GB8428372D0 - Shutter device - Google Patents
Shutter deviceInfo
- Publication number
- GB8428372D0 GB8428372D0 GB848428372A GB8428372A GB8428372D0 GB 8428372 D0 GB8428372 D0 GB 8428372D0 GB 848428372 A GB848428372 A GB 848428372A GB 8428372 A GB8428372 A GB 8428372A GB 8428372 D0 GB8428372 D0 GB 8428372D0
- Authority
- GB
- United Kingdom
- Prior art keywords
- shutter device
- shutter
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
- G03F7/7055—Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
Landscapes
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- General Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Shutters For Cameras (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP58209939A JPS60102737A (en) | 1983-11-10 | 1983-11-10 | Shutter device |
Publications (3)
Publication Number | Publication Date |
---|---|
GB8428372D0 true GB8428372D0 (en) | 1984-12-19 |
GB2151372A GB2151372A (en) | 1985-07-17 |
GB2151372B GB2151372B (en) | 1987-12-16 |
Family
ID=16581162
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
GB08428372A Expired GB2151372B (en) | 1983-11-10 | 1984-11-09 | Control of shutter position |
Country Status (3)
Country | Link |
---|---|
JP (1) | JPS60102737A (en) |
DE (1) | DE3441298A1 (en) |
GB (1) | GB2151372B (en) |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS61188152U (en) * | 1985-05-15 | 1986-11-22 | ||
EP0250975B1 (en) * | 1986-06-13 | 1991-08-28 | Dainippon Screen Mfg. Co., Ltd. | Illumination system |
DE10029444B4 (en) * | 2000-06-21 | 2004-07-22 | Leica Microsystems Heidelberg Gmbh | Optical arrangement |
CN108663871B (en) * | 2017-03-31 | 2021-06-25 | 上海微电子装备(集团)股份有限公司 | Shutter device |
Family Cites Families (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4227079A (en) * | 1978-12-15 | 1980-10-07 | Hewlett-Packard Company | Multipath fine positioning beam director |
GB2041576A (en) * | 1979-02-02 | 1980-09-10 | Leeds & Northrup Co | Electric drive unit control apparatus |
FR2461408A1 (en) * | 1979-07-06 | 1981-01-30 | Jaeger | ELECTRIC PULSE TOTALIZER USING AN ELECTRIC MOTOR PROVIDED BY A POSITION CONTROL |
US4350428A (en) * | 1979-10-09 | 1982-09-21 | Optimetrix Corporation | Shutter mechanism |
JPS5655927A (en) * | 1979-10-15 | 1981-05-16 | Ushio Inc | Shutter device |
JPS5697105A (en) * | 1979-12-31 | 1981-08-05 | Fanuc Ltd | Controller for stopping in place for main shaft |
US4430657A (en) * | 1982-03-03 | 1984-02-07 | The Perkin-Elmer Corporation | Pen drive for recorder |
JPS5932012A (en) * | 1982-08-17 | 1984-02-21 | Sumitomo Electric Ind Ltd | Positioning servo system |
-
1983
- 1983-11-10 JP JP58209939A patent/JPS60102737A/en active Pending
-
1984
- 1984-11-09 GB GB08428372A patent/GB2151372B/en not_active Expired
- 1984-11-12 DE DE19843441298 patent/DE3441298A1/en not_active Ceased
Also Published As
Publication number | Publication date |
---|---|
GB2151372A (en) | 1985-07-17 |
GB2151372B (en) | 1987-12-16 |
JPS60102737A (en) | 1985-06-06 |
DE3441298A1 (en) | 1985-05-23 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
PE20 | Patent expired after termination of 20 years |
Effective date: 20041108 |