FR2633943B1 - PROCESS FOR THE MANUFACTURE OF SILICON-GERMANIUM ALLOYS - Google Patents

PROCESS FOR THE MANUFACTURE OF SILICON-GERMANIUM ALLOYS

Info

Publication number
FR2633943B1
FR2633943B1 FR898909045A FR8909045A FR2633943B1 FR 2633943 B1 FR2633943 B1 FR 2633943B1 FR 898909045 A FR898909045 A FR 898909045A FR 8909045 A FR8909045 A FR 8909045A FR 2633943 B1 FR2633943 B1 FR 2633943B1
Authority
FR
France
Prior art keywords
silicon
manufacture
germanium alloys
germanium
alloys
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
FR898909045A
Other languages
French (fr)
Other versions
FR2633943A1 (en
Inventor
Shinji Maruya
Toru Takahashi
Junji Izawa
Yoshifumi Yatsurugi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sumco Techxiv Corp
Original Assignee
Komatsu Electronic Metals Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Komatsu Electronic Metals Co Ltd filed Critical Komatsu Electronic Metals Co Ltd
Publication of FR2633943A1 publication Critical patent/FR2633943A1/en
Application granted granted Critical
Publication of FR2633943B1 publication Critical patent/FR2633943B1/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N10/00—Thermoelectric devices comprising a junction of dissimilar materials, i.e. devices exhibiting Seebeck or Peltier effects
    • H10N10/01—Manufacture or treatment
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N10/00—Thermoelectric devices comprising a junction of dissimilar materials, i.e. devices exhibiting Seebeck or Peltier effects
    • H10N10/80—Constructional details
    • H10N10/85—Thermoelectric active materials
    • H10N10/851—Thermoelectric active materials comprising inorganic compositions
    • H10N10/855—Thermoelectric active materials comprising inorganic compositions comprising compounds containing boron, carbon, oxygen or nitrogen

Landscapes

  • Chemical & Material Sciences (AREA)
  • Inorganic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Manufacturing & Machinery (AREA)
  • Chemical Vapour Deposition (AREA)
  • Silicon Compounds (AREA)
FR898909045A 1988-07-08 1989-07-05 PROCESS FOR THE MANUFACTURE OF SILICON-GERMANIUM ALLOYS Expired - Lifetime FR2633943B1 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP63168836A JPH0628246B2 (en) 1988-07-08 1988-07-08 Method for producing silicon-germanium alloy

Publications (2)

Publication Number Publication Date
FR2633943A1 FR2633943A1 (en) 1990-01-12
FR2633943B1 true FR2633943B1 (en) 1992-02-07

Family

ID=15875425

Family Applications (1)

Application Number Title Priority Date Filing Date
FR898909045A Expired - Lifetime FR2633943B1 (en) 1988-07-08 1989-07-05 PROCESS FOR THE MANUFACTURE OF SILICON-GERMANIUM ALLOYS

Country Status (4)

Country Link
JP (1) JPH0628246B2 (en)
DE (1) DE3922270A1 (en)
FR (1) FR2633943B1 (en)
GB (1) GB2221923A (en)

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1118183A (en) * 1964-05-01 1968-06-26 Plessey Uk Ltd Improvements in or relating to thermoelectric devices
NL6803816A (en) * 1967-04-01 1968-10-02
US4032363A (en) * 1975-01-27 1977-06-28 Syncal Corporation Low power high voltage thermopile
US4442449A (en) * 1981-03-16 1984-04-10 Fairchild Camera And Instrument Corp. Binary germanium-silicon interconnect and electrode structure for integrated circuits
US4728528A (en) * 1985-02-18 1988-03-01 Canon Kabushiki Kaisha Process for forming deposited film
US4726963A (en) * 1985-02-19 1988-02-23 Canon Kabushiki Kaisha Process for forming deposited film

Also Published As

Publication number Publication date
DE3922270A1 (en) 1990-01-11
JPH0628246B2 (en) 1994-04-13
GB8912077D0 (en) 1989-07-12
GB2221923A (en) 1990-02-21
FR2633943A1 (en) 1990-01-12
JPH0219467A (en) 1990-01-23

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Legal Events

Date Code Title Description
ST Notification of lapse