GB8328426D0 - Silicon carbidebased moulded member - Google Patents

Silicon carbidebased moulded member

Info

Publication number
GB8328426D0
GB8328426D0 GB838328426A GB8328426A GB8328426D0 GB 8328426 D0 GB8328426 D0 GB 8328426D0 GB 838328426 A GB838328426 A GB 838328426A GB 8328426 A GB8328426 A GB 8328426A GB 8328426 D0 GB8328426 D0 GB 8328426D0
Authority
GB
United Kingdom
Prior art keywords
carbidebased
silicon
moulded member
moulded
silicon carbidebased
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
GB838328426A
Other versions
GB2130192B (en
GB2130192A (en
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Coorstek KK
Original Assignee
Toshiba Ceramics Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP18980082A external-priority patent/JPS5978529A/en
Priority claimed from JP58090483A external-priority patent/JPS59217613A/en
Application filed by Toshiba Ceramics Co Ltd filed Critical Toshiba Ceramics Co Ltd
Publication of GB8328426D0 publication Critical patent/GB8328426D0/en
Publication of GB2130192A publication Critical patent/GB2130192A/en
Application granted granted Critical
Publication of GB2130192B publication Critical patent/GB2130192B/en
Expired legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C30—CRYSTAL GROWTH
    • C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B31/00—Diffusion or doping processes for single crystals or homogeneous polycrystalline material with defined structure; Apparatus therefor
    • C30B31/06—Diffusion or doping processes for single crystals or homogeneous polycrystalline material with defined structure; Apparatus therefor by contacting with diffusion material in the gaseous state
    • C30B31/10—Reaction chambers; Selection of materials therefor
    • C—CHEMISTRY; METALLURGY
    • C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B35/00—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
    • C04B35/515—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on non-oxide ceramics
    • C04B35/56—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on non-oxide ceramics based on carbides or oxycarbides
    • C04B35/565—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on non-oxide ceramics based on carbides or oxycarbides based on silicon carbide
    • C—CHEMISTRY; METALLURGY
    • C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B35/00—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
    • C04B35/515—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on non-oxide ceramics
    • C04B35/56—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on non-oxide ceramics based on carbides or oxycarbides
    • C04B35/565—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on non-oxide ceramics based on carbides or oxycarbides based on silicon carbide
    • C04B35/573—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on non-oxide ceramics based on carbides or oxycarbides based on silicon carbide obtained by reaction sintering or recrystallisation
    • C—CHEMISTRY; METALLURGY
    • C30—CRYSTAL GROWTH
    • C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B25/00—Single-crystal growth by chemical reaction of reactive gases, e.g. chemical vapour-deposition growth
    • C30B25/02—Epitaxial-layer growth
    • C30B25/08—Reaction chambers; Selection of materials therefor
    • C—CHEMISTRY; METALLURGY
    • C30—CRYSTAL GROWTH
    • C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B35/00—Apparatus not otherwise provided for, specially adapted for the growth, production or after-treatment of single crystals or of a homogeneous polycrystalline material with defined structure

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Ceramic Engineering (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Metallurgy (AREA)
  • Manufacturing & Machinery (AREA)
  • Structural Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Ceramic Products (AREA)
GB08328426A 1982-10-28 1983-10-25 Silicon carbide-based molded member for use in semiconductor manufacture Expired GB2130192B (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP18980082A JPS5978529A (en) 1982-10-28 1982-10-28 Silicon carbide material for manufacturing semiconductor
JP58090483A JPS59217613A (en) 1983-05-23 1983-05-23 Silicon carbide material for producing semiconductor

Publications (3)

Publication Number Publication Date
GB8328426D0 true GB8328426D0 (en) 1983-11-23
GB2130192A GB2130192A (en) 1984-05-31
GB2130192B GB2130192B (en) 1987-01-07

Family

ID=26431963

Family Applications (1)

Application Number Title Priority Date Filing Date
GB08328426A Expired GB2130192B (en) 1982-10-28 1983-10-25 Silicon carbide-based molded member for use in semiconductor manufacture

Country Status (5)

Country Link
DE (1) DE3338755A1 (en)
FR (1) FR2535312B1 (en)
GB (1) GB2130192B (en)
IT (1) IT1169895B (en)
NL (1) NL8303684A (en)

Families Citing this family (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60138913A (en) * 1983-12-26 1985-07-23 Toshiba Ceramics Co Ltd Manufacture of semiconductor diffusion furnace tube
JPS6169116A (en) * 1984-09-13 1986-04-09 Toshiba Ceramics Co Ltd Susceptor for continuous cvd coating on silicon wafer
JPS6212666A (en) * 1985-07-09 1987-01-21 東芝セラミツクス株式会社 Manufacture of oven core pipe for semiconductor
JPH0521297Y2 (en) * 1986-07-31 1993-06-01
US4999228A (en) * 1988-05-06 1991-03-12 Shin-Etsu Chemical Co., Ltd. Silicon carbide diffusion tube for semi-conductor
US5332702A (en) * 1993-04-16 1994-07-26 Corning Incorporated Low sodium zircon refractory and fused silica process
US5770324A (en) * 1997-03-03 1998-06-23 Saint-Gobain Industrial Ceramics, Inc. Method of using a hot pressed silicon carbide dummy wafer
US6572700B2 (en) 1997-12-26 2003-06-03 Sumitomo Electric Industries, Ltd. Semiconductor crystal, and method and apparatus of production thereof
JP4135239B2 (en) * 1997-12-26 2008-08-20 住友電気工業株式会社 Semiconductor crystal, manufacturing method thereof and manufacturing apparatus
US6296716B1 (en) 1999-10-01 2001-10-02 Saint-Gobain Ceramics And Plastics, Inc. Process for cleaning ceramic articles
JP3749518B2 (en) * 2000-07-24 2006-03-01 サン−ゴバン セラミックス アンド プラスティクス，インコーポレイティド Method for cleaning ceramic articles
US20030233977A1 (en) * 2002-06-20 2003-12-25 Yeshwanth Narendar Method for forming semiconductor processing components
US7501370B2 (en) 2004-01-06 2009-03-10 Saint-Gobain Ceramics & Plastics, Inc. High purity silicon carbide wafer boats
US8058174B2 (en) 2007-12-20 2011-11-15 Coorstek, Inc. Method for treating semiconductor processing components and components formed thereby

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR1219625A (en) * 1958-04-03 1960-05-18 Wacker Chemie Gmbh Process for manufacturing objects of specific shape in very pure silicon carbide
JPS5722914B2 (en) * 1974-08-27 1982-05-15
US3951587A (en) * 1974-12-06 1976-04-20 Norton Company Silicon carbide diffusion furnace components
JPS5222477A (en) * 1975-08-13 1977-02-19 Toshiba Ceramics Co Ltd Sic-si type equalizing tube for manufacturing gas impermeable semi conductors
JPS5277590A (en) * 1975-12-24 1977-06-30 Toshiba Corp Semiconductor producing device
JPS5848487B2 (en) * 1976-03-31 1983-10-28 東芝セラミツクス株式会社 Method for producing high purity silicon carbide powder
US4123286A (en) * 1976-12-27 1978-10-31 The Carborundum Company Silicon carbide powder compositions
JPS55158622A (en) * 1979-05-30 1980-12-10 Toshiba Ceramics Co Ltd Manufacture of silicon carbide material for semiconductor

Also Published As

Publication number Publication date
GB2130192B (en) 1987-01-07
NL8303684A (en) 1984-05-16
IT1169895B (en) 1987-06-03
DE3338755A1 (en) 1984-05-03
FR2535312A1 (en) 1984-05-04
FR2535312B1 (en) 1986-11-14
IT8323430A0 (en) 1983-10-25
GB2130192A (en) 1984-05-31

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Legal Events

Date Code Title Description
PCNP Patent ceased through non-payment of renewal fee

Effective date: 20001025