GB2151372B - Control of shutter position - Google Patents
Control of shutter positionInfo
- Publication number
- GB2151372B GB2151372B GB08428372A GB8428372A GB2151372B GB 2151372 B GB2151372 B GB 2151372B GB 08428372 A GB08428372 A GB 08428372A GB 8428372 A GB8428372 A GB 8428372A GB 2151372 B GB2151372 B GB 2151372B
- Authority
- GB
- United Kingdom
- Prior art keywords
- control
- shutter position
- shutter
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic System or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
- G03F7/7055—Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP58209939A JPS60102737A (en) | 1983-11-10 | 1983-11-10 | Shutter device |
Publications (3)
Publication Number | Publication Date |
---|---|
GB8428372D0 GB8428372D0 (en) | 1984-12-19 |
GB2151372A GB2151372A (en) | 1985-07-17 |
GB2151372B true GB2151372B (en) | 1987-12-16 |
Family
ID=16581162
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
GB08428372A Expired GB2151372B (en) | 1983-11-10 | 1984-11-09 | Control of shutter position |
Country Status (3)
Country | Link |
---|---|
JP (1) | JPS60102737A (en) |
DE (1) | DE3441298A1 (en) |
GB (1) | GB2151372B (en) |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS61188152U (en) * | 1985-05-15 | 1986-11-22 | ||
DE3772467D1 (en) * | 1986-06-13 | 1991-10-02 | Dainippon Screen Mfg | EXPOSURE SYSTEM. |
DE10029444B4 (en) * | 2000-06-21 | 2004-07-22 | Leica Microsystems Heidelberg Gmbh | Optical arrangement |
CN108663871B (en) * | 2017-03-31 | 2021-06-25 | 上海微电子装备(集团)股份有限公司 | Shutter device |
Family Cites Families (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4227079A (en) * | 1978-12-15 | 1980-10-07 | Hewlett-Packard Company | Multipath fine positioning beam director |
GB2041576A (en) * | 1979-02-02 | 1980-09-10 | Leeds & Northrup Co | Electric drive unit control apparatus |
FR2461408A1 (en) * | 1979-07-06 | 1981-01-30 | Jaeger | ELECTRIC PULSE TOTALIZER USING AN ELECTRIC MOTOR PROVIDED BY A POSITION CONTROL |
US4350428A (en) * | 1979-10-09 | 1982-09-21 | Optimetrix Corporation | Shutter mechanism |
JPS5655927A (en) * | 1979-10-15 | 1981-05-16 | Ushio Inc | Shutter device |
JPS5697105A (en) * | 1979-12-31 | 1981-08-05 | Fanuc Ltd | Controller for stopping in place for main shaft |
US4430657A (en) * | 1982-03-03 | 1984-02-07 | The Perkin-Elmer Corporation | Pen drive for recorder |
JPS5932012A (en) * | 1982-08-17 | 1984-02-21 | Sumitomo Electric Ind Ltd | Positioning servo system |
-
1983
- 1983-11-10 JP JP58209939A patent/JPS60102737A/en active Pending
-
1984
- 1984-11-09 GB GB08428372A patent/GB2151372B/en not_active Expired
- 1984-11-12 DE DE19843441298 patent/DE3441298A1/en not_active Ceased
Also Published As
Publication number | Publication date |
---|---|
DE3441298A1 (en) | 1985-05-23 |
JPS60102737A (en) | 1985-06-06 |
GB8428372D0 (en) | 1984-12-19 |
GB2151372A (en) | 1985-07-17 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
PE20 | Patent expired after termination of 20 years |
Effective date: 20041108 |