 Olin Microelectronic Chemicals, Inc. Non-corrosive cleaning composition for removing plasma etching residues
JP3978255B2 (en) * 1997-06-24 2007-09-19 Ａｚエレクトロニックマテリアルズ株式会社 Lithographic cleaning agent
KR100335484B1 (en) * 1998-08-05 2002-05-04 윤종용 Use of an Alkoxy N-Hydroxyalkyl Alkanamide as Resist Removing Agent, Composition for Removing Resist, Method for Preparing the Same and Resist Removing Method Using the Same
SG76567A1 (en) * 1998-08-05 2000-11-21 Samsung Electronics Co Ltd Resist removing method and apparatus
US6413923B2 (en) 1999-11-15 2002-07-02 Arch Specialty Chemicals, Inc. Non-corrosive cleaning composition for removing plasma etching residues
JP4236198B2 (en) 2004-12-28 2009-03-11 東京応化工業株式会社 Lithographic cleaning liquid and semiconductor substrate forming method using the same
JP4588590B2 (en) * 2005-09-09 2010-12-01 ダイセル化学工業株式会社 Lithographic cleaning agent or rinse agent

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3012522A1 (en) * 1980-03-31 1981-10-08 Hoechst Ag, 6000 Frankfurt METHOD AND DEVELOPER SOLUTION FOR DEVELOPING EXPOSED NEGATIVE WORKING DIAZONIUM SALT LAYERS
US4786580A (en) * 1983-12-27 1988-11-22 Hoechst Celanese Corporation Method of developing imaged diazo material with propanol containing developer composition
EP0164083B1 (en) * 1984-06-07 1991-05-02 Hoechst Aktiengesellschaft Positively acting light-sensitive coating solution
US4692398A (en) * 1985-10-28 1987-09-08 American Hoechst Corporation Process of using photoresist treating composition containing a mixture of a hexa-alkyl disilazane, propylene glycol alkyl ether and propylene glycol alkyl ether acetate

Also Published As

Publication number Publication date
GB2229827A (en) 1990-10-03
JPH02253265A (en) 1990-10-12

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Legal Events

Date Code Title Description
WAP Application withdrawn, taken to be withdrawn or refused ** after publication under section 16(1)