GB8912077D0 - Process for manufacturing silicon-germanium alloys - Google Patents
Process for manufacturing silicon-germanium alloysInfo
- Publication number
- GB8912077D0 GB8912077D0 GB898912077A GB8912077A GB8912077D0 GB 8912077 D0 GB8912077 D0 GB 8912077D0 GB 898912077 A GB898912077 A GB 898912077A GB 8912077 A GB8912077 A GB 8912077A GB 8912077 D0 GB8912077 D0 GB 8912077D0
- Authority
- GB
- United Kingdom
- Prior art keywords
- manufacturing silicon
- germanium alloys
- germanium
- alloys
- silicon
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N10/00—Thermoelectric devices comprising a junction of dissimilar materials, i.e. devices exhibiting Seebeck or Peltier effects
- H10N10/01—Manufacture or treatment
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N10/00—Thermoelectric devices comprising a junction of dissimilar materials, i.e. devices exhibiting Seebeck or Peltier effects
- H10N10/80—Constructional details
- H10N10/85—Thermoelectric active materials
- H10N10/851—Thermoelectric active materials comprising inorganic compositions
- H10N10/855—Thermoelectric active materials comprising inorganic compositions comprising compounds containing boron, carbon, oxygen or nitrogen
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP63168836A JPH0628246B2 (en) | 1988-07-08 | 1988-07-08 | Method for producing silicon-germanium alloy |
Publications (2)
Publication Number | Publication Date |
---|---|
GB8912077D0 true GB8912077D0 (en) | 1989-07-12 |
GB2221923A GB2221923A (en) | 1990-02-21 |
Family
ID=15875425
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
GB8912077A Withdrawn GB2221923A (en) | 1988-07-08 | 1989-05-25 | Process for manufacturing silicon-germanium alloys |
Country Status (4)
Country | Link |
---|---|
JP (1) | JPH0628246B2 (en) |
DE (1) | DE3922270A1 (en) |
FR (1) | FR2633943B1 (en) |
GB (1) | GB2221923A (en) |
Family Cites Families (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB1118183A (en) * | 1964-05-01 | 1968-06-26 | Plessey Uk Ltd | Improvements in or relating to thermoelectric devices |
NL6803816A (en) * | 1967-04-01 | 1968-10-02 | ||
US4032363A (en) * | 1975-01-27 | 1977-06-28 | Syncal Corporation | Low power high voltage thermopile |
US4442449A (en) * | 1981-03-16 | 1984-04-10 | Fairchild Camera And Instrument Corp. | Binary germanium-silicon interconnect and electrode structure for integrated circuits |
US4728528A (en) * | 1985-02-18 | 1988-03-01 | Canon Kabushiki Kaisha | Process for forming deposited film |
US4726963A (en) * | 1985-02-19 | 1988-02-23 | Canon Kabushiki Kaisha | Process for forming deposited film |
-
1988
- 1988-07-08 JP JP63168836A patent/JPH0628246B2/en not_active Expired - Lifetime
-
1989
- 1989-05-25 GB GB8912077A patent/GB2221923A/en not_active Withdrawn
- 1989-07-05 FR FR898909045A patent/FR2633943B1/en not_active Expired - Lifetime
- 1989-07-06 DE DE3922270A patent/DE3922270A1/en not_active Withdrawn
Also Published As
Publication number | Publication date |
---|---|
DE3922270A1 (en) | 1990-01-11 |
GB2221923A (en) | 1990-02-21 |
FR2633943B1 (en) | 1992-02-07 |
JPH0628246B2 (en) | 1994-04-13 |
FR2633943A1 (en) | 1990-01-12 |
JPH0219467A (en) | 1990-01-23 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
WAP | Application withdrawn, taken to be withdrawn or refused ** after publication under section 16(1) |